LIGHT SOURCE DEVICE AND FILM THICKNESS ADJUSTMENT MECHANISM

To provide a light source device and a film thickness adjustment mechanism capable of adjusting a film thickness of a plasma material in a plasma generating region at high precision.SOLUTION: A light source device is configured to generate a plasma from a liquid raw material to extract a radioactive...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YABUTA YASUNOBU, GOTO NAOKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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