FILM AND METHOD FOR PRODUCING THE SAME
To provide a film which contains a 4-methyl-1-pentene-based polymer and has good film thickness accuracy (thickness-thinness accuracy) with little variation in film thickness and heat resistance and further to provide a method for producing a film by inflation molding which has excellent bubble stab...
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| creator | SASAKI TOYOAKI TANAKA MASAKAZU |
| description | To provide a film which contains a 4-methyl-1-pentene-based polymer and has good film thickness accuracy (thickness-thinness accuracy) with little variation in film thickness and heat resistance and further to provide a method for producing a film by inflation molding which has excellent bubble stability, can be stably molded, contains the 4-methyl-1-pentene-based polymer and has thin film thickness and excellent film thickness accuracy.SOLUTION: There is provided a film which contains a 4-methyl-1-pentene polymer composition (X) satisfying the following requirements (X-1) to (X-4). Requirement (X-1): the density is 0.82 to 0.88 g/m3. Requirement (X-2): the melting point (Tm) is 190 to 250°C. Requirement (X-3): the melting enthalpy ΔH is less than 35 J/g. Requirement (X-4): the semi-crystallization time at 215°C measured by DSC is 220 seconds or more or is not measured.SELECTED DRAWING: None
【課題】本発明は、４－メチル－１－ペンテン系重合体を含み、膜厚にばらつきが少なく膜厚精度（厚薄精度）が良好で、耐熱性を有するフィルムを提供することを課題としている。また本発明は、バブルの安定性に優れ安定成形が可能で、４－メチル－１－ペンテン系重合体を含み膜厚が薄く膜厚精度に優れたフィルムを製造できる、インフレーション成形によるフィルムの製造方法を提供することを課題としている。【解決手段】下記要件（Ｘ－１）～（Ｘ－４）を満たす４－メチル－１－ペンテン系重合体組成物（Ｘ）を含むことを特徴とするフィルム。要件（Ｘ－１）：密度が０．８２～０．８８ｇ／ｍ3。要件（Ｘ－２）：融点（Ｔｍ）が、１９０℃～２５０℃。要件（Ｘ－３）：融解エンタルピーΔＨが３５Ｊ／ｇ未満。要件（Ｘ－４）：ＤＳＣにより測定した２１５℃での半結晶化時間が２２０秒以上であるか、または計測されない。【選択図】なし |
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【課題】本発明は、４－メチル－１－ペンテン系重合体を含み、膜厚にばらつきが少なく膜厚精度（厚薄精度）が良好で、耐熱性を有するフィルムを提供することを課題としている。また本発明は、バブルの安定性に優れ安定成形が可能で、４－メチル－１－ペンテン系重合体を含み膜厚が薄く膜厚精度に優れたフィルムを製造できる、インフレーション成形によるフィルムの製造方法を提供することを課題としている。【解決手段】下記要件（Ｘ－１）～（Ｘ－４）を満たす４－メチル－１－ペンテン系重合体組成物（Ｘ）を含むことを特徴とするフィルム。要件（Ｘ－１）：密度が０．８２～０．８８ｇ／ｍ3。要件（Ｘ－２）：融点（Ｔｍ）が、１９０℃～２５０℃。要件（Ｘ－３）：融解エンタルピーΔＨが３５Ｊ／ｇ未満。要件（Ｘ－４）：ＤＳＣにより測定した２１５℃での半結晶化時間が２２０秒以上であるか、または計測されない。【選択図】なし</description><language>eng ; jpn</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; GENERAL PROCESSES OF COMPOUNDING ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230724&DB=EPODOC&CC=JP&NR=2023102070A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230724&DB=EPODOC&CC=JP&NR=2023102070A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SASAKI TOYOAKI</creatorcontrib><creatorcontrib>TANAKA MASAKAZU</creatorcontrib><title>FILM AND METHOD FOR PRODUCING THE SAME</title><description>To provide a film which contains a 4-methyl-1-pentene-based polymer and has good film thickness accuracy (thickness-thinness accuracy) with little variation in film thickness and heat resistance and further to provide a method for producing a film by inflation molding which has excellent bubble stability, can be stably molded, contains the 4-methyl-1-pentene-based polymer and has thin film thickness and excellent film thickness accuracy.SOLUTION: There is provided a film which contains a 4-methyl-1-pentene polymer composition (X) satisfying the following requirements (X-1) to (X-4). Requirement (X-1): the density is 0.82 to 0.88 g/m3. Requirement (X-2): the melting point (Tm) is 190 to 250°C. Requirement (X-3): the melting enthalpy ΔH is less than 35 J/g. Requirement (X-4): the semi-crystallization time at 215°C measured by DSC is 220 seconds or more or is not measured.SELECTED DRAWING: None
【課題】本発明は、４－メチル－１－ペンテン系重合体を含み、膜厚にばらつきが少なく膜厚精度（厚薄精度）が良好で、耐熱性を有するフィルムを提供することを課題としている。また本発明は、バブルの安定性に優れ安定成形が可能で、４－メチル－１－ペンテン系重合体を含み膜厚が薄く膜厚精度に優れたフィルムを製造できる、インフレーション成形によるフィルムの製造方法を提供することを課題としている。【解決手段】下記要件（Ｘ－１）～（Ｘ－４）を満たす４－メチル－１－ペンテン系重合体組成物（Ｘ）を含むことを特徴とするフィルム。要件（Ｘ－１）：密度が０．８２～０．８８ｇ／ｍ3。要件（Ｘ－２）：融点（Ｔｍ）が、１９０℃～２５０℃。要件（Ｘ－３）：融解エンタルピーΔＨが３５Ｊ／ｇ未満。要件（Ｘ－４）：ＤＳＣにより測定した２１５℃での半結晶化時間が２２０秒以上であるか、または計測されない。【選択図】なし</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFBz8_TxVXD0c1HwdQ3x8HdRcPMPUggI8ncJdfb0c1cI8XBVCHb0deVhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGRsaGBkYG5gaOxkQpAgDYxiN4</recordid><startdate>20230724</startdate><enddate>20230724</enddate><creator>SASAKI TOYOAKI</creator><creator>TANAKA MASAKAZU</creator><scope>EVB</scope></search><sort><creationdate>20230724</creationdate><title>FILM AND METHOD FOR PRODUCING THE SAME</title><author>SASAKI TOYOAKI ; TANAKA MASAKAZU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2023102070A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2023</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>SASAKI TOYOAKI</creatorcontrib><creatorcontrib>TANAKA MASAKAZU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SASAKI TOYOAKI</au><au>TANAKA MASAKAZU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FILM AND METHOD FOR PRODUCING THE SAME</title><date>2023-07-24</date><risdate>2023</risdate><abstract>To provide a film which contains a 4-methyl-1-pentene-based polymer and has good film thickness accuracy (thickness-thinness accuracy) with little variation in film thickness and heat resistance and further to provide a method for producing a film by inflation molding which has excellent bubble stability, can be stably molded, contains the 4-methyl-1-pentene-based polymer and has thin film thickness and excellent film thickness accuracy.SOLUTION: There is provided a film which contains a 4-methyl-1-pentene polymer composition (X) satisfying the following requirements (X-1) to (X-4). Requirement (X-1): the density is 0.82 to 0.88 g/m3. Requirement (X-2): the melting point (Tm) is 190 to 250°C. Requirement (X-3): the melting enthalpy ΔH is less than 35 J/g. Requirement (X-4): the semi-crystallization time at 215°C measured by DSC is 220 seconds or more or is not measured.SELECTED DRAWING: None
【課題】本発明は、４－メチル－１－ペンテン系重合体を含み、膜厚にばらつきが少なく膜厚精度（厚薄精度）が良好で、耐熱性を有するフィルムを提供することを課題としている。また本発明は、バブルの安定性に優れ安定成形が可能で、４－メチル－１－ペンテン系重合体を含み膜厚が薄く膜厚精度に優れたフィルムを製造できる、インフレーション成形によるフィルムの製造方法を提供することを課題としている。【解決手段】下記要件（Ｘ－１）～（Ｘ－４）を満たす４－メチル－１－ペンテン系重合体組成物（Ｘ）を含むことを特徴とするフィルム。要件（Ｘ－１）：密度が０．８２～０．８８ｇ／ｍ3。要件（Ｘ－２）：融点（Ｔｍ）が、１９０℃～２５０℃。要件（Ｘ－３）：融解エンタルピーΔＨが３５Ｊ／ｇ未満。要件（Ｘ－４）：ＤＳＣにより測定した２１５℃での半結晶化時間が２２０秒以上であるか、または計測されない。【選択図】なし</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP |
| title | FILM AND METHOD FOR PRODUCING THE SAME |
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