JP2502568B
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creator | TAKEGAWA HIROZO NISHIWAKI FUMITOSHI INAMI TAKASHI |
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format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2502568BB2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2502568BB2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2502568BB23</originalsourceid><addsrcrecordid>eNrjZODyCjAyNTAyNbNw4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8QgNTkbGxKgBACXmG20</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>JP2502568B</title><source>esp@cenet</source><creator>TAKEGAWA HIROZO ; NISHIWAKI FUMITOSHI ; INAMI TAKASHI</creator><creatorcontrib>TAKEGAWA HIROZO ; NISHIWAKI FUMITOSHI ; INAMI TAKASHI</creatorcontrib><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; LINING MACHINES ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PRINTING ; PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES ; STAMPS ; TRANSPORTING ; TYPEWRITERS</subject><creationdate>1996</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19960529&DB=EPODOC&CC=JP&NR=2502568B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19960529&DB=EPODOC&CC=JP&NR=2502568B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TAKEGAWA HIROZO</creatorcontrib><creatorcontrib>NISHIWAKI FUMITOSHI</creatorcontrib><creatorcontrib>INAMI TAKASHI</creatorcontrib><title>JP2502568B</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>LINING MACHINES</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PRINTING</subject><subject>PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES</subject><subject>STAMPS</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1996</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZODyCjAyNTAyNbNw4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8QgNTkbGxKgBACXmG20</recordid><startdate>19960529</startdate><enddate>19960529</enddate><creator>TAKEGAWA HIROZO</creator><creator>NISHIWAKI FUMITOSHI</creator><creator>INAMI TAKASHI</creator><scope>EVB</scope></search><sort><creationdate>19960529</creationdate><title>JP2502568B</title><author>TAKEGAWA HIROZO ; NISHIWAKI FUMITOSHI ; INAMI TAKASHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2502568BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1996</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>LINING MACHINES</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PRINTING</topic><topic>PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES</topic><topic>STAMPS</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><toplevel>online_resources</toplevel><creatorcontrib>TAKEGAWA HIROZO</creatorcontrib><creatorcontrib>NISHIWAKI FUMITOSHI</creatorcontrib><creatorcontrib>INAMI TAKASHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TAKEGAWA HIROZO</au><au>NISHIWAKI FUMITOSHI</au><au>INAMI TAKASHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JP2502568B</title><date>1996-05-29</date><risdate>1996</risdate><edition>6</edition><oa>free_for_read</oa></addata></record> |
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language | eng |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TRANSPORTING TYPEWRITERS |
title | JP2502568B |
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