PLASMA PROCESSING DEVICE
To efficiently activate gas by plasma in the vicinity of a supply port of electromagnetic waves.SOLUTION: A plasma processing device has a processing container, a top wall forming part of the processing container and having an aperture, and a transmission window closing the aperture. The aperture be...
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| creator | MIYASHITA HIROYUKI GUNJI ISAO |
| description | To efficiently activate gas by plasma in the vicinity of a supply port of electromagnetic waves.SOLUTION: A plasma processing device has a processing container, a top wall forming part of the processing container and having an aperture, and a transmission window closing the aperture. The aperture below the transmission window is formed as a recess. The recess is a supply port for supplying electromagnetic waves from the transmission window into the processing container. A first gas supply port is provided on the lower surface of the top wall. A second gas supply port is provided on the inner surface of the recess.SELECTED DRAWING: Figure 1
【課題】電磁波の供給口付近のプラズマによるガス活性化を効率的に実施する。【解決手段】処理容器と、前記処理容器の一部を構成し、開口を有する天壁と、前記開口を閉塞する透過窓と、を有し、前記透過窓下の前記開口が凹部として形成され、前記凹部は、前記透過窓から前記処理容器内へ電磁波を供給する供給口であり、前記天壁の下面に第１ガス供給孔が設けられ、前記凹部の内側面に第２ガス供給孔が設けられている、プラズマ処理装置が提供される。【選択図】図１ |
| format | Patent |
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【課題】電磁波の供給口付近のプラズマによるガス活性化を効率的に実施する。【解決手段】処理容器と、前記処理容器の一部を構成し、開口を有する天壁と、前記開口を閉塞する透過窓と、を有し、前記透過窓下の前記開口が凹部として形成され、前記凹部は、前記透過窓から前記処理容器内へ電磁波を供給する供給口であり、前記天壁の下面に第１ガス供給孔が設けられ、前記凹部の内側面に第２ガス供給孔が設けられている、プラズマ処理装置が提供される。【選択図】図１</description><language>eng ; jpn</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230616&DB=EPODOC&CC=JP&NR=2023083731A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230616&DB=EPODOC&CC=JP&NR=2023083731A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYASHITA HIROYUKI</creatorcontrib><creatorcontrib>GUNJI ISAO</creatorcontrib><title>PLASMA PROCESSING DEVICE</title><description>To efficiently activate gas by plasma in the vicinity of a supply port of electromagnetic waves.SOLUTION: A plasma processing device has a processing container, a top wall forming part of the processing container and having an aperture, and a transmission window closing the aperture. The aperture below the transmission window is formed as a recess. The recess is a supply port for supplying electromagnetic waves from the transmission window into the processing container. A first gas supply port is provided on the lower surface of the top wall. A second gas supply port is provided on the inner surface of the recess.SELECTED DRAWING: Figure 1
【課題】電磁波の供給口付近のプラズマによるガス活性化を効率的に実施する。【解決手段】処理容器と、前記処理容器の一部を構成し、開口を有する天壁と、前記開口を閉塞する透過窓と、を有し、前記透過窓下の前記開口が凹部として形成され、前記凹部は、前記透過窓から前記処理容器内へ電磁波を供給する供給口であり、前記天壁の下面に第１ガス供給孔が設けられ、前記凹部の内側面に第２ガス供給孔が設けられている、プラズマ処理装置が提供される。【選択図】図１</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAI8HEM9nVUCAjyd3YNDvb0c1dwcQ3zdHblYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBkbGBhbG5saGjsZEKQIAL04gGA</recordid><startdate>20230616</startdate><enddate>20230616</enddate><creator>MIYASHITA HIROYUKI</creator><creator>GUNJI ISAO</creator><scope>EVB</scope></search><sort><creationdate>20230616</creationdate><title>PLASMA PROCESSING DEVICE</title><author>MIYASHITA HIROYUKI ; GUNJI ISAO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2023083731A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2023</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYASHITA HIROYUKI</creatorcontrib><creatorcontrib>GUNJI ISAO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYASHITA HIROYUKI</au><au>GUNJI ISAO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PLASMA PROCESSING DEVICE</title><date>2023-06-16</date><risdate>2023</risdate><abstract>To efficiently activate gas by plasma in the vicinity of a supply port of electromagnetic waves.SOLUTION: A plasma processing device has a processing container, a top wall forming part of the processing container and having an aperture, and a transmission window closing the aperture. The aperture below the transmission window is formed as a recess. The recess is a supply port for supplying electromagnetic waves from the transmission window into the processing container. A first gas supply port is provided on the lower surface of the top wall. A second gas supply port is provided on the inner surface of the recess.SELECTED DRAWING: Figure 1
【課題】電磁波の供給口付近のプラズマによるガス活性化を効率的に実施する。【解決手段】処理容器と、前記処理容器の一部を構成し、開口を有する天壁と、前記開口を閉塞する透過窓と、を有し、前記透過窓下の前記開口が凹部として形成され、前記凹部は、前記透過窓から前記処理容器内へ電磁波を供給する供給口であり、前記天壁の下面に第１ガス供給孔が設けられ、前記凹部の内側面に第２ガス供給孔が設けられている、プラズマ処理装置が提供される。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS |
| title | PLASMA PROCESSING DEVICE |
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