JP2983948B
PROBLEM TO BE SOLVED: To realize a positive surface decorating process instead of a negative surface decorating process. SOLUTION: The pattern forming material consists of a polymer containing groups which produce acids by irradiation of energy beams or heating, and a compd. which produces a base by...
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| creator | ENDO MASATAKA SHIRAI MASAMITSU KADOOKA MASAHIRO |
| description | PROBLEM TO BE SOLVED: To realize a positive surface decorating process instead of a negative surface decorating process. SOLUTION: The pattern forming material consists of a polymer containing groups which produce acids by irradiation of energy beams or heating, and a compd. which produces a base by irradiation of energy beams. The polymer is binary or more-component polymer produced by polymerizing a compd. expressed by the formula with other groups. In the formula, R1 is a hydrogen atom or alkyl group, R2 and R3 are each independently hydrogen atoms, alkyl groups, phenyl groups or alkenyl groups, or bonded to form a cyclic structure of a cyclic alkyl group, cyclic alkenyl group, cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group. |
| format | Patent |
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SOLUTION: The pattern forming material consists of a polymer containing groups which produce acids by irradiation of energy beams or heating, and a compd. which produces a base by irradiation of energy beams. The polymer is binary or more-component polymer produced by polymerizing a compd. expressed by the formula with other groups. In the formula, R1 is a hydrogen atom or alkyl group, R2 and R3 are each independently hydrogen atoms, alkyl groups, phenyl groups or alkenyl groups, or bonded to form a cyclic structure of a cyclic alkyl group, cyclic alkenyl group, cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group.</description><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19991129&DB=EPODOC&CC=JP&NR=2983948B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19991129&DB=EPODOC&CC=JP&NR=2983948B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ENDO MASATAKA</creatorcontrib><creatorcontrib>SHIRAI MASAMITSU</creatorcontrib><creatorcontrib>KADOOKA MASAHIRO</creatorcontrib><title>JP2983948B</title><description>PROBLEM TO BE SOLVED: To realize a positive surface decorating process instead of a negative surface decorating process. SOLUTION: The pattern forming material consists of a polymer containing groups which produce acids by irradiation of energy beams or heating, and a compd. which produces a base by irradiation of energy beams. The polymer is binary or more-component polymer produced by polymerizing a compd. expressed by the formula with other groups. In the formula, R1 is a hydrogen atom or alkyl group, R2 and R3 are each independently hydrogen atoms, alkyl groups, phenyl groups or alkenyl groups, or bonded to form a cyclic structure of a cyclic alkyl group, cyclic alkenyl group, cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZODyCjCytDC2NLFw4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8QgNTkbGxKgBAC6VG5o</recordid><startdate>19991129</startdate><enddate>19991129</enddate><creator>ENDO MASATAKA</creator><creator>SHIRAI MASAMITSU</creator><creator>KADOOKA MASAHIRO</creator><scope>EVB</scope></search><sort><creationdate>19991129</creationdate><title>JP2983948B</title><author>ENDO MASATAKA ; SHIRAI MASAMITSU ; KADOOKA MASAHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2983948BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>ENDO MASATAKA</creatorcontrib><creatorcontrib>SHIRAI MASAMITSU</creatorcontrib><creatorcontrib>KADOOKA MASAHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ENDO MASATAKA</au><au>SHIRAI MASAMITSU</au><au>KADOOKA MASAHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JP2983948B</title><date>1999-11-29</date><risdate>1999</risdate><abstract>PROBLEM TO BE SOLVED: To realize a positive surface decorating process instead of a negative surface decorating process. SOLUTION: The pattern forming material consists of a polymer containing groups which produce acids by irradiation of energy beams or heating, and a compd. which produces a base by irradiation of energy beams. The polymer is binary or more-component polymer produced by polymerizing a compd. expressed by the formula with other groups. In the formula, R1 is a hydrogen atom or alkyl group, R2 and R3 are each independently hydrogen atoms, alkyl groups, phenyl groups or alkenyl groups, or bonded to form a cyclic structure of a cyclic alkyl group, cyclic alkenyl group, cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | JP2983948B |
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