APPARATUS
To provide an improved tool and method for a mask assembly.SOLUTION: There is provided a tool for a mask assembly suitable for use in a lithographic process. The mask assembly comprises: a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device w...
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| creator | ROLAND JACOBUS JOHANNES KERSTENS ANGELO CESAR PETER DE KLERK MICHEL LOOS VAN DER MEULEN FRITS FRANK JOHANNES CHRISTIAAN THEUERZEIT PAUL JANSSEN JEROEN DEKKERS MAARTEN MATHIJS MARINUS JANSEN GEERT MIDDEL MAURICE LEONARDUS JOHANNES JANSSEN KRUIZINGA MATTHIAS MARTINUS JOZEF MARIA KESTERS GERRIT VAN DEN BOSCH JACOBUS MARIA DINGS KRAMER RONALD HARM GUNTHER BEATRIJS LOUISE MARIE-JOSEPH KATRIEN VERBRUGGE ERIK R LOOPSTRA ANTONIUS LEENDERS MARTINUS HENDRIKUS SILVESTER MATHEUS REIJNDERS DERK SERVATIUS GERTRUDA BROUNS ROBERT GABRIEL MARIA LANSBERGEN JORGE MANUEL AZEREDO LIMA ANNE JOHANNES WILHELMUS VAN LIEVENOOGEN JEROME FRANCOIS SYLVAIN VIRGILE VAN LOO MARC BRUIJN |
| description | To provide an improved tool and method for a mask assembly.SOLUTION: There is provided a tool for a mask assembly suitable for use in a lithographic process. The mask assembly comprises: a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount. The mount provides a releasably engageable attachment between the patterning device and the pellicle frame.SELECTED DRAWING: Figure 20
【課題】マスクアセンブリのための改良されたツール及び方法を提供する。【解決手段】リソグラフィプロセスで使用するために好適なマスクアセンブリのためのツールであって、マスクアセンブリは、パターニングデバイスと、ペリクルを支持するように構成されマウントを用いてパターニングデバイス上に装着されるペリクルフレームと、を備え、マウントは、パターニングデバイスとペリクルフレームとの間に解除可能な係合可能取り付けを提供する。【選択図】図２０ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2024045512A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2024045512A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2024045512A3</originalsourceid><addsrcrecordid>eNrjZOB0DAhwDHIMCQ3mYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBkYmBiampoZGjsZEKQIAeagcBw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>APPARATUS</title><source>esp@cenet</source><creator>ROLAND JACOBUS JOHANNES KERSTENS ; ANGELO CESAR PETER DE KLERK ; MICHEL LOOS ; VAN DER MEULEN FRITS ; FRANK JOHANNES CHRISTIAAN THEUERZEIT ; PAUL JANSSEN ; JEROEN DEKKERS ; MAARTEN MATHIJS MARINUS JANSEN ; GEERT MIDDEL ; MAURICE LEONARDUS JOHANNES JANSSEN ; KRUIZINGA MATTHIAS ; MARTINUS JOZEF MARIA KESTERS ; GERRIT VAN DEN BOSCH ; JACOBUS MARIA DINGS ; KRAMER RONALD HARM GUNTHER ; BEATRIJS LOUISE MARIE-JOSEPH KATRIEN VERBRUGGE ; ERIK R LOOPSTRA ; ANTONIUS LEENDERS MARTINUS HENDRIKUS ; SILVESTER MATHEUS REIJNDERS ; DERK SERVATIUS GERTRUDA BROUNS ; ROBERT GABRIEL MARIA LANSBERGEN ; JORGE MANUEL AZEREDO LIMA ; ANNE JOHANNES WILHELMUS VAN LIEVENOOGEN ; JEROME FRANCOIS SYLVAIN VIRGILE VAN LOO ; MARC BRUIJN</creator><creatorcontrib>ROLAND JACOBUS JOHANNES KERSTENS ; ANGELO CESAR PETER DE KLERK ; MICHEL LOOS ; VAN DER MEULEN FRITS ; FRANK JOHANNES CHRISTIAAN THEUERZEIT ; PAUL JANSSEN ; JEROEN DEKKERS ; MAARTEN MATHIJS MARINUS JANSEN ; GEERT MIDDEL ; MAURICE LEONARDUS JOHANNES JANSSEN ; KRUIZINGA MATTHIAS ; MARTINUS JOZEF MARIA KESTERS ; GERRIT VAN DEN BOSCH ; JACOBUS MARIA DINGS ; KRAMER RONALD HARM GUNTHER ; BEATRIJS LOUISE MARIE-JOSEPH KATRIEN VERBRUGGE ; ERIK R LOOPSTRA ; ANTONIUS LEENDERS MARTINUS HENDRIKUS ; SILVESTER MATHEUS REIJNDERS ; DERK SERVATIUS GERTRUDA BROUNS ; ROBERT GABRIEL MARIA LANSBERGEN ; JORGE MANUEL AZEREDO LIMA ; ANNE JOHANNES WILHELMUS VAN LIEVENOOGEN ; JEROME FRANCOIS SYLVAIN VIRGILE VAN LOO ; MARC BRUIJN</creatorcontrib><description>To provide an improved tool and method for a mask assembly.SOLUTION: There is provided a tool for a mask assembly suitable for use in a lithographic process. The mask assembly comprises: a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount. The mount provides a releasably engageable attachment between the patterning device and the pellicle frame.SELECTED DRAWING: Figure 20
【課題】マスクアセンブリのための改良されたツール及び方法を提供する。【解決手段】リソグラフィプロセスで使用するために好適なマスクアセンブリのためのツールであって、マスクアセンブリは、パターニングデバイスと、ペリクルを支持するように構成されマウントを用いてパターニングデバイス上に装着されるペリクルフレームと、を備え、マウントは、パターニングデバイスとペリクルフレームとの間に解除可能な係合可能取り付けを提供する。【選択図】図２０</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240402&DB=EPODOC&CC=JP&NR=2024045512A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240402&DB=EPODOC&CC=JP&NR=2024045512A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ROLAND JACOBUS JOHANNES KERSTENS</creatorcontrib><creatorcontrib>ANGELO CESAR PETER DE KLERK</creatorcontrib><creatorcontrib>MICHEL LOOS</creatorcontrib><creatorcontrib>VAN DER MEULEN FRITS</creatorcontrib><creatorcontrib>FRANK JOHANNES CHRISTIAAN THEUERZEIT</creatorcontrib><creatorcontrib>PAUL JANSSEN</creatorcontrib><creatorcontrib>JEROEN DEKKERS</creatorcontrib><creatorcontrib>MAARTEN MATHIJS MARINUS JANSEN</creatorcontrib><creatorcontrib>GEERT MIDDEL</creatorcontrib><creatorcontrib>MAURICE LEONARDUS JOHANNES JANSSEN</creatorcontrib><creatorcontrib>KRUIZINGA MATTHIAS</creatorcontrib><creatorcontrib>MARTINUS JOZEF MARIA KESTERS</creatorcontrib><creatorcontrib>GERRIT VAN DEN BOSCH</creatorcontrib><creatorcontrib>JACOBUS MARIA DINGS</creatorcontrib><creatorcontrib>KRAMER RONALD HARM GUNTHER</creatorcontrib><creatorcontrib>BEATRIJS LOUISE MARIE-JOSEPH KATRIEN VERBRUGGE</creatorcontrib><creatorcontrib>ERIK R LOOPSTRA</creatorcontrib><creatorcontrib>ANTONIUS LEENDERS MARTINUS HENDRIKUS</creatorcontrib><creatorcontrib>SILVESTER MATHEUS REIJNDERS</creatorcontrib><creatorcontrib>DERK SERVATIUS GERTRUDA BROUNS</creatorcontrib><creatorcontrib>ROBERT GABRIEL MARIA LANSBERGEN</creatorcontrib><creatorcontrib>JORGE MANUEL AZEREDO LIMA</creatorcontrib><creatorcontrib>ANNE JOHANNES WILHELMUS VAN LIEVENOOGEN</creatorcontrib><creatorcontrib>JEROME FRANCOIS SYLVAIN VIRGILE VAN LOO</creatorcontrib><creatorcontrib>MARC BRUIJN</creatorcontrib><title>APPARATUS</title><description>To provide an improved tool and method for a mask assembly.SOLUTION: There is provided a tool for a mask assembly suitable for use in a lithographic process. The mask assembly comprises: a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount. The mount provides a releasably engageable attachment between the patterning device and the pellicle frame.SELECTED DRAWING: Figure 20
【課題】マスクアセンブリのための改良されたツール及び方法を提供する。【解決手段】リソグラフィプロセスで使用するために好適なマスクアセンブリのためのツールであって、マスクアセンブリは、パターニングデバイスと、ペリクルを支持するように構成されマウントを用いてパターニングデバイス上に装着されるペリクルフレームと、を備え、マウントは、パターニングデバイスとペリクルフレームとの間に解除可能な係合可能取り付けを提供する。【選択図】図２０</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOB0DAhwDHIMCQ3mYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBkYmBiampoZGjsZEKQIAeagcBw</recordid><startdate>20240402</startdate><enddate>20240402</enddate><creator>ROLAND JACOBUS JOHANNES KERSTENS</creator><creator>ANGELO CESAR PETER DE KLERK</creator><creator>MICHEL LOOS</creator><creator>VAN DER MEULEN FRITS</creator><creator>FRANK JOHANNES CHRISTIAAN THEUERZEIT</creator><creator>PAUL JANSSEN</creator><creator>JEROEN DEKKERS</creator><creator>MAARTEN MATHIJS MARINUS JANSEN</creator><creator>GEERT MIDDEL</creator><creator>MAURICE LEONARDUS JOHANNES JANSSEN</creator><creator>KRUIZINGA MATTHIAS</creator><creator>MARTINUS JOZEF MARIA KESTERS</creator><creator>GERRIT VAN DEN BOSCH</creator><creator>JACOBUS MARIA DINGS</creator><creator>KRAMER RONALD HARM GUNTHER</creator><creator>BEATRIJS LOUISE MARIE-JOSEPH KATRIEN VERBRUGGE</creator><creator>ERIK R LOOPSTRA</creator><creator>ANTONIUS LEENDERS MARTINUS HENDRIKUS</creator><creator>SILVESTER MATHEUS REIJNDERS</creator><creator>DERK SERVATIUS GERTRUDA BROUNS</creator><creator>ROBERT GABRIEL MARIA LANSBERGEN</creator><creator>JORGE MANUEL AZEREDO LIMA</creator><creator>ANNE JOHANNES WILHELMUS VAN LIEVENOOGEN</creator><creator>JEROME FRANCOIS SYLVAIN VIRGILE VAN LOO</creator><creator>MARC BRUIJN</creator><scope>EVB</scope></search><sort><creationdate>20240402</creationdate><title>APPARATUS</title><author>ROLAND JACOBUS JOHANNES KERSTENS ; 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The mask assembly comprises: a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount. The mount provides a releasably engageable attachment between the patterning device and the pellicle frame.SELECTED DRAWING: Figure 20
【課題】マスクアセンブリのための改良されたツール及び方法を提供する。【解決手段】リソグラフィプロセスで使用するために好適なマスクアセンブリのためのツールであって、マスクアセンブリは、パターニングデバイスと、ペリクルを支持するように構成されマウントを用いてパターニングデバイス上に装着されるペリクルフレームと、を備え、マウントは、パターニングデバイスとペリクルフレームとの間に解除可能な係合可能取り付けを提供する。【選択図】図２０</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | APPARATUS |
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