SUBSTRATE PROCESSING SYSTEM AND GROUP MANAGEMENT DEVICE

To provide a substrate processing system capable of suppressing an excess of a total flow rate of process liquid used by a plurality of substrate processing apparatuses over a maximum flow rate of process liquid that can be supplied by power facilities.SOLUTION: A substrate processing system 100 inc...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MIYAZAKI TOSHIHISA, MATSUI HIROAKIRA, KIMURA RYUICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SEMICONDUCTOR DEVICES
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