POSITIVE PHOTO-RESIST COMPOSITION

PURPOSE: To enable the stability and moreover, a high image separation performance to be acquired by incorporating a specified 1,2-disulfonyl compound as a sensitizer. CONSTITUTION: This positive photoresist composition comprises as essential components in an organic solvent, a silylized phenol resi...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	ETSUKUHAATO BAATOMAN, GUREGAA BUEENAA, RAINHARUTO SHIYURUTSU, HORUSUTO MIYUNTSUERU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE: To enable the stability and moreover, a high image separation performance to be acquired by incorporating a specified 1,2-disulfonyl compound as a sensitizer. CONSTITUTION: This positive photoresist composition comprises as essential components in an organic solvent, a silylized phenol resin and at least one kind of sensitizer and, when needed, other conventional additives, and further, as a sensitizer, the 1,2-disulfonyl compound represented by formula I in which each of R and R is, independently, a