BOARD CLEANING DEVICE AND BOARD CLEANING METHOD
To provide a board cleaning device with which it is possible to improve the cleanliness of one side of a board after cleaning by a brush and reduce the consumed amount of a cleaning fluid that is used for cleaning the one side of the board.SOLUTION: A board cleaning device SSR comprises a spin chuck...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide a board cleaning device with which it is possible to improve the cleanliness of one side of a board after cleaning by a brush and reduce the consumed amount of a cleaning fluid that is used for cleaning the one side of the board.SOLUTION: A board cleaning device SSR comprises a spin chuck 10, a liquid supply mechanism 20, a brush pressing mechanism 30, and a brush BR. The spin chuck 10 holds and rotates a board W. The liquid supply mechanism 20 supplies a cleaning fluid onto one side of the board W that is held and rotated by the spin chuck 10. The bush pressing mechanism 30 presses the brush BR against the rotating one side of the board W during a predetermined pressing period. The liquid supply mechanism 20 supplies the cleaning fluid at a predetermined reference flow rate onto the one side of the board W before the pressing period. Furthermore, the liquid supply mechanism 20 supplies, or stops supplying, the cleaning fluid at a flow rate smaller than the reference flow rate onto the one side of the board W during at least a part of the pressing period.SELECTED DRAWING: Figure 1
【課題】ブラシによる洗浄後の基板の一面の清浄度を向上させるとともに基板の一面の洗浄に用いる洗浄液の消費量を低減可能な基板洗浄装置を提供する。【解決手段】基板洗浄装置SSRは、スピンチャック10、液供給機構20、ブラシ押圧機構30およびブラシBRを備える。スピンチャック10は、基板Wを保持しつつ回転させる。液供給機構20は、スピンチャック10により保持されて回転する基板Wの一面上に洗浄液を供給する。ブラシ押圧機構30は、予め定められた押圧期間中、ブラシBRを回転する基板Wの一面に向けて押圧する。液供給機構20は、押圧期間の前に、基板Wの一面上に予め定められた基準流量で洗浄液を供給する。また、液供給機構20は、押圧期間のうち少なくとも一部の期間中、基板Wの一面上に基準流量よりも小さい流量で洗浄液を供給するか、または洗浄液の供給を停止する。【選択図】図1 |
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