METHOD FOR MEASURING PHOTOMASKS

To provide a method for measuring a photomask for semiconductor lithography.SOLUTION: The method includes: recording an aerial image of at least one region of the photomask; defining at least one region of interest (1); ascertaining structure edges (3) in the at least one region of interest (1); pro...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	UTE BUTTGEREIT, THOMAS THALER, DIRK BEYER, DMITRY SIMAKOV, STEFFEN STEINERT
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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