ROTARY CATHODE UNIT FOR SPUTTERING DEVICE

To provide a rotary cathode unit for sputtering device that has a structure capable of determining that a refrigerant securely circulates over the whole refrigerant circulation path.SOLUTION: A rotary cathode unit for sputtering device that comprises a cylindrical target Tg arranged in a vacuum atmo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TACHIKAWA SHINSUKE, NISHINOBO YASUKI, SAITO KAZUHIKO, HAKOMORI MUNEHITO, KIMURA KO, ORII YUICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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