JP2936920B
PURPOSE:To speed up and facilitate the adjustment of the inclination of a master mask and glass substrate held in tight contact under a vacuum pressure with an optical axis in a tight contact state and to eliminate the damages of holding plates by an adjusting screw in duplication of a copy mask. CO...
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| creator | TANAKA YOSHUKI |
| description | PURPOSE:To speed up and facilitate the adjustment of the inclination of a master mask and glass substrate held in tight contact under a vacuum pressure with an optical axis in a tight contact state and to eliminate the damages of holding plates by an adjusting screw in duplication of a copy mask. CONSTITUTION:This pattern transfer device is provided with plural pieces of hydraulic cylinders 3 which press the parts on the respective sides of the holding plate 2, an oil pressure control valve 7 which changes the oil pressures of these hydraulic cylinders 3, a selector valve 8 which selects the flow of the oil, a hydraulic source 9 which forcibly feeds the oil, a flatness measuring instrument 5 which measures the perpendicularly of the master mask 44 and glass substrate 41 held in tight contact under the vacuum pressure with the optical axis and a base late 4 which is with the holding plates 1, 2 and the flatness measuring instrument 5 at the same level. The inclination of the master mask 44 and the glass substrate 41 with the optical axis is adjusted by regulating the oil pressures of the respective hydraulic cylinders 3 in the state of maintaining the master mask 44 and the glass substrate 41 under the vacuum pressure and the perpendicularly of the optical axis and the transfer surface is set and thereafter, the patterns of the master mask 44 are transferred onto the glass substrate 41 by projecting light for exposure. |
| format | Patent |
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CONSTITUTION:This pattern transfer device is provided with plural pieces of hydraulic cylinders 3 which press the parts on the respective sides of the holding plate 2, an oil pressure control valve 7 which changes the oil pressures of these hydraulic cylinders 3, a selector valve 8 which selects the flow of the oil, a hydraulic source 9 which forcibly feeds the oil, a flatness measuring instrument 5 which measures the perpendicularly of the master mask 44 and glass substrate 41 held in tight contact under the vacuum pressure with the optical axis and a base late 4 which is with the holding plates 1, 2 and the flatness measuring instrument 5 at the same level. The inclination of the master mask 44 and the glass substrate 41 with the optical axis is adjusted by regulating the oil pressures of the respective hydraulic cylinders 3 in the state of maintaining the master mask 44 and the glass substrate 41 under the vacuum pressure and the perpendicularly of the optical axis and the transfer surface is set and thereafter, the patterns of the master mask 44 are transferred onto the glass substrate 41 by projecting light for exposure.</description><edition>6</edition><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990823&DB=EPODOC&CC=JP&NR=2936920B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990823&DB=EPODOC&CC=JP&NR=2936920B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANAKA YOSHUKI</creatorcontrib><title>JP2936920B</title><description>PURPOSE:To speed up and facilitate the adjustment of the inclination of a master mask and glass substrate held in tight contact under a vacuum pressure with an optical axis in a tight contact state and to eliminate the damages of holding plates by an adjusting screw in duplication of a copy mask. CONSTITUTION:This pattern transfer device is provided with plural pieces of hydraulic cylinders 3 which press the parts on the respective sides of the holding plate 2, an oil pressure control valve 7 which changes the oil pressures of these hydraulic cylinders 3, a selector valve 8 which selects the flow of the oil, a hydraulic source 9 which forcibly feeds the oil, a flatness measuring instrument 5 which measures the perpendicularly of the master mask 44 and glass substrate 41 held in tight contact under the vacuum pressure with the optical axis and a base late 4 which is with the holding plates 1, 2 and the flatness measuring instrument 5 at the same level. The inclination of the master mask 44 and the glass substrate 41 with the optical axis is adjusted by regulating the oil pressures of the respective hydraulic cylinders 3 in the state of maintaining the master mask 44 and the glass substrate 41 under the vacuum pressure and the perpendicularly of the optical axis and the transfer surface is set and thereafter, the patterns of the master mask 44 are transferred onto the glass substrate 41 by projecting light for exposure.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZODyCjCyNDazNDJw4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8QgNTkbGxKgBACgOG3Y</recordid><startdate>19990823</startdate><enddate>19990823</enddate><creator>TANAKA YOSHUKI</creator><scope>EVB</scope></search><sort><creationdate>19990823</creationdate><title>JP2936920B</title><author>TANAKA YOSHUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2936920BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>TANAKA YOSHUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TANAKA YOSHUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JP2936920B</title><date>1999-08-23</date><risdate>1999</risdate><abstract>PURPOSE:To speed up and facilitate the adjustment of the inclination of a master mask and glass substrate held in tight contact under a vacuum pressure with an optical axis in a tight contact state and to eliminate the damages of holding plates by an adjusting screw in duplication of a copy mask. CONSTITUTION:This pattern transfer device is provided with plural pieces of hydraulic cylinders 3 which press the parts on the respective sides of the holding plate 2, an oil pressure control valve 7 which changes the oil pressures of these hydraulic cylinders 3, a selector valve 8 which selects the flow of the oil, a hydraulic source 9 which forcibly feeds the oil, a flatness measuring instrument 5 which measures the perpendicularly of the master mask 44 and glass substrate 41 held in tight contact under the vacuum pressure with the optical axis and a base late 4 which is with the holding plates 1, 2 and the flatness measuring instrument 5 at the same level. The inclination of the master mask 44 and the glass substrate 41 with the optical axis is adjusted by regulating the oil pressures of the respective hydraulic cylinders 3 in the state of maintaining the master mask 44 and the glass substrate 41 under the vacuum pressure and the perpendicularly of the optical axis and the transfer surface is set and thereafter, the patterns of the master mask 44 are transferred onto the glass substrate 41 by projecting light for exposure.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | JP2936920B |
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