JPH0233694B
The new dibenzoylmethane derivatives of the formula in which R1 denotes hydrogen, methyl or ethyl and R2 denotes methyl or ethyl and R3 represents a straight-chain or branched lower alkyl radical, can be prepared by reacting acetophenone derivatives with an anisic ester or by reacting a substituted...
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creator | RUDORUFU HOTSUPU HORUSUTO FUINKERUMAIAA ROORANTO RANGUNAA |
description | The new dibenzoylmethane derivatives of the formula in which R1 denotes hydrogen, methyl or ethyl and R2 denotes methyl or ethyl and R3 represents a straight-chain or branched lower alkyl radical, can be prepared by reacting acetophenone derivatives with an anisic ester or by reacting a substituted benzoic ester with p-methoxyacetophenone. The compounds can be used in sunscreen agents. |
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The compounds can be used in sunscreen agents.</description><language>eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; ADHESIVES ; CHEMISTRY ; DYES ; HUMAN NECESSITIES ; HYGIENE ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; MEDICAL OR VETERINARY SCIENCE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC CHEMISTRY ; PAINTS ; POLISHES ; PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES ; SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS</subject><creationdate>1990</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900730&DB=EPODOC&CC=JP&NR=H0233694B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900730&DB=EPODOC&CC=JP&NR=H0233694B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RUDORUFU HOTSUPU</creatorcontrib><creatorcontrib>HORUSUTO FUINKERUMAIAA</creatorcontrib><creatorcontrib>ROORANTO RANGUNAA</creatorcontrib><title>JPH0233694B</title><description>The new dibenzoylmethane derivatives of the formula in which R1 denotes hydrogen, methyl or ethyl and R2 denotes methyl or ethyl and R3 represents a straight-chain or branched lower alkyl radical, can be prepared by reacting acetophenone derivatives with an anisic ester or by reacting a substituted benzoic ester with p-methoxyacetophenone. The compounds can be used in sunscreen agents.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>HUMAN NECESSITIES</subject><subject>HYGIENE</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>MEDICAL OR VETERINARY SCIENCE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC CHEMISTRY</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES</subject><subject>SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1990</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOD2CvAwMDI2NrM0ceJhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFIOpyMjIlSBAB7iRxF</recordid><startdate>19900730</startdate><enddate>19900730</enddate><creator>RUDORUFU HOTSUPU</creator><creator>HORUSUTO FUINKERUMAIAA</creator><creator>ROORANTO RANGUNAA</creator><scope>EVB</scope></search><sort><creationdate>19900730</creationdate><title>JPH0233694B</title><author>RUDORUFU HOTSUPU ; HORUSUTO FUINKERUMAIAA ; ROORANTO RANGUNAA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH0233694BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1990</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>HUMAN NECESSITIES</topic><topic>HYGIENE</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>MEDICAL OR VETERINARY SCIENCE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC CHEMISTRY</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES</topic><topic>SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS</topic><toplevel>online_resources</toplevel><creatorcontrib>RUDORUFU HOTSUPU</creatorcontrib><creatorcontrib>HORUSUTO FUINKERUMAIAA</creatorcontrib><creatorcontrib>ROORANTO RANGUNAA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RUDORUFU HOTSUPU</au><au>HORUSUTO FUINKERUMAIAA</au><au>ROORANTO RANGUNAA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JPH0233694B</title><date>1990-07-30</date><risdate>1990</risdate><abstract>The new dibenzoylmethane derivatives of the formula in which R1 denotes hydrogen, methyl or ethyl and R2 denotes methyl or ethyl and R3 represents a straight-chain or branched lower alkyl radical, can be prepared by reacting acetophenone derivatives with an anisic ester or by reacting a substituted benzoic ester with p-methoxyacetophenone. The compounds can be used in sunscreen agents.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS ADHESIVES CHEMISTRY DYES HUMAN NECESSITIES HYGIENE MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MEDICAL OR VETERINARY SCIENCE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY PAINTS POLISHES PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS |
title | JPH0233694B |
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