JP2645384B
A positive type photosensitive resinous composition comprising a base resin, having at least one side chain or at an end portion of its main chain, an iminosulfonate group of the formula: in which R1 and R2 are the same or are different and each represents a hydrogen atom or an alkyl, acyl, phenyl,...
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creator | SHIRAI MASAMITSU NISHIJIMA KANJI KADOOKA MASAHIRO ISHIKAWA KATSUKYO |
description | A positive type photosensitive resinous composition comprising a base resin, having at least one side chain or at an end portion of its main chain, an iminosulfonate group of the formula: in which R1 and R2 are the same or are different and each represents a hydrogen atom or an alkyl, acyl, phenyl, naphthyl, anthryl or benzyl group, or R1 and R2, together with the adjacent carbon atom, form an alicyclic ring, and a group containing an acid-decomposable bond, the content of said iminosulfonate groups being 1x10 to 3x10 equivalent/g; the composition also containing groups containing an acid-decomposable bond. |
format | Patent |
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the composition also containing groups containing an acid-decomposable bond.</description><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1997</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970825&DB=EPODOC&CC=JP&NR=2645384B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970825&DB=EPODOC&CC=JP&NR=2645384B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHIRAI MASAMITSU</creatorcontrib><creatorcontrib>NISHIJIMA KANJI</creatorcontrib><creatorcontrib>KADOOKA MASAHIRO</creatorcontrib><creatorcontrib>ISHIKAWA KATSUKYO</creatorcontrib><title>JP2645384B</title><description>A positive type photosensitive resinous composition comprising a base resin, having at least one side chain or at an end portion of its main chain, an iminosulfonate group of the formula: in which R1 and R2 are the same or are different and each represents a hydrogen atom or an alkyl, acyl, phenyl, naphthyl, anthryl or benzyl group, or R1 and R2, together with the adjacent carbon atom, form an alicyclic ring, and a group containing an acid-decomposable bond, the content of said iminosulfonate groups being 1x10<-> to 3x10<-> equivalent/g; the composition also containing groups containing an acid-decomposable bond.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1997</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZODyCjAyMzE1tjBx4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8QgNTkbGxKgBAChaG3k</recordid><startdate>19970825</startdate><enddate>19970825</enddate><creator>SHIRAI MASAMITSU</creator><creator>NISHIJIMA KANJI</creator><creator>KADOOKA MASAHIRO</creator><creator>ISHIKAWA KATSUKYO</creator><scope>EVB</scope></search><sort><creationdate>19970825</creationdate><title>JP2645384B</title><author>SHIRAI MASAMITSU ; NISHIJIMA KANJI ; KADOOKA MASAHIRO ; ISHIKAWA KATSUKYO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2645384BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1997</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SHIRAI MASAMITSU</creatorcontrib><creatorcontrib>NISHIJIMA KANJI</creatorcontrib><creatorcontrib>KADOOKA MASAHIRO</creatorcontrib><creatorcontrib>ISHIKAWA KATSUKYO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHIRAI MASAMITSU</au><au>NISHIJIMA KANJI</au><au>KADOOKA MASAHIRO</au><au>ISHIKAWA KATSUKYO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JP2645384B</title><date>1997-08-25</date><risdate>1997</risdate><abstract>A positive type photosensitive resinous composition comprising a base resin, having at least one side chain or at an end portion of its main chain, an iminosulfonate group of the formula: in which R1 and R2 are the same or are different and each represents a hydrogen atom or an alkyl, acyl, phenyl, naphthyl, anthryl or benzyl group, or R1 and R2, together with the adjacent carbon atom, form an alicyclic ring, and a group containing an acid-decomposable bond, the content of said iminosulfonate groups being 1x10<-> to 3x10<-> equivalent/g; the composition also containing groups containing an acid-decomposable bond.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
title | JP2645384B |
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