PATTERNING METHOD AND PATTERNING DEVICE

To make it possible to develop a pattern exposed on a photoresist film by a dry process.SOLUTION: A patterning method includes an infiltration step and an etching step. The infiltration step is for infiltrating a material that expands a selectivity ratio between an exposed portion and an unexposed p...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TSUZUKI REIKO, YAMAJI TOMOHITO, YAMADA KAZUKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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