FERRITE CARRIER FOR ELECTROPHOTOGRAPHIC DEVELOPER HAVING SUPERIOR MOISTURE RESISTANCE
PURPOSE:To obtain a Cu-Zn ferrite carrier having superior moisture resistance in spite of the uncoated state by allowing specified conditions to be satisfied in a specified compsn. of ferrite. CONSTITUTION:Ferrite having a compsn. represented by a formula [(Cu1-XMgX)1-YZnYO]2-Z[Fe2O3]2 (where each o...
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creator | FUJINAGA MASASHI OKUNO KEIZOU |
description | PURPOSE:To obtain a Cu-Zn ferrite carrier having superior moisture resistance in spite of the uncoated state by allowing specified conditions to be satisfied in a specified compsn. of ferrite. CONSTITUTION:Ferrite having a compsn. represented by a formula [(Cu1-XMgX)1-YZnYO]2-Z[Fe2O3]2 (where each of X, Y and Z is mol number, 0.1 |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH01147477A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH01147477A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH01147477A3</originalsourceid><addsrcrecordid>eNqNykEKwjAQheFsXIh6h_EAgsVC1iGdNJHaCZOk21IkXRUt1PtjFh7A1f8efHuRDDK7iKBVKTIYYsAOdWTyliK1rLx1GhocsCNfhFWD61sIqRxX9INciIkRGENZqtd4FLt5WrZ8-vUgzgajtpe8vse8rdMzv_JnvHt7rapa1lKq2z_mC7lmMVc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>FERRITE CARRIER FOR ELECTROPHOTOGRAPHIC DEVELOPER HAVING SUPERIOR MOISTURE RESISTANCE</title><source>esp@cenet</source><creator>FUJINAGA MASASHI ; OKUNO KEIZOU</creator><creatorcontrib>FUJINAGA MASASHI ; OKUNO KEIZOU</creatorcontrib><description><![CDATA[PURPOSE:To obtain a Cu-Zn ferrite carrier having superior moisture resistance in spite of the uncoated state by allowing specified conditions to be satisfied in a specified compsn. of ferrite. CONSTITUTION:Ferrite having a compsn. represented by a formula [(Cu1-XMgX)1-YZnYO]2-Z[Fe2O3]2 (where each of X, Y and Z is mol number, 0.1<=X<=0.6, 0<=Y<=0.7 and 0.9<=Z<=1.2) is used. A ferrite carrier having high moisture resistance in the uncoated state can be obtd. Since the carrier is not coated, it is obtd. at a low cost and defects such as changes in the characteristics due to exfoliation and wear are not caused.]]></description><language>eng</language><subject>CINEMATOGRAPHY ; ELECTROGRAPHY ; ELECTROPHOTOGRAPHY ; HOLOGRAPHY ; MAGNETOGRAPHY ; PHOTOGRAPHY ; PHYSICS</subject><creationdate>1989</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890609&DB=EPODOC&CC=JP&NR=H01147477A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890609&DB=EPODOC&CC=JP&NR=H01147477A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FUJINAGA MASASHI</creatorcontrib><creatorcontrib>OKUNO KEIZOU</creatorcontrib><title>FERRITE CARRIER FOR ELECTROPHOTOGRAPHIC DEVELOPER HAVING SUPERIOR MOISTURE RESISTANCE</title><description><![CDATA[PURPOSE:To obtain a Cu-Zn ferrite carrier having superior moisture resistance in spite of the uncoated state by allowing specified conditions to be satisfied in a specified compsn. of ferrite. CONSTITUTION:Ferrite having a compsn. represented by a formula [(Cu1-XMgX)1-YZnYO]2-Z[Fe2O3]2 (where each of X, Y and Z is mol number, 0.1<=X<=0.6, 0<=Y<=0.7 and 0.9<=Z<=1.2) is used. A ferrite carrier having high moisture resistance in the uncoated state can be obtd. Since the carrier is not coated, it is obtd. at a low cost and defects such as changes in the characteristics due to exfoliation and wear are not caused.]]></description><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>ELECTROPHOTOGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MAGNETOGRAPHY</subject><subject>PHOTOGRAPHY</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1989</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNykEKwjAQheFsXIh6h_EAgsVC1iGdNJHaCZOk21IkXRUt1PtjFh7A1f8efHuRDDK7iKBVKTIYYsAOdWTyliK1rLx1GhocsCNfhFWD61sIqRxX9INciIkRGENZqtd4FLt5WrZ8-vUgzgajtpe8vse8rdMzv_JnvHt7rapa1lKq2z_mC7lmMVc</recordid><startdate>19890609</startdate><enddate>19890609</enddate><creator>FUJINAGA MASASHI</creator><creator>OKUNO KEIZOU</creator><scope>EVB</scope></search><sort><creationdate>19890609</creationdate><title>FERRITE CARRIER FOR ELECTROPHOTOGRAPHIC DEVELOPER HAVING SUPERIOR MOISTURE RESISTANCE</title><author>FUJINAGA MASASHI ; OKUNO KEIZOU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH01147477A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1989</creationdate><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>ELECTROPHOTOGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MAGNETOGRAPHY</topic><topic>PHOTOGRAPHY</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>FUJINAGA MASASHI</creatorcontrib><creatorcontrib>OKUNO KEIZOU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FUJINAGA MASASHI</au><au>OKUNO KEIZOU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FERRITE CARRIER FOR ELECTROPHOTOGRAPHIC DEVELOPER HAVING SUPERIOR MOISTURE RESISTANCE</title><date>1989-06-09</date><risdate>1989</risdate><abstract><![CDATA[PURPOSE:To obtain a Cu-Zn ferrite carrier having superior moisture resistance in spite of the uncoated state by allowing specified conditions to be satisfied in a specified compsn. of ferrite. CONSTITUTION:Ferrite having a compsn. represented by a formula [(Cu1-XMgX)1-YZnYO]2-Z[Fe2O3]2 (where each of X, Y and Z is mol number, 0.1<=X<=0.6, 0<=Y<=0.7 and 0.9<=Z<=1.2) is used. A ferrite carrier having high moisture resistance in the uncoated state can be obtd. Since the carrier is not coated, it is obtd. at a low cost and defects such as changes in the characteristics due to exfoliation and wear are not caused.]]></abstract><oa>free_for_read</oa></addata></record> |
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subjects | CINEMATOGRAPHY ELECTROGRAPHY ELECTROPHOTOGRAPHY HOLOGRAPHY MAGNETOGRAPHY PHOTOGRAPHY PHYSICS |
title | FERRITE CARRIER FOR ELECTROPHOTOGRAPHIC DEVELOPER HAVING SUPERIOR MOISTURE RESISTANCE |
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