JP2541279B
PURPOSE:To enable a total-area illumination of exposed area to be driven easily by synchrotron radiation light and to realize a compact device by moving a mask stage in a coupled state using connecting mans up and down and by performing exposure transfer with irradiation of synchrotron radiation lig...
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| creator | SAKATA JUJI SEKIGUCHI HIDENORI TABATA FUMIO KAMATA TOORU |
| description | PURPOSE:To enable a total-area illumination of exposed area to be driven easily by synchrotron radiation light and to realize a compact device by moving a mask stage in a coupled state using connecting mans up and down and by performing exposure transfer with irradiation of synchrotron radiation light. CONSTITUTION:When holding a mask 10 as well as a mask stage 11 which can be moved up and down and a wafer 9 and performing exposure transfer with a wafer stage 16 which can be moved in XY direction, the wafer stage 16 is moved while the mask stage 11 in a stop state and relative positioning between the mask 10 and the wafer 9 is performed. And then, a adsorption pad for connecting this wafer stage 16 with the mask stage 11 is provided. Then, the mask stage 11 in a coupled state is moved up and down and exposure transfer is performed by irradiation with synchrotron radiation light. Thus, the scanning drive simply allows the mask stage 11 to move up and down and it is not necessary to move the entire device (an XY stage base 13 performing ultra-precision positioning). Thus, the number of members to be driven may be few, drive becomes easy, and the device can be made compact. |
| format | Patent |
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CONSTITUTION:When holding a mask 10 as well as a mask stage 11 which can be moved up and down and a wafer 9 and performing exposure transfer with a wafer stage 16 which can be moved in XY direction, the wafer stage 16 is moved while the mask stage 11 in a stop state and relative positioning between the mask 10 and the wafer 9 is performed. And then, a adsorption pad for connecting this wafer stage 16 with the mask stage 11 is provided. Then, the mask stage 11 in a coupled state is moved up and down and exposure transfer is performed by irradiation with synchrotron radiation light. Thus, the scanning drive simply allows the mask stage 11 to move up and down and it is not necessary to move the entire device (an XY stage base 13 performing ultra-precision positioning). 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | JP2541279B |
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