WATER QUALITY MEASURING DEVICE AND DEPOSITION PREVENTION METHOD
To provide a water quality measuring device capable of conducting in-water measuring precisely and continuously, and a deposition prevention method capable of desirability suppressing deposition of an organism and a biofilm.SOLUTION: A water quality measuring device includes a sensor apparatus, an i...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; jpn |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | To provide a water quality measuring device capable of conducting in-water measuring precisely and continuously, and a deposition prevention method capable of desirability suppressing deposition of an organism and a biofilm.SOLUTION: A water quality measuring device includes a sensor apparatus, an irradiation apparatus for irradiation of a light to a detector of the sensor apparatus, and a control part for controlling the irradiation apparatus, wherein the water quality measuring device is characterized by that the light irradiated from the irradiation apparatus has a peak in a wavelength region of 400-420 nm, the sensor apparatus conducts detection action in every predetermined desired detecting timing, and the control part conducts control of the irradiation apparatus in a manner that a light is irradiated intermittently from the irradiation apparatus to the detector in every irradiation time other than the desired detecting timing.SELECTED DRAWING: Figure 1
【課題】継続的に水中での測定を正確に行うことができる水質計、及び生物及びバイオフィルムの付着を好ましく抑制できる付着防止方法を提供すること。【解決手段】センサ装置と、センサ装置の検出部に対して光を照射する照射装置と、照射装置を制御する制御部と、を有する水質計であり、照射装置から照射される光は、４００～４２０ｎｍの波長域においてピークを有し、センサ装置は、予め定められた所定の検出タイミング毎に検出動作を行い、制御部は、所定の検出タイミング以外の照射時間毎に照射装置から検出部に対して間欠的に光が照射されるように、照射装置を制御する、水質計。【選択図】図１ |
|---|