METHOD FOR VAPOR-DEPOSITING FILM AND OPTICAL ELEMENT
To provide a method for vapor-depositing a film excellent in adhesion with a specific resin substrate.SOLUTION: A method for vapor-depositing a film on a resin substrate including at least one of norbornene based ring opened polymer hydride and aromatic vinyl conjugated diene copolymer hydride compr...
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| creator | HARAUCHI YOSUKE SAWAGUCHI TAICHI |
| description | To provide a method for vapor-depositing a film excellent in adhesion with a specific resin substrate.SOLUTION: A method for vapor-depositing a film on a resin substrate including at least one of norbornene based ring opened polymer hydride and aromatic vinyl conjugated diene copolymer hydride comprises the film deposition step of irradiating an evaporation source with an electron beam in a vacuum chamber to evaporate an evaporation material from the evaporation source and form a vapor-deposited film on the resin substrate. In such a film deposition step, the deflection of the reflection electrons of the electron beam by a magnetic field trap arranged in the vacuum chamber reduces the arrival amount of the reflection electrons to the resin substrate.SELECTED DRAWING: None
【課題】特定の樹脂基板との密着性に優れる蒸着膜形成方法を提供する。【解決手段】ノルボルネン系開環重合体水素化物及び芳香族ビニル－共役ジエン共重合体水素化物の少なくとも一方を含む樹脂基板上に蒸着膜を形成する方法である。かかる蒸着膜形成方法は、真空チャンバー内で蒸発源に電子ビームを入射させて、蒸発源から蒸発材料を蒸発させて樹脂基板上に蒸着膜を形成する成膜工程を含み、かかる成膜工程において、真空チャンバー内に配置された磁場トラップにより、電子ビームの反射電子を偏向させることにより、反射電子の樹脂基板に対する到達量を低減させることを特徴とする。【選択図】なし |
| format | Patent |
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【課題】特定の樹脂基板との密着性に優れる蒸着膜形成方法を提供する。【解決手段】ノルボルネン系開環重合体水素化物及び芳香族ビニル－共役ジエン共重合体水素化物の少なくとも一方を含む樹脂基板上に蒸着膜を形成する方法である。かかる蒸着膜形成方法は、真空チャンバー内で蒸発源に電子ビームを入射させて、蒸発源から蒸発材料を蒸発させて樹脂基板上に蒸着膜を形成する成膜工程を含み、かかる成膜工程において、真空チャンバー内に配置された磁場トラップにより、電子ビームの反射電子を偏向させることにより、反射電子の樹脂基板に対する到達量を低減させることを特徴とする。【選択図】なし</description><language>eng ; jpn</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240709&DB=EPODOC&CC=JP&NR=2024094013A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240709&DB=EPODOC&CC=JP&NR=2024094013A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HARAUCHI YOSUKE</creatorcontrib><creatorcontrib>SAWAGUCHI TAICHI</creatorcontrib><title>METHOD FOR VAPOR-DEPOSITING FILM AND OPTICAL ELEMENT</title><description>To provide a method for vapor-depositing a film excellent in adhesion with a specific resin substrate.SOLUTION: A method for vapor-depositing a film on a resin substrate including at least one of norbornene based ring opened polymer hydride and aromatic vinyl conjugated diene copolymer hydride comprises the film deposition step of irradiating an evaporation source with an electron beam in a vacuum chamber to evaporate an evaporation material from the evaporation source and form a vapor-deposited film on the resin substrate. In such a film deposition step, the deflection of the reflection electrons of the electron beam by a magnetic field trap arranged in the vacuum chamber reduces the arrival amount of the reflection electrons to the resin substrate.SELECTED DRAWING: None
【課題】特定の樹脂基板との密着性に優れる蒸着膜形成方法を提供する。【解決手段】ノルボルネン系開環重合体水素化物及び芳香族ビニル－共役ジエン共重合体水素化物の少なくとも一方を含む樹脂基板上に蒸着膜を形成する方法である。かかる蒸着膜形成方法は、真空チャンバー内で蒸発源に電子ビームを入射させて、蒸発源から蒸発材料を蒸発させて樹脂基板上に蒸着膜を形成する成膜工程を含み、かかる成膜工程において、真空チャンバー内に配置された磁場トラップにより、電子ビームの反射電子を偏向させることにより、反射電子の樹脂基板に対する到達量を低減させることを特徴とする。【選択図】なし</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDxdQ3x8HdRcPMPUghzDPAP0nVxDfAP9gzx9HNXcPP08VVw9HNR8A8I8XR29FFw9XH1dfUL4WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgZGJgaWJgaGxo7GRCkCAAaGJ6U</recordid><startdate>20240709</startdate><enddate>20240709</enddate><creator>HARAUCHI YOSUKE</creator><creator>SAWAGUCHI TAICHI</creator><scope>EVB</scope></search><sort><creationdate>20240709</creationdate><title>METHOD FOR VAPOR-DEPOSITING FILM AND OPTICAL ELEMENT</title><author>HARAUCHI YOSUKE ; SAWAGUCHI TAICHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2024094013A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2024</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>HARAUCHI YOSUKE</creatorcontrib><creatorcontrib>SAWAGUCHI TAICHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HARAUCHI YOSUKE</au><au>SAWAGUCHI TAICHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR VAPOR-DEPOSITING FILM AND OPTICAL ELEMENT</title><date>2024-07-09</date><risdate>2024</risdate><abstract>To provide a method for vapor-depositing a film excellent in adhesion with a specific resin substrate.SOLUTION: A method for vapor-depositing a film on a resin substrate including at least one of norbornene based ring opened polymer hydride and aromatic vinyl conjugated diene copolymer hydride comprises the film deposition step of irradiating an evaporation source with an electron beam in a vacuum chamber to evaporate an evaporation material from the evaporation source and form a vapor-deposited film on the resin substrate. In such a film deposition step, the deflection of the reflection electrons of the electron beam by a magnetic field trap arranged in the vacuum chamber reduces the arrival amount of the reflection electrons to the resin substrate.SELECTED DRAWING: None
【課題】特定の樹脂基板との密着性に優れる蒸着膜形成方法を提供する。【解決手段】ノルボルネン系開環重合体水素化物及び芳香族ビニル－共役ジエン共重合体水素化物の少なくとも一方を含む樹脂基板上に蒸着膜を形成する方法である。かかる蒸着膜形成方法は、真空チャンバー内で蒸発源に電子ビームを入射させて、蒸発源から蒸発材料を蒸発させて樹脂基板上に蒸着膜を形成する成膜工程を含み、かかる成膜工程において、真空チャンバー内に配置された磁場トラップにより、電子ビームの反射電子を偏向させることにより、反射電子の樹脂基板に対する到達量を低減させることを特徴とする。【選択図】なし</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | METHOD FOR VAPOR-DEPOSITING FILM AND OPTICAL ELEMENT |
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