JP2830430B
PURPOSE:To remove the stray light generated by the transmitted light of a pellicle and to allow the detection only by the scattered light from foreign matter by selecting one wavelength from plural light beams varying in wavelength. CONSTITUTION:The light beams from light sources 14, 15 are made inc...
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| creator | NOMURA KYOICHI KANEKUTSU YUTAKA NAKAMURA OSAMU TASHIRO HIDEYUKI HAYANO FUMITOMO AKAGAWA KATSUYUKI |
| description | PURPOSE:To remove the stray light generated by the transmitted light of a pellicle and to allow the detection only by the scattered light from foreign matter by selecting one wavelength from plural light beams varying in wavelength. CONSTITUTION:The light beams from light sources 14, 15 are made incident nearly parallel on the pellicle 1 and form band-shaped irradiated parts 5 to 7 in the X direction of the pellicle surface. The incident angle of both the light beams, i.e., the angle formed with the pellicle plane, is set nearly zero. The scattered light 4 is generated and is condensed by an imaging lens 8 when the foreign matter 3 exists on these light beams 5, 6, 7. Since this light is imaged on the photodetecting surface of a photoelectric detector 18, the foreign matter 3 is detected in this way. The light scattered from only the foreign matter is detected by the photoelectric detector 18 without receiving the influence of the frame scattered light by the beam transmitted through the pellicle if the wavelength at which the light beams are mostly reflected on the pellicle surface according to the spectral characteristics of the pellicle is selected by moving the shutter 13. |
| format | Patent |
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CONSTITUTION:The light beams from light sources 14, 15 are made incident nearly parallel on the pellicle 1 and form band-shaped irradiated parts 5 to 7 in the X direction of the pellicle surface. The incident angle of both the light beams, i.e., the angle formed with the pellicle plane, is set nearly zero. The scattered light 4 is generated and is condensed by an imaging lens 8 when the foreign matter 3 exists on these light beams 5, 6, 7. Since this light is imaged on the photodetecting surface of a photoelectric detector 18, the foreign matter 3 is detected in this way. The light scattered from only the foreign matter is detected by the photoelectric detector 18 without receiving the influence of the frame scattered light by the beam transmitted through the pellicle if the wavelength at which the light beams are mostly reflected on the pellicle surface according to the spectral characteristics of the pellicle is selected by moving the shutter 13.</description><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MATERIALS THEREFOR ; MEASURING ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>1998</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19981202&DB=EPODOC&CC=JP&NR=2830430B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19981202&DB=EPODOC&CC=JP&NR=2830430B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NOMURA KYOICHI</creatorcontrib><creatorcontrib>KANEKUTSU YUTAKA</creatorcontrib><creatorcontrib>NAKAMURA OSAMU</creatorcontrib><creatorcontrib>TASHIRO HIDEYUKI</creatorcontrib><creatorcontrib>HAYANO FUMITOMO</creatorcontrib><creatorcontrib>AKAGAWA KATSUYUKI</creatorcontrib><title>JP2830430B</title><description>PURPOSE:To remove the stray light generated by the transmitted light of a pellicle and to allow the detection only by the scattered light from foreign matter by selecting one wavelength from plural light beams varying in wavelength. 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The light scattered from only the foreign matter is detected by the photoelectric detector 18 without receiving the influence of the frame scattered light by the beam transmitted through the pellicle if the wavelength at which the light beams are mostly reflected on the pellicle surface according to the spectral characteristics of the pellicle is selected by moving the shutter 13.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1998</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZODyCjCyMDYwMTZw4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8QgNTkbGxKgBACHWG1U</recordid><startdate>19981202</startdate><enddate>19981202</enddate><creator>NOMURA KYOICHI</creator><creator>KANEKUTSU YUTAKA</creator><creator>NAKAMURA OSAMU</creator><creator>TASHIRO HIDEYUKI</creator><creator>HAYANO FUMITOMO</creator><creator>AKAGAWA KATSUYUKI</creator><scope>EVB</scope></search><sort><creationdate>19981202</creationdate><title>JP2830430B</title><author>NOMURA KYOICHI ; KANEKUTSU YUTAKA ; NAKAMURA OSAMU ; TASHIRO HIDEYUKI ; HAYANO FUMITOMO ; AKAGAWA KATSUYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2830430BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1998</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>NOMURA KYOICHI</creatorcontrib><creatorcontrib>KANEKUTSU YUTAKA</creatorcontrib><creatorcontrib>NAKAMURA OSAMU</creatorcontrib><creatorcontrib>TASHIRO HIDEYUKI</creatorcontrib><creatorcontrib>HAYANO FUMITOMO</creatorcontrib><creatorcontrib>AKAGAWA KATSUYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NOMURA KYOICHI</au><au>KANEKUTSU YUTAKA</au><au>NAKAMURA OSAMU</au><au>TASHIRO HIDEYUKI</au><au>HAYANO FUMITOMO</au><au>AKAGAWA KATSUYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JP2830430B</title><date>1998-12-02</date><risdate>1998</risdate><abstract>PURPOSE:To remove the stray light generated by the transmitted light of a pellicle and to allow the detection only by the scattered light from foreign matter by selecting one wavelength from plural light beams varying in wavelength. CONSTITUTION:The light beams from light sources 14, 15 are made incident nearly parallel on the pellicle 1 and form band-shaped irradiated parts 5 to 7 in the X direction of the pellicle surface. The incident angle of both the light beams, i.e., the angle formed with the pellicle plane, is set nearly zero. The scattered light 4 is generated and is condensed by an imaging lens 8 when the foreign matter 3 exists on these light beams 5, 6, 7. Since this light is imaged on the photodetecting surface of a photoelectric detector 18, the foreign matter 3 is detected in this way. The light scattered from only the foreign matter is detected by the photoelectric detector 18 without receiving the influence of the frame scattered light by the beam transmitted through the pellicle if the wavelength at which the light beams are mostly reflected on the pellicle surface according to the spectral characteristics of the pellicle is selected by moving the shutter 13.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING |
| title | JP2830430B |
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