NEW UNSATURATED GROUP CONTAINING EPOXY CARBOXYLATE COMPOUND, DERIVATIVE THEREOF, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME AND CURED PRODUCT THEREOF
To provide a resin composition excellent in photosensitivity to an active energy ray, capable of forming a pattern by developing a fine image and a via by a rare alkaline aqueous solution and capable of forming a film having high insulation, adhesion and heat resistance, and a cured product thereof....
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; jpn |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KAWANO YUSUKE KAGA TAIKI MIZUGUCHI TAKAFUMI |
| description | To provide a resin composition excellent in photosensitivity to an active energy ray, capable of forming a pattern by developing a fine image and a via by a rare alkaline aqueous solution and capable of forming a film having high insulation, adhesion and heat resistance, and a cured product thereof.SOLUTION: A reactive epoxy carboxylate compound is obtained by reacting a monocarboxylic acid compound having one or more ethylenic unsaturated groups in a specific molecule with a compound having a hydroxyl group and a carboxyl group in one molecule if needed; an unsaturated group containing polycarboxylic acid compound is obtained by reacting polybasic acid anhydride with the reactive epoxy carboxylate compound; a resin composition includes them; and a cured product is obtained by curing the resin composition.SELECTED DRAWING: None
【課題】活性エネルギー線に対する感光性に優れ、微細な画像、ビアを希アルカリ水溶液による現像によりパターン形成できると共に、高絶縁性で密着性、耐熱性を有する膜を形成できる樹脂組成物及びその硬化物を提供する。【解決手段】特定の分子中に１個以上のエチレン性不飽和基を有するモノカルボン酸化合物及び、必要に応じて一分子中に水酸基及びカルボキシ基を有する化合物を反応させて得られる反応性エポキシカルボキシレート化合物、更にその反応性エポキシカルボキシレート化合物に多塩基酸無水物を反応させて得られる不飽和基含有ポリカルボン酸化合物、それらを含む樹脂組成物及びその硬化物。【選択図】なし |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2022165243A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2022165243A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2022165243A3</originalsourceid><addsrcrecordid>eNqNjcsOAUEURGdjIfiHG2sSxmPfuq-ZlnFvpx-DlYi0lSDhe3yrHo-9VSVVp6ra2ZNwA4Gc8MEKjwoKy8GAZPJCk6YC0PB2B1LYRdIqMSlcGw6kBqDQ6lp4XSP4Ei3ycgCmZM8Oyem3b9Fp-lQahwk0ySqoZjp1wIk1giAFMth0byyrIP1vrpu1TofzPfa-2sn6S_SyHMbbdR_vt8MxXuJjvzL5KM_H81k-nYjJX9ALIXJFoQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>NEW UNSATURATED GROUP CONTAINING EPOXY CARBOXYLATE COMPOUND, DERIVATIVE THEREOF, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME AND CURED PRODUCT THEREOF</title><source>esp@cenet</source><creator>KAWANO YUSUKE ; KAGA TAIKI ; MIZUGUCHI TAKAFUMI</creator><creatorcontrib>KAWANO YUSUKE ; KAGA TAIKI ; MIZUGUCHI TAKAFUMI</creatorcontrib><description>To provide a resin composition excellent in photosensitivity to an active energy ray, capable of forming a pattern by developing a fine image and a via by a rare alkaline aqueous solution and capable of forming a film having high insulation, adhesion and heat resistance, and a cured product thereof.SOLUTION: A reactive epoxy carboxylate compound is obtained by reacting a monocarboxylic acid compound having one or more ethylenic unsaturated groups in a specific molecule with a compound having a hydroxyl group and a carboxyl group in one molecule if needed; an unsaturated group containing polycarboxylic acid compound is obtained by reacting polybasic acid anhydride with the reactive epoxy carboxylate compound; a resin composition includes them; and a cured product is obtained by curing the resin composition.SELECTED DRAWING: None
【課題】活性エネルギー線に対する感光性に優れ、微細な画像、ビアを希アルカリ水溶液による現像によりパターン形成できると共に、高絶縁性で密着性、耐熱性を有する膜を形成できる樹脂組成物及びその硬化物を提供する。【解決手段】特定の分子中に１個以上のエチレン性不飽和基を有するモノカルボン酸化合物及び、必要に応じて一分子中に水酸基及びカルボキシ基を有する化合物を反応させて得られる反応性エポキシカルボキシレート化合物、更にその反応性エポキシカルボキシレート化合物に多塩基酸無水物を反応させて得られる不飽和基含有ポリカルボン酸化合物、それらを含む樹脂組成物及びその硬化物。【選択図】なし</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PRINTED CIRCUITS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221031&DB=EPODOC&CC=JP&NR=2022165243A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221031&DB=EPODOC&CC=JP&NR=2022165243A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAWANO YUSUKE</creatorcontrib><creatorcontrib>KAGA TAIKI</creatorcontrib><creatorcontrib>MIZUGUCHI TAKAFUMI</creatorcontrib><title>NEW UNSATURATED GROUP CONTAINING EPOXY CARBOXYLATE COMPOUND, DERIVATIVE THEREOF, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME AND CURED PRODUCT THEREOF</title><description>To provide a resin composition excellent in photosensitivity to an active energy ray, capable of forming a pattern by developing a fine image and a via by a rare alkaline aqueous solution and capable of forming a film having high insulation, adhesion and heat resistance, and a cured product thereof.SOLUTION: A reactive epoxy carboxylate compound is obtained by reacting a monocarboxylic acid compound having one or more ethylenic unsaturated groups in a specific molecule with a compound having a hydroxyl group and a carboxyl group in one molecule if needed; an unsaturated group containing polycarboxylic acid compound is obtained by reacting polybasic acid anhydride with the reactive epoxy carboxylate compound; a resin composition includes them; and a cured product is obtained by curing the resin composition.SELECTED DRAWING: None
【課題】活性エネルギー線に対する感光性に優れ、微細な画像、ビアを希アルカリ水溶液による現像によりパターン形成できると共に、高絶縁性で密着性、耐熱性を有する膜を形成できる樹脂組成物及びその硬化物を提供する。【解決手段】特定の分子中に１個以上のエチレン性不飽和基を有するモノカルボン酸化合物及び、必要に応じて一分子中に水酸基及びカルボキシ基を有する化合物を反応させて得られる反応性エポキシカルボキシレート化合物、更にその反応性エポキシカルボキシレート化合物に多塩基酸無水物を反応させて得られる不飽和基含有ポリカルボン酸化合物、それらを含む樹脂組成物及びその硬化物。【選択図】なし</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PRINTED CIRCUITS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjcsOAUEURGdjIfiHG2sSxmPfuq-ZlnFvpx-DlYi0lSDhe3yrHo-9VSVVp6ra2ZNwA4Gc8MEKjwoKy8GAZPJCk6YC0PB2B1LYRdIqMSlcGw6kBqDQ6lp4XSP4Ei3ycgCmZM8Oyem3b9Fp-lQahwk0ySqoZjp1wIk1giAFMth0byyrIP1vrpu1TofzPfa-2sn6S_SyHMbbdR_vt8MxXuJjvzL5KM_H81k-nYjJX9ALIXJFoQ</recordid><startdate>20221031</startdate><enddate>20221031</enddate><creator>KAWANO YUSUKE</creator><creator>KAGA TAIKI</creator><creator>MIZUGUCHI TAKAFUMI</creator><scope>EVB</scope></search><sort><creationdate>20221031</creationdate><title>NEW UNSATURATED GROUP CONTAINING EPOXY CARBOXYLATE COMPOUND, DERIVATIVE THEREOF, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME AND CURED PRODUCT THEREOF</title><author>KAWANO YUSUKE ; KAGA TAIKI ; MIZUGUCHI TAKAFUMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2022165243A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2022</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PRINTED CIRCUITS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>KAWANO YUSUKE</creatorcontrib><creatorcontrib>KAGA TAIKI</creatorcontrib><creatorcontrib>MIZUGUCHI TAKAFUMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAWANO YUSUKE</au><au>KAGA TAIKI</au><au>MIZUGUCHI TAKAFUMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>NEW UNSATURATED GROUP CONTAINING EPOXY CARBOXYLATE COMPOUND, DERIVATIVE THEREOF, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME AND CURED PRODUCT THEREOF</title><date>2022-10-31</date><risdate>2022</risdate><abstract>To provide a resin composition excellent in photosensitivity to an active energy ray, capable of forming a pattern by developing a fine image and a via by a rare alkaline aqueous solution and capable of forming a film having high insulation, adhesion and heat resistance, and a cured product thereof.SOLUTION: A reactive epoxy carboxylate compound is obtained by reacting a monocarboxylic acid compound having one or more ethylenic unsaturated groups in a specific molecule with a compound having a hydroxyl group and a carboxyl group in one molecule if needed; an unsaturated group containing polycarboxylic acid compound is obtained by reacting polybasic acid anhydride with the reactive epoxy carboxylate compound; a resin composition includes them; and a cured product is obtained by curing the resin composition.SELECTED DRAWING: None
【課題】活性エネルギー線に対する感光性に優れ、微細な画像、ビアを希アルカリ水溶液による現像によりパターン形成できると共に、高絶縁性で密着性、耐熱性を有する膜を形成できる樹脂組成物及びその硬化物を提供する。【解決手段】特定の分子中に１個以上のエチレン性不飽和基を有するモノカルボン酸化合物及び、必要に応じて一分子中に水酸基及びカルボキシ基を有する化合物を反応させて得られる反応性エポキシカルボキシレート化合物、更にその反応性エポキシカルボキシレート化合物に多塩基酸無水物を反応させて得られる不飽和基含有ポリカルボン酸化合物、それらを含む樹脂組成物及びその硬化物。【選択図】なし</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; jpn |
| recordid | cdi_epo_espacenet_JP2022165243A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | NEW UNSATURATED GROUP CONTAINING EPOXY CARBOXYLATE COMPOUND, DERIVATIVE THEREOF, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME AND CURED PRODUCT THEREOF |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-12T22%3A33%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KAWANO%20YUSUKE&rft.date=2022-10-31&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2022165243A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |