EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD OF ARTICLE
To reduce a decrease of accuracy of controlling an integrated exposure amount.SOLUTION: An exposure apparatus that performs scanning exposure for transferring a pattern of an original onto a substrate while synchronously scanning the original and the substrate comprises: control means for controllin...
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| creator | USUI KATSUTOSHI IWASAKI YASUHISA ITO MASAHIRO MIYAMOTO KAZUTERU INABA YUTA |
| description | To reduce a decrease of accuracy of controlling an integrated exposure amount.SOLUTION: An exposure apparatus that performs scanning exposure for transferring a pattern of an original onto a substrate while synchronously scanning the original and the substrate comprises: control means for controlling the illuminance of light emitted from a light source according to an area illuminated on the substrate; a measuring unit that measures the illuminance of the light; a variable slit that defines an illumination range in which the light illuminates the substrate; and slit control means that changes the illumination range by driving the variable slit. The slit control means controls the drive of the variable slit during scanning exposure so as to reduce a difference between the illuminance target value of the control means and the illuminance obtained by the measuring unit.SELECTED DRAWING: Figure 9
【課題】 積算露光量を制御する精度の低下を低減すること。【解決手段】 原版と基板とを同期して走査させながら、前記原版のパターンを前記基板に転写する走査露光を行う露光装置であって、光源から出射される光の照度を、前記基板を照明する領域に応じて制御する制御手段と、前記光の照度を計測する計測部と、前記光が前記基板に照明される照明範囲を規定する可変スリットと、前記可変スリットを駆動させ、前記照明範囲を変更するスリット制御手段と、を有し、前記スリット制御手段は、前記制御手段の照度目標値と、前記計測部で得られた照度との差分を低減するように、前記走査露光中に前記可変スリットの駆動を制御する。【選択図】 図９ |
| format | Patent |
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【課題】 積算露光量を制御する精度の低下を低減すること。【解決手段】 原版と基板とを同期して走査させながら、前記原版のパターンを前記基板に転写する走査露光を行う露光装置であって、光源から出射される光の照度を、前記基板を照明する領域に応じて制御する制御手段と、前記光の照度を計測する計測部と、前記光が前記基板に照明される照明範囲を規定する可変スリットと、前記可変スリットを駆動させ、前記照明範囲を変更するスリット制御手段と、を有し、前記スリット制御手段は、前記制御手段の照度目標値と、前記計測部で得られた照度との差分を低減するように、前記走査露光中に前記可変スリットの駆動を制御する。【選択図】 図９</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221012&DB=EPODOC&CC=JP&NR=2022152225A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221012&DB=EPODOC&CC=JP&NR=2022152225A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>USUI KATSUTOSHI</creatorcontrib><creatorcontrib>IWASAKI YASUHISA</creatorcontrib><creatorcontrib>ITO MASAHIRO</creatorcontrib><creatorcontrib>MIYAMOTO KAZUTERU</creatorcontrib><creatorcontrib>INABA YUTA</creatorcontrib><title>EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD OF ARTICLE</title><description>To reduce a decrease of accuracy of controlling an integrated exposure amount.SOLUTION: An exposure apparatus that performs scanning exposure for transferring a pattern of an original onto a substrate while synchronously scanning the original and the substrate comprises: control means for controlling the illuminance of light emitted from a light source according to an area illuminated on the substrate; a measuring unit that measures the illuminance of the light; a variable slit that defines an illumination range in which the light illuminates the substrate; and slit control means that changes the illumination range by driving the variable slit. The slit control means controls the drive of the variable slit during scanning exposure so as to reduce a difference between the illuminance target value of the control means and the illuminance obtained by the measuring unit.SELECTED DRAWING: Figure 9
【課題】 積算露光量を制御する精度の低下を低減すること。【解決手段】 原版と基板とを同期して走査させながら、前記原版のパターンを前記基板に転写する走査露光を行う露光装置であって、光源から出射される光の照度を、前記基板を照明する領域に応じて制御する制御手段と、前記光の照度を計測する計測部と、前記光が前記基板に照明される照明範囲を規定する可変スリットと、前記可変スリットを駆動させ、前記照明範囲を変更するスリット制御手段と、を有し、前記スリット制御手段は、前記制御手段の照度目標値と、前記計測部で得られた照度との差分を低減するように、前記走査露光中に前記可変スリットの駆動を制御する。【選択図】 図９</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPBwjQjwDw4NclVwDAhwDHIMCQ3WUYCL-bqGePi76Cg4-rko-Dr6hbo5OoeEBnn6uUNlFPzdFByDQjydfVx5GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8V4CRgZGRoamRkZGpozFRigB0Yi1S</recordid><startdate>20221012</startdate><enddate>20221012</enddate><creator>USUI KATSUTOSHI</creator><creator>IWASAKI YASUHISA</creator><creator>ITO MASAHIRO</creator><creator>MIYAMOTO KAZUTERU</creator><creator>INABA YUTA</creator><scope>EVB</scope></search><sort><creationdate>20221012</creationdate><title>EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD OF ARTICLE</title><author>USUI KATSUTOSHI ; IWASAKI YASUHISA ; ITO MASAHIRO ; MIYAMOTO KAZUTERU ; INABA YUTA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2022152225A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2022</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>USUI KATSUTOSHI</creatorcontrib><creatorcontrib>IWASAKI YASUHISA</creatorcontrib><creatorcontrib>ITO MASAHIRO</creatorcontrib><creatorcontrib>MIYAMOTO KAZUTERU</creatorcontrib><creatorcontrib>INABA YUTA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>USUI KATSUTOSHI</au><au>IWASAKI YASUHISA</au><au>ITO MASAHIRO</au><au>MIYAMOTO KAZUTERU</au><au>INABA YUTA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD OF ARTICLE</title><date>2022-10-12</date><risdate>2022</risdate><abstract>To reduce a decrease of accuracy of controlling an integrated exposure amount.SOLUTION: An exposure apparatus that performs scanning exposure for transferring a pattern of an original onto a substrate while synchronously scanning the original and the substrate comprises: control means for controlling the illuminance of light emitted from a light source according to an area illuminated on the substrate; a measuring unit that measures the illuminance of the light; a variable slit that defines an illumination range in which the light illuminates the substrate; and slit control means that changes the illumination range by driving the variable slit. The slit control means controls the drive of the variable slit during scanning exposure so as to reduce a difference between the illuminance target value of the control means and the illuminance obtained by the measuring unit.SELECTED DRAWING: Figure 9
【課題】 積算露光量を制御する精度の低下を低減すること。【解決手段】 原版と基板とを同期して走査させながら、前記原版のパターンを前記基板に転写する走査露光を行う露光装置であって、光源から出射される光の照度を、前記基板を照明する領域に応じて制御する制御手段と、前記光の照度を計測する計測部と、前記光が前記基板に照明される照明範囲を規定する可変スリットと、前記可変スリットを駆動させ、前記照明範囲を変更するスリット制御手段と、を有し、前記スリット制御手段は、前記制御手段の照度目標値と、前記計測部で得られた照度との差分を低減するように、前記走査露光中に前記可変スリットの駆動を制御する。【選択図】 図９</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD OF ARTICLE |
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