COATING DEVICE AND COATING METHOD

To suppress coating omission on an opening part of a base material in a coating device forming a coating film on both faces of the base material.SOLUTION: A coating device 20 coats coating liquid C to both faces of a base material 2, and includes: first and second blocks 21, 22 which face to each other in a thickness direction of the base material 2; and a liquid pool part 23 which is formed so that the coating liquid C is pooled in a gap between the first and second blocks 21, 22 and through which the base material 2 is passed. The liquid pool part 23 includes: a base material introducing port 24 which opens to an upstream side in the conveying direction of the base material 2 and into which the base material 2 is introduced; a base material discharge port 25 which opens to a downstream side in the conveying direction and through which the base material 2 is discharged; and side face parts 26 which are located respectively at both sides in a width direction. The second block 22 is provided with a coating liquid supply port 31 facing the liquid pool part 23 and supplying the coating liquid C to the liquid pool part 23. The first block 21 is provided with a coating liquid discharge port 32 facing the liquid pool part 23 and discharging the coating liquid C from the liquid pool part 23.SELECTED DRAWING: Figure 2 【課題】基材の両面に塗膜を形成する塗工装置にて基材開口部への塗布抜けを抑制する。【解決手段】塗工装置２０は、基材２の両面に対して塗液Ｃを塗布し、基材２の厚み方向に互いに対向する第１及び第２ブロック２１，２２と、第１及び第２ブロック２１，２２同士の隙間に塗液Ｃが溜まるように形成されるとともに、基材２が通る液溜り部２３と、を備える。液溜り部２３は、基材２の搬送方向における上流側に開口し、基材２が導入される基材導入口２４と、搬送方向における下流側に開口し、基材２が排出される基材排出口２５と、幅方向の両側にそれぞれ位置する側面部２６と、を含む。第２ブロック２２には、液溜り部２３に臨むとともに液溜り部２３に塗液Ｃを供給する塗液供給口３１が設けられている。第１ブロック２１には、液溜り部２３に臨むとともに液溜り部２３から塗液Ｃを排出する塗液排出口３２が設けられている。【選択図】図２