GAS TREATMENT APPARATUS

To provide a gas treatment apparatus which can suppress occurrence of defects in a substrate due to particles in gas treatment using fluorine-containing gas and basic gas.SOLUTION: A gas treatment apparatus for subjecting a substrate to gas treatment has a chamber storing the substrate, a gas supply...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YOSHIMURA AKIHIRO, NISHIMURA KAZUAKI, ASAHI KENSHIRO, HANDA TATSUYA, SAEGUSA YUJI, FURUSAWA MASAKI, SASAHARA REIKO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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