SUBSTRATE HOLDER FOR USE IN LITHOGRAPHY DEVICE
To provide a substrate holder having acceptable compromise between performance of the substrate holder at a viewpoint of surface smoothness and cleanliness of a substrate and reduction of movement of an immersion liquid along an undersurface of the substrate.SOLUTION: The substrate holder is configu...
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| creator | ROGER ANTON MARIE TIMMERMANS SIMON KAREL RAVENSBERGEN MARK CONSTANT JOHANNES BAGGEN MARCUS MARTINUS PETRUS ADRIANUS VERMEULEN NIEK JACOBS JOHANNES ROSET FRANK PIETER ALBERT VAN DEN BERKMORTEL GIJS KRAMER |
| description | To provide a substrate holder having acceptable compromise between performance of the substrate holder at a viewpoint of surface smoothness and cleanliness of a substrate and reduction of movement of an immersion liquid along an undersurface of the substrate.SOLUTION: The substrate holder is configured to support the substrate for use in a lithography device. The substrate holder includes: a main body having a body surface; a plurality of main bars protruding from the body surface, each main bar of which has a distal end face configured to support the substrate; a first seal member which protrudes from the body surface, has a top face, and is configured so as to surround the plurality of the main bars and suppress passing of a liquid existing between the substrate and the body surface past the first seal member and flowing to the inside in a radial direction; and a plurality of minor bars protruding from the top face of the first seal member, each minor bar of which has a distal end face configured to support the substrate.SELECTED DRAWING: Figure 3
【課題】基板の平坦性及び清浄度の観点における基板ホルダの性能と基板の下面に沿った液浸液の移動の低減との間で許容できる妥協点を有する基板ホルダを提供する。【解決手段】リソグラフィ装置において使用するための、基板を支持するよう構成された基板ホルダ。この基板ホルダは、本体表面を有する本体と、本体表面から突出している複数のメインバールであって、各メインバールは基板を支持するよう構成された遠位端面を有する、メインバールと、本体表面から突出し、上面を有する第１のシール部材であって、複数のメインバールを取り囲み、基板と前記本体表面との間の液体が第１のシール部材を通り過ぎて半径方向内側へ流れるのを抑制するよう構成されている、第１のシール部材と、第１のシール部材の上面から突出している複数のマイナーバールであって、各マイナーバールは基板を支持するよう構成された遠位端面を有する、マイナーバールと、を備えている。【選択図】 図３ |
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【課題】基板の平坦性及び清浄度の観点における基板ホルダの性能と基板の下面に沿った液浸液の移動の低減との間で許容できる妥協点を有する基板ホルダを提供する。【解決手段】リソグラフィ装置において使用するための、基板を支持するよう構成された基板ホルダ。この基板ホルダは、本体表面を有する本体と、本体表面から突出している複数のメインバールであって、各メインバールは基板を支持するよう構成された遠位端面を有する、メインバールと、本体表面から突出し、上面を有する第１のシール部材であって、複数のメインバールを取り囲み、基板と前記本体表面との間の液体が第１のシール部材を通り過ぎて半径方向内側へ流れるのを抑制するよう構成されている、第１のシール部材と、第１のシール部材の上面から突出している複数のマイナーバールであって、各マイナーバールは基板を支持するよう構成された遠位端面を有する、マイナーバールと、を備えている。【選択図】 図３</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231208&DB=EPODOC&CC=JP&NR=2023174658A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231208&DB=EPODOC&CC=JP&NR=2023174658A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ROGER ANTON MARIE TIMMERMANS</creatorcontrib><creatorcontrib>SIMON KAREL RAVENSBERGEN</creatorcontrib><creatorcontrib>MARK CONSTANT JOHANNES BAGGEN</creatorcontrib><creatorcontrib>MARCUS MARTINUS PETRUS ADRIANUS VERMEULEN</creatorcontrib><creatorcontrib>NIEK JACOBS JOHANNES ROSET</creatorcontrib><creatorcontrib>FRANK PIETER ALBERT VAN DEN BERKMORTEL</creatorcontrib><creatorcontrib>GIJS KRAMER</creatorcontrib><title>SUBSTRATE HOLDER FOR USE IN LITHOGRAPHY DEVICE</title><description>To provide a substrate holder having acceptable compromise between performance of the substrate holder at a viewpoint of surface smoothness and cleanliness of a substrate and reduction of movement of an immersion liquid along an undersurface of the substrate.SOLUTION: The substrate holder is configured to support the substrate for use in a lithography device. The substrate holder includes: a main body having a body surface; a plurality of main bars protruding from the body surface, each main bar of which has a distal end face configured to support the substrate; a first seal member which protrudes from the body surface, has a top face, and is configured so as to surround the plurality of the main bars and suppress passing of a liquid existing between the substrate and the body surface past the first seal member and flowing to the inside in a radial direction; and a plurality of minor bars protruding from the top face of the first seal member, each minor bar of which has a distal end face configured to support the substrate.SELECTED DRAWING: Figure 3
【課題】基板の平坦性及び清浄度の観点における基板ホルダの性能と基板の下面に沿った液浸液の移動の低減との間で許容できる妥協点を有する基板ホルダを提供する。【解決手段】リソグラフィ装置において使用するための、基板を支持するよう構成された基板ホルダ。この基板ホルダは、本体表面を有する本体と、本体表面から突出している複数のメインバールであって、各メインバールは基板を支持するよう構成された遠位端面を有する、メインバールと、本体表面から突出し、上面を有する第１のシール部材であって、複数のメインバールを取り囲み、基板と前記本体表面との間の液体が第１のシール部材を通り過ぎて半径方向内側へ流れるのを抑制するよう構成されている、第１のシール部材と、第１のシール部材の上面から突出している複数のマイナーバールであって、各マイナーバールは基板を支持するよう構成された遠位端面を有する、マイナーバールと、を備えている。【選択図】 図３</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNALDnUKDglyDHFV8PD3cXENUnDzD1IIDXZV8PRT8PEM8fB3D3IM8IhUcHEN83R25WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgZGxobmJmamFo7GRCkCAC94JjY</recordid><startdate>20231208</startdate><enddate>20231208</enddate><creator>ROGER ANTON MARIE TIMMERMANS</creator><creator>SIMON KAREL RAVENSBERGEN</creator><creator>MARK CONSTANT JOHANNES BAGGEN</creator><creator>MARCUS MARTINUS PETRUS ADRIANUS VERMEULEN</creator><creator>NIEK JACOBS JOHANNES ROSET</creator><creator>FRANK PIETER ALBERT VAN DEN BERKMORTEL</creator><creator>GIJS KRAMER</creator><scope>EVB</scope></search><sort><creationdate>20231208</creationdate><title>SUBSTRATE HOLDER FOR USE IN LITHOGRAPHY DEVICE</title><author>ROGER ANTON MARIE TIMMERMANS ; SIMON KAREL RAVENSBERGEN ; MARK CONSTANT JOHANNES BAGGEN ; MARCUS MARTINUS PETRUS ADRIANUS VERMEULEN ; NIEK JACOBS JOHANNES ROSET ; FRANK PIETER ALBERT VAN DEN BERKMORTEL ; GIJS KRAMER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2023174658A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>ROGER ANTON MARIE TIMMERMANS</creatorcontrib><creatorcontrib>SIMON KAREL RAVENSBERGEN</creatorcontrib><creatorcontrib>MARK CONSTANT JOHANNES BAGGEN</creatorcontrib><creatorcontrib>MARCUS MARTINUS PETRUS ADRIANUS VERMEULEN</creatorcontrib><creatorcontrib>NIEK JACOBS JOHANNES ROSET</creatorcontrib><creatorcontrib>FRANK PIETER ALBERT VAN DEN BERKMORTEL</creatorcontrib><creatorcontrib>GIJS KRAMER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ROGER ANTON MARIE TIMMERMANS</au><au>SIMON KAREL RAVENSBERGEN</au><au>MARK CONSTANT JOHANNES BAGGEN</au><au>MARCUS MARTINUS PETRUS ADRIANUS VERMEULEN</au><au>NIEK JACOBS JOHANNES ROSET</au><au>FRANK PIETER ALBERT VAN DEN BERKMORTEL</au><au>GIJS KRAMER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE HOLDER FOR USE IN LITHOGRAPHY DEVICE</title><date>2023-12-08</date><risdate>2023</risdate><abstract>To provide a substrate holder having acceptable compromise between performance of the substrate holder at a viewpoint of surface smoothness and cleanliness of a substrate and reduction of movement of an immersion liquid along an undersurface of the substrate.SOLUTION: The substrate holder is configured to support the substrate for use in a lithography device. The substrate holder includes: a main body having a body surface; a plurality of main bars protruding from the body surface, each main bar of which has a distal end face configured to support the substrate; a first seal member which protrudes from the body surface, has a top face, and is configured so as to surround the plurality of the main bars and suppress passing of a liquid existing between the substrate and the body surface past the first seal member and flowing to the inside in a radial direction; and a plurality of minor bars protruding from the top face of the first seal member, each minor bar of which has a distal end face configured to support the substrate.SELECTED DRAWING: Figure 3
【課題】基板の平坦性及び清浄度の観点における基板ホルダの性能と基板の下面に沿った液浸液の移動の低減との間で許容できる妥協点を有する基板ホルダを提供する。【解決手段】リソグラフィ装置において使用するための、基板を支持するよう構成された基板ホルダ。この基板ホルダは、本体表面を有する本体と、本体表面から突出している複数のメインバールであって、各メインバールは基板を支持するよう構成された遠位端面を有する、メインバールと、本体表面から突出し、上面を有する第１のシール部材であって、複数のメインバールを取り囲み、基板と前記本体表面との間の液体が第１のシール部材を通り過ぎて半径方向内側へ流れるのを抑制するよう構成されている、第１のシール部材と、第１のシール部材の上面から突出している複数のマイナーバールであって、各マイナーバールは基板を支持するよう構成された遠位端面を有する、マイナーバールと、を備えている。【選択図】 図３</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | SUBSTRATE HOLDER FOR USE IN LITHOGRAPHY DEVICE |
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