RESIST COMPOSITION, CURED PRODUCT, MATRIX PATTERN, AND COLORED DISPERSION LIQUID INCLUDING THE SAME, AND METHOD FOR PRODUCING RESIST COMPOSITION

To provide a resist composition that is suitable for forming a cured product (cured film) having excellent curability and patternability even when subjected to low temperature curing.SOLUTION: A photosensitive resin composition contains (A) a partly methacrylated epoxy resin with part of epoxy resin...

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Hauptverfasser:	IWAI KOHEI, ONO YUKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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creator	IWAI KOHEI ONO YUKI
description	To provide a resist composition that is suitable for forming a cured product (cured film) having excellent curability and patternability even when subjected to low temperature curing.SOLUTION: A photosensitive resin composition contains (A) a partly methacrylated epoxy resin with part of epoxy resin being methacrylated, (B) a solvent, (C) a polymerizable unsaturated group-containing alkali-soluble resin, and (D) a photopolymerization initiator.SELECTED DRAWING: None 【課題】低温硬化を行った場合においても、硬化性とパターニング性に優れた硬化物（硬化膜）を形成するような用途に好適なレジスト組成物を提供する。【解決手段】（Ａ）エポキシ樹脂の一部が（メタ）アクリル化された部分(メタ)アクリル化エポキシ樹脂、（Ｂ）溶剤、（Ｃ）重合性不飽和基含有アルカリ可溶性樹脂及び（Ｄ）光重合開始剤を含有することを特徴とするレジスト組成物である。【選択図】なし
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ONO YUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2023097381A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>IWAI KOHEI</creatorcontrib><creatorcontrib>ONO YUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>IWAI KOHEI</au><au>ONO YUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RESIST COMPOSITION, CURED PRODUCT, MATRIX PATTERN, AND COLORED DISPERSION LIQUID INCLUDING THE SAME, AND METHOD FOR PRODUCING RESIST COMPOSITION</title><date>2023-07-07</date><risdate>2023</risdate><abstract>To provide a resist composition that is suitable for forming a cured product (cured film) having excellent curability and patternability even when subjected to low temperature curing.SOLUTION: A photosensitive resin composition contains (A) a partly methacrylated epoxy resin with part of epoxy resin being methacrylated, (B) a solvent, (C) a polymerizable unsaturated group-containing alkali-soluble resin, and (D) a photopolymerization initiator.SELECTED DRAWING: None 【課題】低温硬化を行った場合においても、硬化性とパターニング性に優れた硬化物（硬化膜）を形成するような用途に好適なレジスト組成物を提供する。【解決手段】（Ａ）エポキシ樹脂の一部が（メタ）アクリル化された部分(メタ)アクリル化エポキシ樹脂、（Ｂ）溶剤、（Ｃ）重合性不飽和基含有アルカリ可溶性樹脂及び（Ｄ）光重合開始剤を含有することを特徴とするレジスト組成物である。【選択図】なし</abstract><oa>free_for_read</oa></addata></record>
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language	eng ; jpn
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
title	RESIST COMPOSITION, CURED PRODUCT, MATRIX PATTERN, AND COLORED DISPERSION LIQUID INCLUDING THE SAME, AND METHOD FOR PRODUCING RESIST COMPOSITION
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-18T07%3A18%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=IWAI%20KOHEI&rft.date=2023-07-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2023097381A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true