SUBSTRATE PROCESSOR AND METHOD FOR MOUNTING SUBSTRATE
To provide a technique of improving the distribution of remaining stress of a substrate and properly holding the substrate.SOLUTION: A substrate processor has a holding unit including a circular center region and a toric outside region arranged on the outer side relative to the center region in an a...
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| creator | SUGIHARA SHINTARO FUKUSHIMA HIDEYUKI WADA NORIO SUGAKAWA KENJI KOHAMA NORIFUMI MOTODA KIMIO |
| description | To provide a technique of improving the distribution of remaining stress of a substrate and properly holding the substrate.SOLUTION: A substrate processor has a holding unit including a circular center region and a toric outside region arranged on the outer side relative to the center region in an adsorption surface for adsorbing a substrate. The holding unit includes: a first adsorption pressure generation unit for generating an adsorption pressure for causing the holding unit to adsorb the substrate in the center region; and a second adsorption pressure generation unit for generating an adsorption pressure for causing the holding unit to adsorb the substrate in the outside region. The holding region has an external force provision unit for providing the substrate with an external force of a direction which moves the substrate further away from the holding unit in the external region.SELECTED DRAWING: Figure 13
【課題】基板の残留ストレスの分布を改善して、基板を適切に保持できる技術を提供する。【解決手段】基板処理装置は、基板を吸着する吸着面に、円状の中央領域と、中央領域よりも外側に配置される円環状の外側領域と、を有する保持部を備える。保持部は、中央領域において保持部に基板を吸着させる吸着圧力を発生させる第１吸着圧力発生部と、外側領域において保持部に基板を吸着させる吸着圧力を発生させる第２吸着圧力発生部と、を備える。また、保持部は、外側領域において保持部から基板を遠ざける方向の外力を当該基板に付与する外力付与部を有する。【選択図】図１３ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2024116963A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2024116963A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2024116963A3</originalsourceid><addsrcrecordid>eNrjZDANDnUKDglyDHFVCAjyd3YNDvYPUnD0c1HwdQ3x8HdRcANyff1D_UI8_dwV4Gp5GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8V4CRgZGJoaGZpZmxozFRigBoAyh6</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUBSTRATE PROCESSOR AND METHOD FOR MOUNTING SUBSTRATE</title><source>esp@cenet</source><creator>SUGIHARA SHINTARO ; FUKUSHIMA HIDEYUKI ; WADA NORIO ; SUGAKAWA KENJI ; KOHAMA NORIFUMI ; MOTODA KIMIO</creator><creatorcontrib>SUGIHARA SHINTARO ; FUKUSHIMA HIDEYUKI ; WADA NORIO ; SUGAKAWA KENJI ; KOHAMA NORIFUMI ; MOTODA KIMIO</creatorcontrib><description>To provide a technique of improving the distribution of remaining stress of a substrate and properly holding the substrate.SOLUTION: A substrate processor has a holding unit including a circular center region and a toric outside region arranged on the outer side relative to the center region in an adsorption surface for adsorbing a substrate. The holding unit includes: a first adsorption pressure generation unit for generating an adsorption pressure for causing the holding unit to adsorb the substrate in the center region; and a second adsorption pressure generation unit for generating an adsorption pressure for causing the holding unit to adsorb the substrate in the outside region. The holding region has an external force provision unit for providing the substrate with an external force of a direction which moves the substrate further away from the holding unit in the external region.SELECTED DRAWING: Figure 13
【課題】基板の残留ストレスの分布を改善して、基板を適切に保持できる技術を提供する。【解決手段】基板処理装置は、基板を吸着する吸着面に、円状の中央領域と、中央領域よりも外側に配置される円環状の外側領域と、を有する保持部を備える。保持部は、中央領域において保持部に基板を吸着させる吸着圧力を発生させる第１吸着圧力発生部と、外側領域において保持部に基板を吸着させる吸着圧力を発生させる第２吸着圧力発生部と、を備える。また、保持部は、外側領域において保持部から基板を遠ざける方向の外力を当該基板に付与する外力付与部を有する。【選択図】図１３</description><language>eng ; jpn</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240828&DB=EPODOC&CC=JP&NR=2024116963A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240828&DB=EPODOC&CC=JP&NR=2024116963A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUGIHARA SHINTARO</creatorcontrib><creatorcontrib>FUKUSHIMA HIDEYUKI</creatorcontrib><creatorcontrib>WADA NORIO</creatorcontrib><creatorcontrib>SUGAKAWA KENJI</creatorcontrib><creatorcontrib>KOHAMA NORIFUMI</creatorcontrib><creatorcontrib>MOTODA KIMIO</creatorcontrib><title>SUBSTRATE PROCESSOR AND METHOD FOR MOUNTING SUBSTRATE</title><description>To provide a technique of improving the distribution of remaining stress of a substrate and properly holding the substrate.SOLUTION: A substrate processor has a holding unit including a circular center region and a toric outside region arranged on the outer side relative to the center region in an adsorption surface for adsorbing a substrate. The holding unit includes: a first adsorption pressure generation unit for generating an adsorption pressure for causing the holding unit to adsorb the substrate in the center region; and a second adsorption pressure generation unit for generating an adsorption pressure for causing the holding unit to adsorb the substrate in the outside region. The holding region has an external force provision unit for providing the substrate with an external force of a direction which moves the substrate further away from the holding unit in the external region.SELECTED DRAWING: Figure 13
【課題】基板の残留ストレスの分布を改善して、基板を適切に保持できる技術を提供する。【解決手段】基板処理装置は、基板を吸着する吸着面に、円状の中央領域と、中央領域よりも外側に配置される円環状の外側領域と、を有する保持部を備える。保持部は、中央領域において保持部に基板を吸着させる吸着圧力を発生させる第１吸着圧力発生部と、外側領域において保持部に基板を吸着させる吸着圧力を発生させる第２吸着圧力発生部と、を備える。また、保持部は、外側領域において保持部から基板を遠ざける方向の外力を当該基板に付与する外力付与部を有する。【選択図】図１３</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDANDnUKDglyDHFVCAjyd3YNDvYPUnD0c1HwdQ3x8HdRcANyff1D_UI8_dwV4Gp5GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8V4CRgZGJoaGZpZmxozFRigBoAyh6</recordid><startdate>20240828</startdate><enddate>20240828</enddate><creator>SUGIHARA SHINTARO</creator><creator>FUKUSHIMA HIDEYUKI</creator><creator>WADA NORIO</creator><creator>SUGAKAWA KENJI</creator><creator>KOHAMA NORIFUMI</creator><creator>MOTODA KIMIO</creator><scope>EVB</scope></search><sort><creationdate>20240828</creationdate><title>SUBSTRATE PROCESSOR AND METHOD FOR MOUNTING SUBSTRATE</title><author>SUGIHARA SHINTARO ; FUKUSHIMA HIDEYUKI ; WADA NORIO ; SUGAKAWA KENJI ; KOHAMA NORIFUMI ; MOTODA KIMIO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2024116963A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SUGIHARA SHINTARO</creatorcontrib><creatorcontrib>FUKUSHIMA HIDEYUKI</creatorcontrib><creatorcontrib>WADA NORIO</creatorcontrib><creatorcontrib>SUGAKAWA KENJI</creatorcontrib><creatorcontrib>KOHAMA NORIFUMI</creatorcontrib><creatorcontrib>MOTODA KIMIO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUGIHARA SHINTARO</au><au>FUKUSHIMA HIDEYUKI</au><au>WADA NORIO</au><au>SUGAKAWA KENJI</au><au>KOHAMA NORIFUMI</au><au>MOTODA KIMIO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE PROCESSOR AND METHOD FOR MOUNTING SUBSTRATE</title><date>2024-08-28</date><risdate>2024</risdate><abstract>To provide a technique of improving the distribution of remaining stress of a substrate and properly holding the substrate.SOLUTION: A substrate processor has a holding unit including a circular center region and a toric outside region arranged on the outer side relative to the center region in an adsorption surface for adsorbing a substrate. The holding unit includes: a first adsorption pressure generation unit for generating an adsorption pressure for causing the holding unit to adsorb the substrate in the center region; and a second adsorption pressure generation unit for generating an adsorption pressure for causing the holding unit to adsorb the substrate in the outside region. The holding region has an external force provision unit for providing the substrate with an external force of a direction which moves the substrate further away from the holding unit in the external region.SELECTED DRAWING: Figure 13
【課題】基板の残留ストレスの分布を改善して、基板を適切に保持できる技術を提供する。【解決手段】基板処理装置は、基板を吸着する吸着面に、円状の中央領域と、中央領域よりも外側に配置される円環状の外側領域と、を有する保持部を備える。保持部は、中央領域において保持部に基板を吸着させる吸着圧力を発生させる第１吸着圧力発生部と、外側領域において保持部に基板を吸着させる吸着圧力を発生させる第２吸着圧力発生部と、を備える。また、保持部は、外側領域において保持部から基板を遠ざける方向の外力を当該基板に付与する外力付与部を有する。【選択図】図１３</abstract><oa>free_for_read</oa></addata></record> |
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| title | SUBSTRATE PROCESSOR AND METHOD FOR MOUNTING SUBSTRATE |
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