JP2936984B

PURPOSE:To obtain a photosensitive resin compsn. to be suitably used for a method of forming a color pattern layer such as a color filter layer on a transparent substrate with high precision. CONSTITUTION:A photosensitive resin compsn. 2 containing an acryl resin comprising butylmethacrylate, methylmethacrylate and methacrylic acid, acryl monomer, photopolynm. initiator, and diluting solvent is applied on a glass substrate 1, exposed and developed to obtain a pattern. Recesses produced by the frame of the patterned compsn. layer and the bare glass substrate are filled with a color glass paste 4' and baked to form a color filter layer 4. By this method using the photosensitive resin compsn., the shape and position of the color filter layer 4 are decided corresponding to the pattern and position of the frame patterned by exposure and development, so that the pattern and position of the color filter layer 4 can be controlled at high precision nearly to the optical limit.