JP2914172B

PURPOSE:To ensure superior dry etching resistance and resolution and to enhance sensitivity by developing a resist whose materials and compsn. have been made optimum with a developer having a specified compsn. CONSTITUTION:This electron beam resist compsn. contains cresol novolak resin, additives re...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OOSETO HIROKI, KATAOKA MUTSUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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