LIGHT SOURCE DEVICE AND FILM THICKNESS ADJUSTMENT MECHANISM

To provide a light source device and a film thickness adjustment mechanism capable of adjusting a film thickness of a plasma material in a plasma generating region at high precision.SOLUTION: A light source device is configured to generate a plasma from a liquid raw material to extract a radioactive ray. The light source device includes a rotor and a film thickness adjustment mechanism. The rotor has the liquid raw material adhered thereon and rotates to supply the adhered liquid raw material to a plasma generating region. The film thickness adjustment mechanism includes: a film thickness regulation member arranged with an interval at a position opposing an adhesion face onto which the liquid raw material of the rotor is adhered; and a support mechanism configured to support the film thickness regulation member in a movable manner in a first direction opposing the adhesion face. The support mechanism includes: a position retention mechanism configured to return the film thickness regulation member moving from a first adjustment reference position separated by a first distance from the adhesion face in the first direction, to the first adjustment reference position; and an attitude retention mechanism configured to retain an attitude of the film thickness adjustment member moving in the first direction.SELECTED DRAWING: Figure 5 【課題】プラズマの発生領域におけるプラズマ原料の膜厚を高い精度で調整可能な光源装置及び膜厚調整機構を提供すること。【解決手段】本光源装置は、液体原料からプラズマを発生させて放射線を取り出す光源装置であって、回転体と、膜厚調整機構とを具備する。回転体は、液体原料が付着され、回転することでプラズマの発生領域に、付着された液体原料を供給する。膜厚調整機構は、回転体の液体原料が付着される付着面に対向する位置に間隔をあけて配置される膜厚調整部材と、付着面に対向する第１の方向において移動可能となるように膜厚調整部材を支持する支持機構とを有する。支持機構は、第１の方向において付着面から第１の距離離れた第１の調整基準位置から移動する膜厚調整部材を第１の調整基準位置に戻す位置保持機構と、第１の方向において移動する膜厚調整部材の姿勢を保持する姿勢保持機構とを有する。【選択図】図５