TRANSPARENT CONDUCTIVE FILM, AND MANUFACTURING METHOD OF TRANSPARENT CONDUCTIVE FILM
To provide a transparent conductive film in which increase of a sheet resistance or decline of transmittance is suppressed, and to provide its manufacturing method.SOLUTION: A glutarimide resin containing a glutarimide structure having a hydrogen atom on a nitrogen atom, and a glutarimide structure...
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| creator | HIIRO TOMOKI KATAOKA NAOTO HAYAKAWA HIROKI |
| description | To provide a transparent conductive film in which increase of a sheet resistance or decline of transmittance is suppressed, and to provide its manufacturing method.SOLUTION: A glutarimide resin containing a glutarimide structure having a hydrogen atom on a nitrogen atom, and a glutarimide structure having a methyl group on a nitrogen atom, is used as a substrate, and a transparent conductive layer is formed through an optical regulation layer. Thus, not only damage onto the substrate at the transparent conductive layer formation time can be reduced but also an excellent transparent conductive film in which increase of a sheet resistance or decline of transmittance as the transparent conductive film is suppressed can be obtained.SELECTED DRAWING: Figure 2
【課題】シート抵抗の増加や透過率の低下が抑制された透明導電フィルム、およびその製造方法を提供する。【解決手段】窒素原子上に水素原子を持つグルタルイミド構造と、窒素原子上にメチル基を持つグルタルイミド構造を含有するグルタルイミド樹脂を基材として用い、光学調整層を介して透明導電層を形成することで、透明導電層形成時の基材へのダメージを低減することができるばかりでなく、透明導電フィルムとしてのシート抵抗の増加や透過率の低下が抑制された優れた透明導電フィルムが得られる。【選択図】図２ |
| format | Patent |
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【課題】シート抵抗の増加や透過率の低下が抑制された透明導電フィルム、およびその製造方法を提供する。【解決手段】窒素原子上に水素原子を持つグルタルイミド構造と、窒素原子上にメチル基を持つグルタルイミド構造を含有するグルタルイミド樹脂を基材として用い、光学調整層を介して透明導電層を形成することで、透明導電層形成時の基材へのダメージを低減することができるばかりでなく、透明導電フィルムとしてのシート抵抗の増加や透過率の低下が抑制された優れた透明導電フィルムが得られる。【選択図】図２</description><language>eng ; jpn</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; BASIC ELECTRIC ELEMENTS ; CABLES ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; CONDUCTORS ; ELECTRICITY ; GENERAL PROCESSES OF COMPOUNDING ; INSULATORS ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; PERFORMING OPERATIONS ; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TRANSPORTING ; WORKING-UP</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221027&DB=EPODOC&CC=JP&NR=2022164227A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221027&DB=EPODOC&CC=JP&NR=2022164227A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HIIRO TOMOKI</creatorcontrib><creatorcontrib>KATAOKA NAOTO</creatorcontrib><creatorcontrib>HAYAKAWA HIROKI</creatorcontrib><title>TRANSPARENT CONDUCTIVE FILM, AND MANUFACTURING METHOD OF TRANSPARENT CONDUCTIVE FILM</title><description>To provide a transparent conductive film in which increase of a sheet resistance or decline of transmittance is suppressed, and to provide its manufacturing method.SOLUTION: A glutarimide resin containing a glutarimide structure having a hydrogen atom on a nitrogen atom, and a glutarimide structure having a methyl group on a nitrogen atom, is used as a substrate, and a transparent conductive layer is formed through an optical regulation layer. Thus, not only damage onto the substrate at the transparent conductive layer formation time can be reduced but also an excellent transparent conductive film in which increase of a sheet resistance or decline of transmittance as the transparent conductive film is suppressed can be obtained.SELECTED DRAWING: Figure 2
【課題】シート抵抗の増加や透過率の低下が抑制された透明導電フィルム、およびその製造方法を提供する。【解決手段】窒素原子上に水素原子を持つグルタルイミド構造と、窒素原子上にメチル基を持つグルタルイミド構造を含有するグルタルイミド樹脂を基材として用い、光学調整層を介して透明導電層を形成することで、透明導電層形成時の基材へのダメージを低減することができるばかりでなく、透明導電フィルムとしてのシート抵抗の増加や透過率の低下が抑制された優れた透明導電フィルムが得られる。【選択図】図２</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CABLES</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>CONDUCTORS</subject><subject>ELECTRICITY</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>INSULATORS</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PERFORMING OPERATIONS</subject><subject>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>TRANSPORTING</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAgJCXL0Cw5wDHL1C1Fw9vdzCXUO8QxzVXDz9PHVUXD0c1HwdfQLdXN0DgkN8vRzV_B1DfHwd1Hwd1PAo5GHgTUtMac4lRdKczMoubmGOHvophbkx6cWFyQmp-allsR7BRgZGBkZmpkYGZk7GhOlCACxpDDM</recordid><startdate>20221027</startdate><enddate>20221027</enddate><creator>HIIRO TOMOKI</creator><creator>KATAOKA NAOTO</creator><creator>HAYAKAWA HIROKI</creator><scope>EVB</scope></search><sort><creationdate>20221027</creationdate><title>TRANSPARENT CONDUCTIVE FILM, AND MANUFACTURING METHOD OF TRANSPARENT CONDUCTIVE FILM</title><author>HIIRO TOMOKI ; KATAOKA NAOTO ; HAYAKAWA HIROKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2022164227A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2022</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CABLES</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>CONDUCTORS</topic><topic>ELECTRICITY</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>INSULATORS</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PERFORMING OPERATIONS</topic><topic>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>TRANSPORTING</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>HIIRO TOMOKI</creatorcontrib><creatorcontrib>KATAOKA NAOTO</creatorcontrib><creatorcontrib>HAYAKAWA HIROKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HIIRO TOMOKI</au><au>KATAOKA NAOTO</au><au>HAYAKAWA HIROKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TRANSPARENT CONDUCTIVE FILM, AND MANUFACTURING METHOD OF TRANSPARENT CONDUCTIVE FILM</title><date>2022-10-27</date><risdate>2022</risdate><abstract>To provide a transparent conductive film in which increase of a sheet resistance or decline of transmittance is suppressed, and to provide its manufacturing method.SOLUTION: A glutarimide resin containing a glutarimide structure having a hydrogen atom on a nitrogen atom, and a glutarimide structure having a methyl group on a nitrogen atom, is used as a substrate, and a transparent conductive layer is formed through an optical regulation layer. Thus, not only damage onto the substrate at the transparent conductive layer formation time can be reduced but also an excellent transparent conductive film in which increase of a sheet resistance or decline of transmittance as the transparent conductive film is suppressed can be obtained.SELECTED DRAWING: Figure 2
【課題】シート抵抗の増加や透過率の低下が抑制された透明導電フィルム、およびその製造方法を提供する。【解決手段】窒素原子上に水素原子を持つグルタルイミド構造と、窒素原子上にメチル基を持つグルタルイミド構造を含有するグルタルイミド樹脂を基材として用い、光学調整層を介して透明導電層を形成することで、透明導電層形成時の基材へのダメージを低減することができるばかりでなく、透明導電フィルムとしてのシート抵抗の増加や透過率の低下が抑制された優れた透明導電フィルムが得られる。【選択図】図２</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G BASIC ELECTRIC ELEMENTS CABLES CHEMISTRY COMPOSITIONS BASED THEREON CONDUCTORS ELECTRICITY GENERAL PROCESSES OF COMPOUNDING INSULATORS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP |
| title | TRANSPARENT CONDUCTIVE FILM, AND MANUFACTURING METHOD OF TRANSPARENT CONDUCTIVE FILM |
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