TRANSFER FILM, LAMINATE, PATTERNING METHOD, AND METHOD FOR PRODUCING CIRCUIT WIRING

To provide a transfer film applied to both sides of a transparent conductive layer-bearing substrate, which comprises a transparent substrate and transparent conductive layers disposed on both sides of the transparent substrate, wherein, when a laminate comprising the transfer film disposed on both...

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Hauptverfasser: MOROZUMI KAZUMA, SASAKI DAISUKE, ARITOMI TAKASHI, AZUMA ATSUSHI, KATAYAMA AKIO, SATO MORIMASA
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creator MOROZUMI KAZUMA
SASAKI DAISUKE
ARITOMI TAKASHI
AZUMA ATSUSHI
KATAYAMA AKIO
SATO MORIMASA
description To provide a transfer film applied to both sides of a transparent conductive layer-bearing substrate, which comprises a transparent substrate and transparent conductive layers disposed on both sides of the transparent substrate, wherein, when a laminate comprising the transfer film disposed on both sides of the transparent conductive layer-bearing substrate is exposed to light from its both sides, exposure fogging is suppressed, and a resin pattern formed therefrom has excellent resolution; and also provide a laminate, a patterning method, and a method for producing circuit wiring.SOLUTION: A transfer film is applied to a transparent conductive layer-bearing substrate, which comprises a transparent substrate and transparent conductive layers disposed on both sides of the transparent substrate. The transfer film comprises a temporary support, and a composition layer at least comprising a photosensitive layer. The composition layer comprises a dye having a maximum absorption wavelength at a different wavelength from a maximum sensitivity wavelength of the photosensitive layer. The difference between the maximum sensitivity wavelength of the photosensitive layer and the maximum absorption wavelength of the dye is 40 nm or more.SELECTED DRAWING: Figure 1 【課題】透明基材と透明基材の両面に配置された透明導電層とを有する透明導電層付き基材の両面に適用される転写フィルムであって、上記透明導電層付き基材の両面に転写フィルムを配置してなる積層体の両側から露光した際に、露光かぶりが抑制され、且つ、形成される樹脂パターンの解像性にも優れる、転写フィルムを提供する。また、積層体、パターン形成方法、及び回路配線の製造方法を提供する。【解決手段】透明基材と上記透明基材の両面に配置された透明導電層とを有する透明導電層付き基材に適用される、転写フィルムであって、仮支持体と、少なくとも感光性層を含む組成物層と、を有し、上記組成物層が、上記感光性層の最大感度波長とは異なる波長に極大吸収波長を有する色素を含み、上記感光性層の最大感度波長と、上記色素の極大吸収波長との差が、40nm以上である、転写フィルム。【選択図】図1
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The transfer film comprises a temporary support, and a composition layer at least comprising a photosensitive layer. The composition layer comprises a dye having a maximum absorption wavelength at a different wavelength from a maximum sensitivity wavelength of the photosensitive layer. 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The transfer film comprises a temporary support, and a composition layer at least comprising a photosensitive layer. The composition layer comprises a dye having a maximum absorption wavelength at a different wavelength from a maximum sensitivity wavelength of the photosensitive layer. The difference between the maximum sensitivity wavelength of the photosensitive layer and the maximum absorption wavelength of the dye is 40 nm or more.SELECTED DRAWING: Figure 1 【課題】透明基材と透明基材の両面に配置された透明導電層とを有する透明導電層付き基材の両面に適用される転写フィルムであって、上記透明導電層付き基材の両面に転写フィルムを配置してなる積層体の両側から露光した際に、露光かぶりが抑制され、且つ、形成される樹脂パターンの解像性にも優れる、転写フィルムを提供する。また、積層体、パターン形成方法、及び回路配線の製造方法を提供する。【解決手段】透明基材と上記透明基材の両面に配置された透明導電層とを有する透明導電層付き基材に適用される、転写フィルムであって、仮支持体と、少なくとも感光性層を含む組成物層と、を有し、上記組成物層が、上記感光性層の最大感度波長とは異なる波長に極大吸収波長を有する色素を含み、上記感光性層の最大感度波長と、上記色素の極大吸収波長との差が、40nm以上である、転写フィルム。【選択図】図1</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TRANSPORTING
title TRANSFER FILM, LAMINATE, PATTERNING METHOD, AND METHOD FOR PRODUCING CIRCUIT WIRING
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