PROCESSING LIQUID, METHOD FOR PROCESSING OBJECT TO BE PROCESSED AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
To provide a processing liquid with excellent Cu corrosion inhibition and organic residue removal properties.SOLUTION: A processing liquid contains a reducing agent and at least one specific compound selected from the group consisting of dehydroascorbic acid, 2,3-diketogulonic acid, 4-oxalocrotonic...
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| creator | OUCHI NAOKO KAMIMURA TETSUYA MURO SUKETSUGU MATSUMOTO HANAE |
| description | To provide a processing liquid with excellent Cu corrosion inhibition and organic residue removal properties.SOLUTION: A processing liquid contains a reducing agent and at least one specific compound selected from the group consisting of dehydroascorbic acid, 2,3-diketogulonic acid, 4-oxalocrotonic acid, and 3,4,5-trioxocyclohexane-1-carboxylic acid.SELECTED DRAWING: None
【課題】Ｃｕの腐食抑制性に優れ、かつ、有機残渣除去性にも優れる処理液を提供すること。【解決手段】還元剤と、デヒドロアスコルビン酸、２，３－ジケトグロン酸、４－オキサロクロトン酸、及び、３，４，５－トリオキソシクロヘキサン－１－カルボン酸からなる群から選択される少なくとも１種の特定化合物と、を含む処理液。【選択図】なし |
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【課題】Ｃｕの腐食抑制性に優れ、かつ、有機残渣除去性にも優れる処理液を提供すること。【解決手段】還元剤と、デヒドロアスコルビン酸、２，３－ジケトグロン酸、４－オキサロクロトン酸、及び、３，４，５－トリオキソシクロヘキサン－１－カルボン酸からなる群から選択される少なくとも１種の特定化合物と、を含む処理液。【選択図】なし</description><language>eng ; jpn</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; BASIC ELECTRIC ELEMENTS ; CANDLES ; CHEMISTRY ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FATTY ACIDS THEREFROM ; METALLURGY ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SEMICONDUCTOR DEVICES ; SOAP OR SOAP-MAKING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240402&DB=EPODOC&CC=JP&NR=2024045009A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240402&DB=EPODOC&CC=JP&NR=2024045009A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OUCHI NAOKO</creatorcontrib><creatorcontrib>KAMIMURA TETSUYA</creatorcontrib><creatorcontrib>MURO SUKETSUGU</creatorcontrib><creatorcontrib>MATSUMOTO HANAE</creatorcontrib><title>PROCESSING LIQUID, METHOD FOR PROCESSING OBJECT TO BE PROCESSED AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE</title><description>To provide a processing liquid with excellent Cu corrosion inhibition and organic residue removal properties.SOLUTION: A processing liquid contains a reducing agent and at least one specific compound selected from the group consisting of dehydroascorbic acid, 2,3-diketogulonic acid, 4-oxalocrotonic acid, and 3,4,5-trioxocyclohexane-1-carboxylic acid.SELECTED DRAWING: None
【課題】Ｃｕの腐食抑制性に優れ、かつ、有機残渣除去性にも優れる処理液を提供すること。【解決手段】還元剤と、デヒドロアスコルビン酸、２，３－ジケトグロン酸、４－オキサロクロトン酸、及び、３，４，５－トリオキソシクロヘキサン－１－カルボン酸からなる群から選択される少なくとも１種の特定化合物と、を含む処理液。【選択図】なし</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>METALLURGY</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SOAP OR SOAP-MAKING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi70KwjAURrM4iPoOF2eFUOvgmN7c2BSb1Py4liJxEq3U90cFhY5OH3znnCl7NM4iea_NHg76GLVcQU2htBKUdTCitqgIAwQLBf1-kiCMHAe1MFEJDNF9Gk-1RmtkxPBmkk4aac4ml-46pMV3Z2ypKGC5Tv29TUPfndMtPduqyXiW83zL-U5s_pJeeH84fQ</recordid><startdate>20240402</startdate><enddate>20240402</enddate><creator>OUCHI NAOKO</creator><creator>KAMIMURA TETSUYA</creator><creator>MURO SUKETSUGU</creator><creator>MATSUMOTO HANAE</creator><scope>EVB</scope></search><sort><creationdate>20240402</creationdate><title>PROCESSING LIQUID, METHOD FOR PROCESSING OBJECT TO BE PROCESSED AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE</title><author>OUCHI NAOKO ; KAMIMURA TETSUYA ; MURO SUKETSUGU ; MATSUMOTO HANAE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2024045009A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2024</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>METALLURGY</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SOAP OR SOAP-MAKING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>OUCHI NAOKO</creatorcontrib><creatorcontrib>KAMIMURA TETSUYA</creatorcontrib><creatorcontrib>MURO SUKETSUGU</creatorcontrib><creatorcontrib>MATSUMOTO HANAE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OUCHI NAOKO</au><au>KAMIMURA TETSUYA</au><au>MURO SUKETSUGU</au><au>MATSUMOTO HANAE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCESSING LIQUID, METHOD FOR PROCESSING OBJECT TO BE PROCESSED AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE</title><date>2024-04-02</date><risdate>2024</risdate><abstract>To provide a processing liquid with excellent Cu corrosion inhibition and organic residue removal properties.SOLUTION: A processing liquid contains a reducing agent and at least one specific compound selected from the group consisting of dehydroascorbic acid, 2,3-diketogulonic acid, 4-oxalocrotonic acid, and 3,4,5-trioxocyclohexane-1-carboxylic acid.SELECTED DRAWING: None
【課題】Ｃｕの腐食抑制性に優れ、かつ、有機残渣除去性にも優れる処理液を提供すること。【解決手段】還元剤と、デヒドロアスコルビン酸、２，３－ジケトグロン酸、４－オキサロクロトン酸、及び、３，４，５－トリオキソシクロヘキサン－１－カルボン酸からなる群から選択される少なくとも１種の特定化合物と、を含む処理液。【選択図】なし</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | PROCESSING LIQUID, METHOD FOR PROCESSING OBJECT TO BE PROCESSED AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
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