PLASMA GENERATOR
To provide a plasma generator capable of adjusting transmission line impedance even after fixing the antenna length to facilitate adjustment of transmission line impedance.SOLUTION: The plasma generator includes: a plasma generation unit 1; a gas supply source 60 for supplying gas inside the plasma...
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| creator | SHIRAISHI KATSUHIKO |
| description | To provide a plasma generator capable of adjusting transmission line impedance even after fixing the antenna length to facilitate adjustment of transmission line impedance.SOLUTION: The plasma generator includes: a plasma generation unit 1; a gas supply source 60 for supplying gas inside the plasma generation unit; and a high-frequency power supply 50 that supplies high-frequency electric power inside the plasma generation unit. The plasma generation unit includes: a bar antenna 11; a first insulating material 5 movable along the central axis of the bar antenna around the bar antenna; and a second insulating material movable independently from the first insulating material along the central axis of the bar antenna in contact with the outside of the first insulating material.SELECTED DRAWING: Figure 1
【課題】プラズマ生成装置において、アンテナ長を固定した後でも，伝送路インピーダンスの調整が可能であり，伝送路インピーダンスの調整を容易にする。【解決手段】プラズマ生成部１と、このプラズマ生成部の内部にガスを供給するガス供給源６０と、プラズマ生成部の内部に高周波電力を供給する高周波電源５０とを備えたプラズマ生成装置において、プラズマ生成部を、棒状のアンテナ１１と、棒状のアンテナの周囲を囲んでこの棒状のアンテナの中心軸に沿って移動可能な第一の絶縁部材５と、この第一の絶縁部材の外側に接して棒状のアンテナの中心軸に沿って第一の絶縁部材とは別個に移動可能な第二の絶縁部材とを備えて構成した。【選択図】図１ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2022190830A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2022190830A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2022190830A3</originalsourceid><addsrcrecordid>eNrjZBAI8HEM9nVUcHf1cw1yDPEP4mFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgZGRoaWBhbGBo7GRCkCADrOHeY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PLASMA GENERATOR</title><source>esp@cenet</source><creator>SHIRAISHI KATSUHIKO</creator><creatorcontrib>SHIRAISHI KATSUHIKO</creatorcontrib><description>To provide a plasma generator capable of adjusting transmission line impedance even after fixing the antenna length to facilitate adjustment of transmission line impedance.SOLUTION: The plasma generator includes: a plasma generation unit 1; a gas supply source 60 for supplying gas inside the plasma generation unit; and a high-frequency power supply 50 that supplies high-frequency electric power inside the plasma generation unit. The plasma generation unit includes: a bar antenna 11; a first insulating material 5 movable along the central axis of the bar antenna around the bar antenna; and a second insulating material movable independently from the first insulating material along the central axis of the bar antenna in contact with the outside of the first insulating material.SELECTED DRAWING: Figure 1
【課題】プラズマ生成装置において、アンテナ長を固定した後でも，伝送路インピーダンスの調整が可能であり，伝送路インピーダンスの調整を容易にする。【解決手段】プラズマ生成部１と、このプラズマ生成部の内部にガスを供給するガス供給源６０と、プラズマ生成部の内部に高周波電力を供給する高周波電源５０とを備えたプラズマ生成装置において、プラズマ生成部を、棒状のアンテナ１１と、棒状のアンテナの周囲を囲んでこの棒状のアンテナの中心軸に沿って移動可能な第一の絶縁部材５と、この第一の絶縁部材の外側に接して棒状のアンテナの中心軸に沿って第一の絶縁部材とは別個に移動可能な第二の絶縁部材とを備えて構成した。【選択図】図１</description><language>eng ; jpn</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221227&DB=EPODOC&CC=JP&NR=2022190830A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221227&DB=EPODOC&CC=JP&NR=2022190830A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHIRAISHI KATSUHIKO</creatorcontrib><title>PLASMA GENERATOR</title><description>To provide a plasma generator capable of adjusting transmission line impedance even after fixing the antenna length to facilitate adjustment of transmission line impedance.SOLUTION: The plasma generator includes: a plasma generation unit 1; a gas supply source 60 for supplying gas inside the plasma generation unit; and a high-frequency power supply 50 that supplies high-frequency electric power inside the plasma generation unit. The plasma generation unit includes: a bar antenna 11; a first insulating material 5 movable along the central axis of the bar antenna around the bar antenna; and a second insulating material movable independently from the first insulating material along the central axis of the bar antenna in contact with the outside of the first insulating material.SELECTED DRAWING: Figure 1
【課題】プラズマ生成装置において、アンテナ長を固定した後でも，伝送路インピーダンスの調整が可能であり，伝送路インピーダンスの調整を容易にする。【解決手段】プラズマ生成部１と、このプラズマ生成部の内部にガスを供給するガス供給源６０と、プラズマ生成部の内部に高周波電力を供給する高周波電源５０とを備えたプラズマ生成装置において、プラズマ生成部を、棒状のアンテナ１１と、棒状のアンテナの周囲を囲んでこの棒状のアンテナの中心軸に沿って移動可能な第一の絶縁部材５と、この第一の絶縁部材の外側に接して棒状のアンテナの中心軸に沿って第一の絶縁部材とは別個に移動可能な第二の絶縁部材とを備えて構成した。【選択図】図１</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAI8HEM9nVUcHf1cw1yDPEP4mFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgZGRoaWBhbGBo7GRCkCADrOHeY</recordid><startdate>20221227</startdate><enddate>20221227</enddate><creator>SHIRAISHI KATSUHIKO</creator><scope>EVB</scope></search><sort><creationdate>20221227</creationdate><title>PLASMA GENERATOR</title><author>SHIRAISHI KATSUHIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2022190830A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2022</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>SHIRAISHI KATSUHIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHIRAISHI KATSUHIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PLASMA GENERATOR</title><date>2022-12-27</date><risdate>2022</risdate><abstract>To provide a plasma generator capable of adjusting transmission line impedance even after fixing the antenna length to facilitate adjustment of transmission line impedance.SOLUTION: The plasma generator includes: a plasma generation unit 1; a gas supply source 60 for supplying gas inside the plasma generation unit; and a high-frequency power supply 50 that supplies high-frequency electric power inside the plasma generation unit. The plasma generation unit includes: a bar antenna 11; a first insulating material 5 movable along the central axis of the bar antenna around the bar antenna; and a second insulating material movable independently from the first insulating material along the central axis of the bar antenna in contact with the outside of the first insulating material.SELECTED DRAWING: Figure 1
【課題】プラズマ生成装置において、アンテナ長を固定した後でも，伝送路インピーダンスの調整が可能であり，伝送路インピーダンスの調整を容易にする。【解決手段】プラズマ生成部１と、このプラズマ生成部の内部にガスを供給するガス供給源６０と、プラズマ生成部の内部に高周波電力を供給する高周波電源５０とを備えたプラズマ生成装置において、プラズマ生成部を、棒状のアンテナ１１と、棒状のアンテナの周囲を囲んでこの棒状のアンテナの中心軸に沿って移動可能な第一の絶縁部材５と、この第一の絶縁部材の外側に接して棒状のアンテナの中心軸に沿って第一の絶縁部材とは別個に移動可能な第二の絶縁部材とを備えて構成した。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS |
| title | PLASMA GENERATOR |
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