JP2938758B
The composition of an alloy is inhomogeneous, so that the Fermi level of electrons in the surface of the alloy differs depending upon positions. It is accordingly considered that a part susceptible to corrosion and a part less susceptible thereto will coexist in the alloy. The corrosion rate of the...
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creator | ISOBE JUSUKE SAKAI MASANORI TAKAHASHI TAKUYA FUJIMORI HARUO OONAKA NORYUKI ISHIKAWA JUICHI |
description | The composition of an alloy is inhomogeneous, so that the Fermi level of electrons in the surface of the alloy differs depending upon positions. It is accordingly considered that a part susceptible to corrosion and a part less susceptible thereto will coexist in the alloy. The corrosion rate of the alloy is indicated as the exponential function of a potential difference ( DELTA PHI H) within an electric double layer. The potential difference remains unchanged as long as the Fermi level lies within the forbidden band of the electrons. However, in a range in which the Fermi level falls within the valence band of the electrons, the lowering thereof leads to the increase of the potential difference. Accordingly, a corrosion-resisting alloy is designed in accordance with the following guidelines: a) The electron energy level (Ev) of the valence band is low, b) an oxide film to be formed on the alloy is an n-type semiconductor, c) a band gap (Ec - Ev) is wide where Ec denotes the conduction band of the electrons, and d) a flatband potential (Ef1) is low. Further, the operation of a plant and the evaluation of a corrosional damage can be based on such a theory. |
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It is accordingly considered that a part susceptible to corrosion and a part less susceptible thereto will coexist in the alloy. The corrosion rate of the alloy is indicated as the exponential function of a potential difference ( DELTA PHI H) within an electric double layer. The potential difference remains unchanged as long as the Fermi level lies within the forbidden band of the electrons. However, in a range in which the Fermi level falls within the valence band of the electrons, the lowering thereof leads to the increase of the potential difference. Accordingly, a corrosion-resisting alloy is designed in accordance with the following guidelines: a) The electron energy level (Ev) of the valence band is low, b) an oxide film to be formed on the alloy is an n-type semiconductor, c) a band gap (Ec - Ev) is wide where Ec denotes the conduction band of the electrons, and d) a flatband potential (Ef1) is low. Further, the operation of a plant and the evaluation of a corrosional damage can be based on such a theory.</description><edition>6</edition><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; METALLURGY ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; NUCLEAR POWER PLANT ; PHYSICS ; TESTING</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990825&DB=EPODOC&CC=JP&NR=2938758B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990825&DB=EPODOC&CC=JP&NR=2938758B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ISOBE JUSUKE</creatorcontrib><creatorcontrib>SAKAI MASANORI</creatorcontrib><creatorcontrib>TAKAHASHI TAKUYA</creatorcontrib><creatorcontrib>FUJIMORI HARUO</creatorcontrib><creatorcontrib>OONAKA NORYUKI</creatorcontrib><creatorcontrib>ISHIKAWA JUICHI</creatorcontrib><title>JP2938758B</title><description>The composition of an alloy is inhomogeneous, so that the Fermi level of electrons in the surface of the alloy differs depending upon positions. 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It is accordingly considered that a part susceptible to corrosion and a part less susceptible thereto will coexist in the alloy. The corrosion rate of the alloy is indicated as the exponential function of a potential difference ( DELTA PHI H) within an electric double layer. The potential difference remains unchanged as long as the Fermi level lies within the forbidden band of the electrons. However, in a range in which the Fermi level falls within the valence band of the electrons, the lowering thereof leads to the increase of the potential difference. Accordingly, a corrosion-resisting alloy is designed in accordance with the following guidelines: a) The electron energy level (Ev) of the valence band is low, b) an oxide film to be formed on the alloy is an n-type semiconductor, c) a band gap (Ec - Ev) is wide where Ec denotes the conduction band of the electrons, and d) a flatband potential (Ef1) is low. Further, the operation of a plant and the evaluation of a corrosional damage can be based on such a theory.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE NUCLEAR ENGINEERING NUCLEAR PHYSICS NUCLEAR POWER PLANT PHYSICS TESTING |
title | JP2938758B |
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