STEP AND REPEAT PRINTING DOWN METHOD FOR IMAGES AND STEP AND REPEAT PRINTING DOWN DATA FORMING DEVICE
PURPOSE:To obtain easy step and repeat printing down by forming a 1st mask of the shapes of the regions of images and the positions and shapes of register marks and forming a 2nd mask of the disposition of step and repeat printing down layouts. CONSTITUTION:The 1st mask for light shielding of the re...
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| creator | MURAYAMA MINORU ITO KAZUHIKO HASHIMOTO JOJI TOKUDA MASAYUKI |
| description | PURPOSE:To obtain easy step and repeat printing down by forming a 1st mask of the shapes of the regions of images and the positions and shapes of register marks and forming a 2nd mask of the disposition of step and repeat printing down layouts. CONSTITUTION:The 1st mask for light shielding of the regions exclusive of an image OIa and the register marks RM 1 among the regions on an original plate OFa is formed. The 2nd mask for light shielding of the regions of the plural images I 1 to 6 and the regions of the register marks RM 1 among the regions on a photosensitive material PF is formed. The original plate OFa and the 1st mask are superposed. The images I 1 to 6 and the register marks MR 1 are subjected step and repeat printing down on the photosensitive material; thereafter, the photosensitive material PF and the 2nd mask are superposed on each other and are exposed. The step and repeat printing down is executed in this way without requiring skilled engineers. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH03273253A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH03273253A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH03273253A3</originalsourceid><addsrcrecordid>eNrjZEgNDnENUHD0c1EIcg1wdQxRCAjy9Avx9HNXcPEP91PwdQ3x8HdRcPMPUvD0dXR3DQYrxa_HxTHEEaTDFyziGubp7MrDwJqWmFOcyguluRkU3VxDnD10Uwvy41OLCxKTU_NSS-K9AjwMjI3MjY1MjR2NiVEDAEBVNHM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>STEP AND REPEAT PRINTING DOWN METHOD FOR IMAGES AND STEP AND REPEAT PRINTING DOWN DATA FORMING DEVICE</title><source>esp@cenet</source><creator>MURAYAMA MINORU ; ITO KAZUHIKO ; HASHIMOTO JOJI ; TOKUDA MASAYUKI</creator><creatorcontrib>MURAYAMA MINORU ; ITO KAZUHIKO ; HASHIMOTO JOJI ; TOKUDA MASAYUKI</creatorcontrib><description>PURPOSE:To obtain easy step and repeat printing down by forming a 1st mask of the shapes of the regions of images and the positions and shapes of register marks and forming a 2nd mask of the disposition of step and repeat printing down layouts. CONSTITUTION:The 1st mask for light shielding of the regions exclusive of an image OIa and the register marks RM 1 among the regions on an original plate OFa is formed. The 2nd mask for light shielding of the regions of the plural images I 1 to 6 and the regions of the register marks RM 1 among the regions on a photosensitive material PF is formed. The original plate OFa and the 1st mask are superposed. The images I 1 to 6 and the register marks MR 1 are subjected step and repeat printing down on the photosensitive material; thereafter, the photosensitive material PF and the 2nd mask are superposed on each other and are exposed. The step and repeat printing down is executed in this way without requiring skilled engineers.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1991</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19911204&DB=EPODOC&CC=JP&NR=H03273253A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19911204&DB=EPODOC&CC=JP&NR=H03273253A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MURAYAMA MINORU</creatorcontrib><creatorcontrib>ITO KAZUHIKO</creatorcontrib><creatorcontrib>HASHIMOTO JOJI</creatorcontrib><creatorcontrib>TOKUDA MASAYUKI</creatorcontrib><title>STEP AND REPEAT PRINTING DOWN METHOD FOR IMAGES AND STEP AND REPEAT PRINTING DOWN DATA FORMING DEVICE</title><description>PURPOSE:To obtain easy step and repeat printing down by forming a 1st mask of the shapes of the regions of images and the positions and shapes of register marks and forming a 2nd mask of the disposition of step and repeat printing down layouts. CONSTITUTION:The 1st mask for light shielding of the regions exclusive of an image OIa and the register marks RM 1 among the regions on an original plate OFa is formed. The 2nd mask for light shielding of the regions of the plural images I 1 to 6 and the regions of the register marks RM 1 among the regions on a photosensitive material PF is formed. The original plate OFa and the 1st mask are superposed. The images I 1 to 6 and the register marks MR 1 are subjected step and repeat printing down on the photosensitive material; thereafter, the photosensitive material PF and the 2nd mask are superposed on each other and are exposed. The step and repeat printing down is executed in this way without requiring skilled engineers.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1991</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEgNDnENUHD0c1EIcg1wdQxRCAjy9Avx9HNXcPEP91PwdQ3x8HdRcPMPUvD0dXR3DQYrxa_HxTHEEaTDFyziGubp7MrDwJqWmFOcyguluRkU3VxDnD10Uwvy41OLCxKTU_NSS-K9AjwMjI3MjY1MjR2NiVEDAEBVNHM</recordid><startdate>19911204</startdate><enddate>19911204</enddate><creator>MURAYAMA MINORU</creator><creator>ITO KAZUHIKO</creator><creator>HASHIMOTO JOJI</creator><creator>TOKUDA MASAYUKI</creator><scope>EVB</scope></search><sort><creationdate>19911204</creationdate><title>STEP AND REPEAT PRINTING DOWN METHOD FOR IMAGES AND STEP AND REPEAT PRINTING DOWN DATA FORMING DEVICE</title><author>MURAYAMA MINORU ; ITO KAZUHIKO ; HASHIMOTO JOJI ; TOKUDA MASAYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH03273253A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1991</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MURAYAMA MINORU</creatorcontrib><creatorcontrib>ITO KAZUHIKO</creatorcontrib><creatorcontrib>HASHIMOTO JOJI</creatorcontrib><creatorcontrib>TOKUDA MASAYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MURAYAMA MINORU</au><au>ITO KAZUHIKO</au><au>HASHIMOTO JOJI</au><au>TOKUDA MASAYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>STEP AND REPEAT PRINTING DOWN METHOD FOR IMAGES AND STEP AND REPEAT PRINTING DOWN DATA FORMING DEVICE</title><date>1991-12-04</date><risdate>1991</risdate><abstract>PURPOSE:To obtain easy step and repeat printing down by forming a 1st mask of the shapes of the regions of images and the positions and shapes of register marks and forming a 2nd mask of the disposition of step and repeat printing down layouts. CONSTITUTION:The 1st mask for light shielding of the regions exclusive of an image OIa and the register marks RM 1 among the regions on an original plate OFa is formed. The 2nd mask for light shielding of the regions of the plural images I 1 to 6 and the regions of the register marks RM 1 among the regions on a photosensitive material PF is formed. The original plate OFa and the 1st mask are superposed. The images I 1 to 6 and the register marks MR 1 are subjected step and repeat printing down on the photosensitive material; thereafter, the photosensitive material PF and the 2nd mask are superposed on each other and are exposed. The step and repeat printing down is executed in this way without requiring skilled engineers.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | STEP AND REPEAT PRINTING DOWN METHOD FOR IMAGES AND STEP AND REPEAT PRINTING DOWN DATA FORMING DEVICE |
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