JPH0115149B
PURPOSE:To simplify processes, and to prevent the generation of a defective contact in an electrode contact section by providing a process forming an offset gate region and a pull-down resistor by implanting impurity ions of the same kind as pull-down resistor electrodes among these electrodes forme...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!