SUBSTRATE PROCESSING DEVICE

To provide a substrate processing device which can solve airflow congestion in a processing space by rotary airflow formed by rotation of a support unit when a substrate is processed.SOLUTION: The invention provides a device which processes a substrate. The substrate processing device may include: a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM YONG JIN, MOON JONG WON, CHOI YE JIN, JEONG CHEOL HWAN
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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