FILTER BASE MATERIAL
To provide a filter base material capable of providing an air filter and a mask where breathing is easy by having low pressure loss and excellent air permeability and the reduction of collection efficiency after washing is low even when being reused after washing.SOLUTION: In a filter base material...
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| creator | KAWATSU YOSHIAKI SHIRATAKE TAKUMA TANAKA MASANAO AIKO NAOMASA WAKAMOTO YUTA TARAO TAKASHI |
| description | To provide a filter base material capable of providing an air filter and a mask where breathing is easy by having low pressure loss and excellent air permeability and the reduction of collection efficiency after washing is low even when being reused after washing.SOLUTION: In a filter base material with a fiber layer, a non-fibrous material where the constitution fibers of the fiber layer are bonded each other exists on one main surface of the fiber layer. The breaking and cracking of the fiber layer are prevented since specular gloss on one main surface of the fiber layer is larger than 8.8 even when the average fiber diameter of the fiber layer of the filter base material is 400 nm or less. An air filter and a mask having low collection efficiency after washing can be provided. The air filter and the mask where breathing is easy by low pressure loss and excellent air permeability since specular gloss on one main surface of the fiber layer is smaller than 46.6 can be provided.SELECTED DRAWING: None
【課題】圧力損失が低く通気性に優れることで息がし易いと共に、洗浄して再使用した場合であっても、洗浄後における捕集効率の低下が少ないエアフィルタやマスクを提供可能な、フィルタ用基材の提供を課題とする。【解決手段】本発明にかかる繊維層を備えたフィルタ用基材は、当該繊維層の一方の主面に、前記繊維層の構成繊維同士を接着している非繊維状物が存在している。平均繊維径が４００ｎｍ以下の繊維層を備えたフィルタ用基材であっても、前記繊維層の一方の主面における鏡面光沢度が８．８より大きいことによって、当該繊維層は破断や亀裂の発生が防止されており、洗浄後における捕集効率の低下が少ないエアフィルタやマスクを提供可能である。また、前記繊維層の一方の主面における鏡面光沢度が４６．６より小さいことによって、圧力損失が低く通気性に優れることで息がし易いエアフィルタやマスクを提供できる。【選択図】 なし |
| format | Patent |
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【課題】圧力損失が低く通気性に優れることで息がし易いと共に、洗浄して再使用した場合であっても、洗浄後における捕集効率の低下が少ないエアフィルタやマスクを提供可能な、フィルタ用基材の提供を課題とする。【解決手段】本発明にかかる繊維層を備えたフィルタ用基材は、当該繊維層の一方の主面に、前記繊維層の構成繊維同士を接着している非繊維状物が存在している。平均繊維径が４００ｎｍ以下の繊維層を備えたフィルタ用基材であっても、前記繊維層の一方の主面における鏡面光沢度が８．８より大きいことによって、当該繊維層は破断や亀裂の発生が防止されており、洗浄後における捕集効率の低下が少ないエアフィルタやマスクを提供可能である。また、前記繊維層の一方の主面における鏡面光沢度が４６．６より小さいことによって、圧力損失が低く通気性に優れることで息がし易いエアフィルタやマスクを提供できる。【選択図】 なし</description><language>eng ; jpn</language><subject>BRAIDING ; COTTON-WOOL ; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS ; KNITTING ; LACE-MAKING ; MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL ; NON-WOVEN FABRICS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; TEXTILES ; TRANSPORTING ; TRIMMINGS ; WADDING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231108&DB=EPODOC&CC=JP&NR=2023161597A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231108&DB=EPODOC&CC=JP&NR=2023161597A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAWATSU YOSHIAKI</creatorcontrib><creatorcontrib>SHIRATAKE TAKUMA</creatorcontrib><creatorcontrib>TANAKA MASANAO</creatorcontrib><creatorcontrib>AIKO NAOMASA</creatorcontrib><creatorcontrib>WAKAMOTO YUTA</creatorcontrib><creatorcontrib>TARAO TAKASHI</creatorcontrib><title>FILTER BASE MATERIAL</title><description>To provide a filter base material capable of providing an air filter and a mask where breathing is easy by having low pressure loss and excellent air permeability and the reduction of collection efficiency after washing is low even when being reused after washing.SOLUTION: In a filter base material with a fiber layer, a non-fibrous material where the constitution fibers of the fiber layer are bonded each other exists on one main surface of the fiber layer. The breaking and cracking of the fiber layer are prevented since specular gloss on one main surface of the fiber layer is larger than 8.8 even when the average fiber diameter of the fiber layer of the filter base material is 400 nm or less. An air filter and a mask having low collection efficiency after washing can be provided. The air filter and the mask where breathing is easy by low pressure loss and excellent air permeability since specular gloss on one main surface of the fiber layer is smaller than 46.6 can be provided.SELECTED DRAWING: None
【課題】圧力損失が低く通気性に優れることで息がし易いと共に、洗浄して再使用した場合であっても、洗浄後における捕集効率の低下が少ないエアフィルタやマスクを提供可能な、フィルタ用基材の提供を課題とする。【解決手段】本発明にかかる繊維層を備えたフィルタ用基材は、当該繊維層の一方の主面に、前記繊維層の構成繊維同士を接着している非繊維状物が存在している。平均繊維径が４００ｎｍ以下の繊維層を備えたフィルタ用基材であっても、前記繊維層の一方の主面における鏡面光沢度が８．８より大きいことによって、当該繊維層は破断や亀裂の発生が防止されており、洗浄後における捕集効率の低下が少ないエアフィルタやマスクを提供可能である。また、前記繊維層の一方の主面における鏡面光沢度が４６．６より小さいことによって、圧力損失が低く通気性に優れることで息がし易いエアフィルタやマスクを提供できる。【選択図】 なし</description><subject>BRAIDING</subject><subject>COTTON-WOOL</subject><subject>FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS</subject><subject>KNITTING</subject><subject>LACE-MAKING</subject><subject>MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL</subject><subject>NON-WOVEN FABRICS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>TEXTILES</subject><subject>TRANSPORTING</subject><subject>TRIMMINGS</subject><subject>WADDING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBBx8_QJcQ1ScHIMdlXwdQQyPR19eBhY0xJzilN5oTQ3g5Kba4izh25qQX58anFBYnJqXmpJvFeAkYGRsaGZoamluaMxUYoApCMe5w</recordid><startdate>20231108</startdate><enddate>20231108</enddate><creator>KAWATSU YOSHIAKI</creator><creator>SHIRATAKE TAKUMA</creator><creator>TANAKA MASANAO</creator><creator>AIKO NAOMASA</creator><creator>WAKAMOTO YUTA</creator><creator>TARAO TAKASHI</creator><scope>EVB</scope></search><sort><creationdate>20231108</creationdate><title>FILTER BASE MATERIAL</title><author>KAWATSU YOSHIAKI ; SHIRATAKE TAKUMA ; TANAKA MASANAO ; AIKO NAOMASA ; WAKAMOTO YUTA ; TARAO TAKASHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2023161597A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2023</creationdate><topic>BRAIDING</topic><topic>COTTON-WOOL</topic><topic>FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS</topic><topic>KNITTING</topic><topic>LACE-MAKING</topic><topic>MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL</topic><topic>NON-WOVEN FABRICS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>TEXTILES</topic><topic>TRANSPORTING</topic><topic>TRIMMINGS</topic><topic>WADDING</topic><toplevel>online_resources</toplevel><creatorcontrib>KAWATSU YOSHIAKI</creatorcontrib><creatorcontrib>SHIRATAKE TAKUMA</creatorcontrib><creatorcontrib>TANAKA MASANAO</creatorcontrib><creatorcontrib>AIKO NAOMASA</creatorcontrib><creatorcontrib>WAKAMOTO YUTA</creatorcontrib><creatorcontrib>TARAO TAKASHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAWATSU YOSHIAKI</au><au>SHIRATAKE TAKUMA</au><au>TANAKA MASANAO</au><au>AIKO NAOMASA</au><au>WAKAMOTO YUTA</au><au>TARAO TAKASHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FILTER BASE MATERIAL</title><date>2023-11-08</date><risdate>2023</risdate><abstract>To provide a filter base material capable of providing an air filter and a mask where breathing is easy by having low pressure loss and excellent air permeability and the reduction of collection efficiency after washing is low even when being reused after washing.SOLUTION: In a filter base material with a fiber layer, a non-fibrous material where the constitution fibers of the fiber layer are bonded each other exists on one main surface of the fiber layer. The breaking and cracking of the fiber layer are prevented since specular gloss on one main surface of the fiber layer is larger than 8.8 even when the average fiber diameter of the fiber layer of the filter base material is 400 nm or less. An air filter and a mask having low collection efficiency after washing can be provided. The air filter and the mask where breathing is easy by low pressure loss and excellent air permeability since specular gloss on one main surface of the fiber layer is smaller than 46.6 can be provided.SELECTED DRAWING: None
【課題】圧力損失が低く通気性に優れることで息がし易いと共に、洗浄して再使用した場合であっても、洗浄後における捕集効率の低下が少ないエアフィルタやマスクを提供可能な、フィルタ用基材の提供を課題とする。【解決手段】本発明にかかる繊維層を備えたフィルタ用基材は、当該繊維層の一方の主面に、前記繊維層の構成繊維同士を接着している非繊維状物が存在している。平均繊維径が４００ｎｍ以下の繊維層を備えたフィルタ用基材であっても、前記繊維層の一方の主面における鏡面光沢度が８．８より大きいことによって、当該繊維層は破断や亀裂の発生が防止されており、洗浄後における捕集効率の低下が少ないエアフィルタやマスクを提供可能である。また、前記繊維層の一方の主面における鏡面光沢度が４６．６より小さいことによって、圧力損失が低く通気性に優れることで息がし易いエアフィルタやマスクを提供できる。【選択図】 なし</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BRAIDING COTTON-WOOL FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS KNITTING LACE-MAKING MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL NON-WOVEN FABRICS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TEXTILES TRANSPORTING TRIMMINGS WADDING |
| title | FILTER BASE MATERIAL |
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