TUNGSTEN TARGET AND METHOD FOR MANUFACTURING THE SAME

To provide a tungsten target capable of suppressing the formation of pores causing the generation of particles to control the size and distribution thereof with high accuracy, and a method for manufacturing the same.SOLUTION: A tungsten target formed of the sintered body of tungsten powder has a rel...

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Bibliographische Detailangaben
Hauptverfasser:	OKUBO TAKU, SAKAMOTO TAIGA, SHIBASAKI KAZUMA, NAKAMURA RYOTA, TEZUKA NAOTO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ALLOYS CASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER METALLURGY PERFORMING OPERATIONS POWDER METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS WORKING METALLIC POWDER
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Beschreibung
Zusammenfassung:	To provide a tungsten target capable of suppressing the formation of pores causing the generation of particles to control the size and distribution thereof with high accuracy, and a method for manufacturing the same.SOLUTION: A tungsten target formed of the sintered body of tungsten powder has a relative density of 99% or more. In an observation area of 0.15 mm2, pores having a size of 0.01 μm2 or more and less than 0.2 μm2 are 20 or less pieces; pores having a size of 0.2 μm2 or more and less than 1.8 μm2 are five or less pieces; and pores having a size of 1.8 μm2 or more are 1 or less pieces.SELECTED DRAWING: None 【課題】パーティクルの発生原因であるポアの生成を抑え、そのサイズと分布を高精度に制御したタングステンターゲット及びその製造方法を提供する。【解決手段】タングステン粉末の焼結体で形成されたタングステンターゲットであって、相対密度が９９％以上であり、０．１５ｍｍ２の観察領域において、０．０１μｍ２以上０．２μｍ２未満の大きさのポアが２０個以下であり、０．２μｍ２以上１．８μｍ２未満の大きさのポアが５個以下であり、１．８μｍ２以上の大きさのポアが１個以下であるタングステンターゲット。【選択図】なし