PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PRODUCED USING THE SAME, AND COLOR FILTER
To provide a photosensitive resin composition which causes no oblique line failure even in coating using a spin coat method in a color filter manufacturing step, secures uniformity of the coating, and minimizes a problem due to a foreign matter, especially, even when a color filter is manufactured i...
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| creator | KIM JIHONG KIM JIHYE KIM SABINA SONG HAENI YOO JEONGHO PARK BAEK SOUNG |
| description | To provide a photosensitive resin composition which causes no oblique line failure even in coating using a spin coat method in a color filter manufacturing step, secures uniformity of the coating, and minimizes a problem due to a foreign matter, especially, even when a color filter is manufactured in a thin film form.SOLUTION: A photosensitive resin composition contains (A) a photopolymerizable compound, (B) a photopolymerization initiator, (C) a coloring agent, (D) a binder resin, and (E) a solvent, wherein the solvent contains a first solvent and a second solvent; the first solvent has a boiling point having higher than 0°C and lower than 150°C under 1 atm.; the second solvent has a boiling point of 150°C or higher under 1 atm.; and a content of the first solvent is larger than that of the second solvent.SELECTED DRAWING: None
【課題】カラーフィルタの製造工程で、スピンコート方式を用いてコートしても斜線不良がなく、コーティングの均一性を確保し、特にカラーフィルタを薄膜形態で製造しても、異物による問題を最小化する感光性樹脂組成物を提供する。【解決手段】（Ａ）光重合性化合物；（Ｂ）光重合開始剤；（Ｃ）着色剤；（Ｄ）バインダ樹脂；および（Ｅ）溶媒を含み、前記溶媒は第１溶媒および第２溶媒を含み、前記第１溶媒は、１気圧下で０℃超１５０℃未満の沸点を有し、前記第２溶媒は、１気圧下で１５０℃以上の沸点を有し、前記第１溶媒は、前記第２溶媒より多い含有量で含まれる、感光性樹脂組成物。【選択図】なし |
| format | Patent |
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【課題】カラーフィルタの製造工程で、スピンコート方式を用いてコートしても斜線不良がなく、コーティングの均一性を確保し、特にカラーフィルタを薄膜形態で製造しても、異物による問題を最小化する感光性樹脂組成物を提供する。【解決手段】（Ａ）光重合性化合物；（Ｂ）光重合開始剤；（Ｃ）着色剤；（Ｄ）バインダ樹脂；および（Ｅ）溶媒を含み、前記溶媒は第１溶媒および第２溶媒を含み、前記第１溶媒は、１気圧下で０℃超１５０℃未満の沸点を有し、前記第２溶媒は、１気圧下で１５０℃以上の沸点を有し、前記第１溶媒は、前記第２溶媒より多い含有量で含まれる、感光性樹脂組成物。【選択図】なし</description><language>eng ; jpn</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; CINEMATOGRAPHY ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; LAKES ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; MORDANTS ; NATURAL RESINS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES ; ORIGINALS THEREFOR ; PAINTS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230622&DB=EPODOC&CC=JP&NR=2023086723A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230622&DB=EPODOC&CC=JP&NR=2023086723A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM JIHONG</creatorcontrib><creatorcontrib>KIM JIHYE</creatorcontrib><creatorcontrib>KIM SABINA</creatorcontrib><creatorcontrib>SONG HAENI</creatorcontrib><creatorcontrib>YOO JEONGHO</creatorcontrib><creatorcontrib>PARK BAEK SOUNG</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PRODUCED USING THE SAME, AND COLOR FILTER</title><description>To provide a photosensitive resin composition which causes no oblique line failure even in coating using a spin coat method in a color filter manufacturing step, secures uniformity of the coating, and minimizes a problem due to a foreign matter, especially, even when a color filter is manufactured in a thin film form.SOLUTION: A photosensitive resin composition contains (A) a photopolymerizable compound, (B) a photopolymerization initiator, (C) a coloring agent, (D) a binder resin, and (E) a solvent, wherein the solvent contains a first solvent and a second solvent; the first solvent has a boiling point having higher than 0°C and lower than 150°C under 1 atm.; the second solvent has a boiling point of 150°C or higher under 1 atm.; and a content of the first solvent is larger than that of the second solvent.SELECTED DRAWING: None
【課題】カラーフィルタの製造工程で、スピンコート方式を用いてコートしても斜線不良がなく、コーティングの均一性を確保し、特にカラーフィルタを薄膜形態で製造しても、異物による問題を最小化する感光性樹脂組成物を提供する。【解決手段】（Ａ）光重合性化合物；（Ｂ）光重合開始剤；（Ｃ）着色剤；（Ｄ）バインダ樹脂；および（Ｅ）溶媒を含み、前記溶媒は第１溶媒および第２溶媒を含み、前記第１溶媒は、１気圧下で０℃超１５０℃未満の沸点を有し、前記第２溶媒は、１気圧下で１５０℃以上の沸点を有し、前記第１溶媒は、前記第２溶媒より多い含有量で含まれる、感光性樹脂組成物。【選択図】なし</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>LAKES</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>MORDANTS</subject><subject>NATURAL RESINS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEgN8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PvpKGBV4ebp46sQEOTvEurs6qIQChRyVwjxcFUIdvR11VFw9HMBmuHjHwRSF-IaxMPAmpaYU5zKC6W5GZTcXEOcPXRTC_LjU4sLEpNT81JL4r0CjAyMjA0szMyNjB2NiVIEAECHNZs</recordid><startdate>20230622</startdate><enddate>20230622</enddate><creator>KIM JIHONG</creator><creator>KIM JIHYE</creator><creator>KIM SABINA</creator><creator>SONG HAENI</creator><creator>YOO JEONGHO</creator><creator>PARK BAEK SOUNG</creator><scope>EVB</scope></search><sort><creationdate>20230622</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PRODUCED USING THE SAME, AND COLOR FILTER</title><author>KIM JIHONG ; KIM JIHYE ; KIM SABINA ; SONG HAENI ; YOO JEONGHO ; PARK BAEK SOUNG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2023086723A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2023</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>LAKES</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>MORDANTS</topic><topic>NATURAL RESINS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM JIHONG</creatorcontrib><creatorcontrib>KIM JIHYE</creatorcontrib><creatorcontrib>KIM SABINA</creatorcontrib><creatorcontrib>SONG HAENI</creatorcontrib><creatorcontrib>YOO JEONGHO</creatorcontrib><creatorcontrib>PARK BAEK SOUNG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM JIHONG</au><au>KIM JIHYE</au><au>KIM SABINA</au><au>SONG HAENI</au><au>YOO JEONGHO</au><au>PARK BAEK SOUNG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PRODUCED USING THE SAME, AND COLOR FILTER</title><date>2023-06-22</date><risdate>2023</risdate><abstract>To provide a photosensitive resin composition which causes no oblique line failure even in coating using a spin coat method in a color filter manufacturing step, secures uniformity of the coating, and minimizes a problem due to a foreign matter, especially, even when a color filter is manufactured in a thin film form.SOLUTION: A photosensitive resin composition contains (A) a photopolymerizable compound, (B) a photopolymerization initiator, (C) a coloring agent, (D) a binder resin, and (E) a solvent, wherein the solvent contains a first solvent and a second solvent; the first solvent has a boiling point having higher than 0°C and lower than 150°C under 1 atm.; the second solvent has a boiling point of 150°C or higher under 1 atm.; and a content of the first solvent is larger than that of the second solvent.SELECTED DRAWING: None
【課題】カラーフィルタの製造工程で、スピンコート方式を用いてコートしても斜線不良がなく、コーティングの均一性を確保し、特にカラーフィルタを薄膜形態で製造しても、異物による問題を最小化する感光性樹脂組成物を提供する。【解決手段】（Ａ）光重合性化合物；（Ｂ）光重合開始剤；（Ｃ）着色剤；（Ｄ）バインダ樹脂；および（Ｅ）溶媒を含み、前記溶媒は第１溶媒および第２溶媒を含み、前記第１溶媒は、１気圧下で０℃超１５０℃未満の沸点を有し、前記第２溶媒は、１気圧下で１５０℃以上の沸点を有し、前記第１溶媒は、前記第２溶媒より多い含有量で含まれる、感光性樹脂組成物。【選択図】なし</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY LAKES MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MORDANTS NATURAL RESINS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES SEMICONDUCTOR DEVICES |
| title | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PRODUCED USING THE SAME, AND COLOR FILTER |
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