CHANNEL DEVICE
To provide a channel device that minimizes bubble formation in the channel.SOLUTION: A channel device (1) includes a base material (2) with a channel groove (23), and a covering material that is integrated with the substrate (2) so as to cover the channel groove (23). The channel groove (23) has a g...
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| creator | YAMANOUCHI GO YAKUMARU KOSUKE |
| description | To provide a channel device that minimizes bubble formation in the channel.SOLUTION: A channel device (1) includes a base material (2) with a channel groove (23), and a covering material that is integrated with the substrate (2) so as to cover the channel groove (23). The channel groove (23) has a groove width of 500 μm or more. The contact angle with pure water on the surface of the channel groove (23) is 35° or more and 60° or less.SELECTED DRAWING: Figure 2
【課題】流路内で気泡が発生しにくい流路デバイスを実現する。【解決手段】流路デバイス（１）は、流路溝（２３）を有する基材（２）と、流路溝（２３）を覆うように基材（２）に一体化される被覆材とを備える。流路溝（２３）は、溝幅が５００μｍ以上である。流路溝（２３）の表面における純水に対する接触角が、３５°以上６０°以下である。【選択図】図２ |
| format | Patent |
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【課題】流路内で気泡が発生しにくい流路デバイスを実現する。【解決手段】流路デバイス（１）は、流路溝（２３）を有する基材（２）と、流路溝（２３）を覆うように基材（２）に一体化される被覆材とを備える。流路溝（２３）は、溝幅が５００μｍ以上である。流路溝（２３）の表面における純水に対する接触角が、３５°以上６０°以下である。【選択図】図２</description><language>eng ; jpn</language><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES ; MICROSTRUCTURAL TECHNOLOGY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PHYSICS ; TESTING ; THEIR RELEVANT APPARATUS ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240119&DB=EPODOC&CC=JP&NR=2024008371A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240119&DB=EPODOC&CC=JP&NR=2024008371A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMANOUCHI GO</creatorcontrib><creatorcontrib>YAKUMARU KOSUKE</creatorcontrib><title>CHANNEL DEVICE</title><description>To provide a channel device that minimizes bubble formation in the channel.SOLUTION: A channel device (1) includes a base material (2) with a channel groove (23), and a covering material that is integrated with the substrate (2) so as to cover the channel groove (23). The channel groove (23) has a groove width of 500 μm or more. The contact angle with pure water on the surface of the channel groove (23) is 35° or more and 60° or less.SELECTED DRAWING: Figure 2
【課題】流路内で気泡が発生しにくい流路デバイスを実現する。【解決手段】流路デバイス（１）は、流路溝（２３）を有する基材（２）と、流路溝（２３）を覆うように基材（２）に一体化される被覆材とを備える。流路溝（２３）は、溝幅が５００μｍ以上である。流路溝（２３）の表面における純水に対する接触角が、３５°以上６０°以下である。【選択図】図２</description><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES</subject><subject>MICROSTRUCTURAL TECHNOLOGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>PHYSICS</subject><subject>TESTING</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOBz9nD083P1UXBxDfN0duVhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGRiYGBhbG5oaOxkQpAgDuGh0o</recordid><startdate>20240119</startdate><enddate>20240119</enddate><creator>YAMANOUCHI GO</creator><creator>YAKUMARU KOSUKE</creator><scope>EVB</scope></search><sort><creationdate>20240119</creationdate><title>CHANNEL DEVICE</title><author>YAMANOUCHI GO ; YAKUMARU KOSUKE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2024008371A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2024</creationdate><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES</topic><topic>MICROSTRUCTURAL TECHNOLOGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>PHYSICS</topic><topic>TESTING</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMANOUCHI GO</creatorcontrib><creatorcontrib>YAKUMARU KOSUKE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMANOUCHI GO</au><au>YAKUMARU KOSUKE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CHANNEL DEVICE</title><date>2024-01-19</date><risdate>2024</risdate><abstract>To provide a channel device that minimizes bubble formation in the channel.SOLUTION: A channel device (1) includes a base material (2) with a channel groove (23), and a covering material that is integrated with the substrate (2) so as to cover the channel groove (23). The channel groove (23) has a groove width of 500 μm or more. The contact angle with pure water on the surface of the channel groove (23) is 35° or more and 60° or less.SELECTED DRAWING: Figure 2
【課題】流路内で気泡が発生しにくい流路デバイスを実現する。【解決手段】流路デバイス（１）は、流路溝（２３）を有する基材（２）と、流路溝（２３）を覆うように基材（２）に一体化される被覆材とを備える。流路溝（２３）は、溝幅が５００μｍ以上である。流路溝（２３）の表面における純水に対する接触角が、３５°以上６０°以下である。【選択図】図２</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS TESTING THEIR RELEVANT APPARATUS TRANSPORTING |
| title | CHANNEL DEVICE |
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