SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

To provide a substrate treatment apparatus and a substrate treatment method that can use a low melting material as a target.SOLUTION: A substrate treatment apparatus includes: a tray provided in a vacuum treatment vessel and having a recess for accommodating a target of a low melting material; a ref...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HATANO TATSUO, WATANABE NAOKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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