ARSENIC DIFFUSION AGENT AND MANUFACTURE THEREOF

PURPOSE:To decelerate the dissociation rate when arsenic is diffused on a silicon wafer for making the repeated application feasible by a method wherein the title arsenic diffusion agent is enabled to be formed in an arbitrary shape while reinforcing the structure so as to facilitate the industrial...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KASHIDA SHU, SAITOU SHIGEAKI, NAGATA AKIHIKO, USU YOSHIYUKI, MATSUEDA TOSHIHARU, KUBOTA YOSHIHIRO, MURANAKA HIDEYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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