LASER PRODUCED PLASMA LIGHT SOURCE HAVING TARGET MATERIAL COVERING CYLINDRICALLY SYMMETRIC ELEMENT
To reduce leakage of bearing gas.SOLUTION: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that covers an outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of...
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| creator | OLEG KHODYKIN RUDY GARCIA FRANK CHILESE BRIAN AHR ALEXEY KURITSYN |
| description | To reduce leakage of bearing gas.SOLUTION: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that covers an outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into an LPP chamber. Injection systems are disclosed for coating and replenishing the drum with the target material. Wiper systems are disclosed for preparing the target material surface on the drum, e.g., smoothing the target material surface. Systems for cooling and maintaining a temperature of the drum and a housing overlying the drum are also disclosed.SELECTED DRAWING: Figure 1
【課題】軸受け気体の漏れを減らす。【解決手段】本件開示は、ドラムの外面を覆うターゲット素材例えばキセノンを有するレーザ生成プラズマ光源を指向している。諸実施形態は、そのドラムを回動させる軸受けシステムであり、ＬＰＰチャンバ内への汚染物質及び／又は軸受け気体の漏れを減らす構造を有するものを備える。そのドラム上にターゲット素材を被せ補充する注入システムが開示される。ターゲット素材の表面を円滑化する等、そのドラム上にあるターゲット素材の表面を整えるワイパシステムが開示される。ドラムとそのドラムに重なるハウジングを除熱し温度を保つシステムも開示される。【選択図】図１ |
| format | Patent |
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【課題】軸受け気体の漏れを減らす。【解決手段】本件開示は、ドラムの外面を覆うターゲット素材例えばキセノンを有するレーザ生成プラズマ光源を指向している。諸実施形態は、そのドラムを回動させる軸受けシステムであり、ＬＰＰチャンバ内への汚染物質及び／又は軸受け気体の漏れを減らす構造を有するものを備える。そのドラム上にターゲット素材を被せ補充する注入システムが開示される。ターゲット素材の表面を円滑化する等、そのドラム上にあるターゲット素材の表面を整えるワイパシステムが開示される。ドラムとそのドラムに重なるハウジングを除熱し温度を保つシステムも開示される。【選択図】図１</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; X-RAY TECHNIQUE</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240702&DB=EPODOC&CC=JP&NR=2024088743A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240702&DB=EPODOC&CC=JP&NR=2024088743A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OLEG KHODYKIN</creatorcontrib><creatorcontrib>RUDY GARCIA</creatorcontrib><creatorcontrib>FRANK CHILESE</creatorcontrib><creatorcontrib>BRIAN AHR</creatorcontrib><creatorcontrib>ALEXEY KURITSYN</creatorcontrib><title>LASER PRODUCED PLASMA LIGHT SOURCE HAVING TARGET MATERIAL COVERING CYLINDRICALLY SYMMETRIC ELEMENT</title><description>To reduce leakage of bearing gas.SOLUTION: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that covers an outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into an LPP chamber. Injection systems are disclosed for coating and replenishing the drum with the target material. Wiper systems are disclosed for preparing the target material surface on the drum, e.g., smoothing the target material surface. Systems for cooling and maintaining a temperature of the drum and a housing overlying the drum are also disclosed.SELECTED DRAWING: Figure 1
【課題】軸受け気体の漏れを減らす。【解決手段】本件開示は、ドラムの外面を覆うターゲット素材例えばキセノンを有するレーザ生成プラズマ光源を指向している。諸実施形態は、そのドラムを回動させる軸受けシステムであり、ＬＰＰチャンバ内への汚染物質及び／又は軸受け気体の漏れを減らす構造を有するものを備える。そのドラム上にターゲット素材を被せ補充する注入システムが開示される。ターゲット素材の表面を円滑化する等、そのドラム上にあるターゲット素材の表面を整えるワイパシステムが開示される。ドラムとそのドラムに重なるハウジングを除熱し温度を保つシステムも開示される。【選択図】図１</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNisEKgkAURd20iOofHu0DUSG3j5mXM_FGZXwKrsRiWkUJ9v80iz6g1bmHe7bJjbEjD61vdK9IQxvdIbCtjEDX9F4RGBxsXYGgr0jAoZC3yKCaIY54qJFtrb1VyDxCNzpHEg2IyVEt-2TzmJ9rOPy4S44XEmVOYXlPYV3me3iFz3RtszQr0rI8Fznmf0VfcAM0xw</recordid><startdate>20240702</startdate><enddate>20240702</enddate><creator>OLEG KHODYKIN</creator><creator>RUDY GARCIA</creator><creator>FRANK CHILESE</creator><creator>BRIAN AHR</creator><creator>ALEXEY KURITSYN</creator><scope>EVB</scope></search><sort><creationdate>20240702</creationdate><title>LASER PRODUCED PLASMA LIGHT SOURCE HAVING TARGET MATERIAL COVERING CYLINDRICALLY SYMMETRIC ELEMENT</title><author>OLEG KHODYKIN ; RUDY GARCIA ; FRANK CHILESE ; BRIAN AHR ; ALEXEY KURITSYN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2024088743A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>OLEG KHODYKIN</creatorcontrib><creatorcontrib>RUDY GARCIA</creatorcontrib><creatorcontrib>FRANK CHILESE</creatorcontrib><creatorcontrib>BRIAN AHR</creatorcontrib><creatorcontrib>ALEXEY KURITSYN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OLEG KHODYKIN</au><au>RUDY GARCIA</au><au>FRANK CHILESE</au><au>BRIAN AHR</au><au>ALEXEY KURITSYN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LASER PRODUCED PLASMA LIGHT SOURCE HAVING TARGET MATERIAL COVERING CYLINDRICALLY SYMMETRIC ELEMENT</title><date>2024-07-02</date><risdate>2024</risdate><abstract>To reduce leakage of bearing gas.SOLUTION: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that covers an outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into an LPP chamber. Injection systems are disclosed for coating and replenishing the drum with the target material. Wiper systems are disclosed for preparing the target material surface on the drum, e.g., smoothing the target material surface. Systems for cooling and maintaining a temperature of the drum and a housing overlying the drum are also disclosed.SELECTED DRAWING: Figure 1
【課題】軸受け気体の漏れを減らす。【解決手段】本件開示は、ドラムの外面を覆うターゲット素材例えばキセノンを有するレーザ生成プラズマ光源を指向している。諸実施形態は、そのドラムを回動させる軸受けシステムであり、ＬＰＰチャンバ内への汚染物質及び／又は軸受け気体の漏れを減らす構造を有するものを備える。そのドラム上にターゲット素材を被せ補充する注入システムが開示される。ターゲット素材の表面を円滑化する等、そのドラム上にあるターゲット素材の表面を整えるワイパシステムが開示される。ドラムとそのドラムに重なるハウジングを除熱し温度を保つシステムも開示される。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE |
| title | LASER PRODUCED PLASMA LIGHT SOURCE HAVING TARGET MATERIAL COVERING CYLINDRICALLY SYMMETRIC ELEMENT |
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