GAS TREATMENT APPARATUS
To provide a gas treatment apparatus which can suppress occurrence of defects in a substrate due to particles in gas treatment using fluorine-containing gas and basic gas.SOLUTION: A gas treatment apparatus for subjecting a substrate to gas treatment has a chamber storing the substrate, a gas supply...
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| creator | YOSHIMURA AKIHIRO NISHIMURA KAZUAKI ASAHI KENSHIRO HANDA TATSUYA SAEGUSA YUJI FURUSAWA MASAKI SASAHARA REIKO |
| description | To provide a gas treatment apparatus which can suppress occurrence of defects in a substrate due to particles in gas treatment using fluorine-containing gas and basic gas.SOLUTION: A gas treatment apparatus for subjecting a substrate to gas treatment has a chamber storing the substrate, a gas supply mechanism for individually supplying fluorine-containing gas and basic gas, and a gas introduction member for making the fluorine-containing gas and the basic gas supplied from the gas supply mechanism join each other, and introducing mixed gas obtained by mixing the fluorine-containing gas and the basic gas into the chamber, wherein a part including a confluent part of the fluorine-containing gas and the basic gas of the gas introduction member is composed of an aluminum-based material, and a resin coating is formed in a part including at least the confluent part.SELECTED DRAWING: Figure 1
【課題】フッ素含有ガスと塩基性ガスを用いるガス処理の際に、パーティクルにより基板に欠陥が生じることを抑制可能なガス処理装置を提供する。【解決手段】基板にガス処理を施すガス処理装置は、基板が収容されるチャンバーと、フッ素含有ガスと塩基性ガスとを個別に供給するガス供給機構と、ガス供給機構から供給されたフッ素含有ガスと塩基性ガスとを合流させ、フッ素含有ガスと塩基性ガスとが混合された混合ガスをチャンバーに導入するガス導入部材とを有し、ガス導入部材のフッ素含有ガスと塩基性ガスとの合流箇所を含む部分はアルミニウム系材料で構成されており、少なくとも、合流箇所を含む部分に樹脂コーティングが形成されている。【選択図】図１ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2022142996A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2022142996A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2022142996A3</originalsourceid><addsrcrecordid>eNrjZBB3dwxWCAlydQzxdfULUXAMCHAMcgwJDeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGRkaGJkaWlmaOxkQpAgAY6B_8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>GAS TREATMENT APPARATUS</title><source>esp@cenet</source><creator>YOSHIMURA AKIHIRO ; NISHIMURA KAZUAKI ; ASAHI KENSHIRO ; HANDA TATSUYA ; SAEGUSA YUJI ; FURUSAWA MASAKI ; SASAHARA REIKO</creator><creatorcontrib>YOSHIMURA AKIHIRO ; NISHIMURA KAZUAKI ; ASAHI KENSHIRO ; HANDA TATSUYA ; SAEGUSA YUJI ; FURUSAWA MASAKI ; SASAHARA REIKO</creatorcontrib><description>To provide a gas treatment apparatus which can suppress occurrence of defects in a substrate due to particles in gas treatment using fluorine-containing gas and basic gas.SOLUTION: A gas treatment apparatus for subjecting a substrate to gas treatment has a chamber storing the substrate, a gas supply mechanism for individually supplying fluorine-containing gas and basic gas, and a gas introduction member for making the fluorine-containing gas and the basic gas supplied from the gas supply mechanism join each other, and introducing mixed gas obtained by mixing the fluorine-containing gas and the basic gas into the chamber, wherein a part including a confluent part of the fluorine-containing gas and the basic gas of the gas introduction member is composed of an aluminum-based material, and a resin coating is formed in a part including at least the confluent part.SELECTED DRAWING: Figure 1
【課題】フッ素含有ガスと塩基性ガスを用いるガス処理の際に、パーティクルにより基板に欠陥が生じることを抑制可能なガス処理装置を提供する。【解決手段】基板にガス処理を施すガス処理装置は、基板が収容されるチャンバーと、フッ素含有ガスと塩基性ガスとを個別に供給するガス供給機構と、ガス供給機構から供給されたフッ素含有ガスと塩基性ガスとを合流させ、フッ素含有ガスと塩基性ガスとが混合された混合ガスをチャンバーに導入するガス導入部材とを有し、ガス導入部材のフッ素含有ガスと塩基性ガスとの合流箇所を含む部分はアルミニウム系材料で構成されており、少なくとも、合流箇所を含む部分に樹脂コーティングが形成されている。【選択図】図１</description><language>eng ; jpn</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221003&DB=EPODOC&CC=JP&NR=2022142996A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221003&DB=EPODOC&CC=JP&NR=2022142996A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YOSHIMURA AKIHIRO</creatorcontrib><creatorcontrib>NISHIMURA KAZUAKI</creatorcontrib><creatorcontrib>ASAHI KENSHIRO</creatorcontrib><creatorcontrib>HANDA TATSUYA</creatorcontrib><creatorcontrib>SAEGUSA YUJI</creatorcontrib><creatorcontrib>FURUSAWA MASAKI</creatorcontrib><creatorcontrib>SASAHARA REIKO</creatorcontrib><title>GAS TREATMENT APPARATUS</title><description>To provide a gas treatment apparatus which can suppress occurrence of defects in a substrate due to particles in gas treatment using fluorine-containing gas and basic gas.SOLUTION: A gas treatment apparatus for subjecting a substrate to gas treatment has a chamber storing the substrate, a gas supply mechanism for individually supplying fluorine-containing gas and basic gas, and a gas introduction member for making the fluorine-containing gas and the basic gas supplied from the gas supply mechanism join each other, and introducing mixed gas obtained by mixing the fluorine-containing gas and the basic gas into the chamber, wherein a part including a confluent part of the fluorine-containing gas and the basic gas of the gas introduction member is composed of an aluminum-based material, and a resin coating is formed in a part including at least the confluent part.SELECTED DRAWING: Figure 1
【課題】フッ素含有ガスと塩基性ガスを用いるガス処理の際に、パーティクルにより基板に欠陥が生じることを抑制可能なガス処理装置を提供する。【解決手段】基板にガス処理を施すガス処理装置は、基板が収容されるチャンバーと、フッ素含有ガスと塩基性ガスとを個別に供給するガス供給機構と、ガス供給機構から供給されたフッ素含有ガスと塩基性ガスとを合流させ、フッ素含有ガスと塩基性ガスとが混合された混合ガスをチャンバーに導入するガス導入部材とを有し、ガス導入部材のフッ素含有ガスと塩基性ガスとの合流箇所を含む部分はアルミニウム系材料で構成されており、少なくとも、合流箇所を含む部分に樹脂コーティングが形成されている。【選択図】図１</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB3dwxWCAlydQzxdfULUXAMCHAMcgwJDeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGRkaGJkaWlmaOxkQpAgAY6B_8</recordid><startdate>20221003</startdate><enddate>20221003</enddate><creator>YOSHIMURA AKIHIRO</creator><creator>NISHIMURA KAZUAKI</creator><creator>ASAHI KENSHIRO</creator><creator>HANDA TATSUYA</creator><creator>SAEGUSA YUJI</creator><creator>FURUSAWA MASAKI</creator><creator>SASAHARA REIKO</creator><scope>EVB</scope></search><sort><creationdate>20221003</creationdate><title>GAS TREATMENT APPARATUS</title><author>YOSHIMURA AKIHIRO ; NISHIMURA KAZUAKI ; ASAHI KENSHIRO ; HANDA TATSUYA ; SAEGUSA YUJI ; FURUSAWA MASAKI ; SASAHARA REIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2022142996A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>YOSHIMURA AKIHIRO</creatorcontrib><creatorcontrib>NISHIMURA KAZUAKI</creatorcontrib><creatorcontrib>ASAHI KENSHIRO</creatorcontrib><creatorcontrib>HANDA TATSUYA</creatorcontrib><creatorcontrib>SAEGUSA YUJI</creatorcontrib><creatorcontrib>FURUSAWA MASAKI</creatorcontrib><creatorcontrib>SASAHARA REIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YOSHIMURA AKIHIRO</au><au>NISHIMURA KAZUAKI</au><au>ASAHI KENSHIRO</au><au>HANDA TATSUYA</au><au>SAEGUSA YUJI</au><au>FURUSAWA MASAKI</au><au>SASAHARA REIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>GAS TREATMENT APPARATUS</title><date>2022-10-03</date><risdate>2022</risdate><abstract>To provide a gas treatment apparatus which can suppress occurrence of defects in a substrate due to particles in gas treatment using fluorine-containing gas and basic gas.SOLUTION: A gas treatment apparatus for subjecting a substrate to gas treatment has a chamber storing the substrate, a gas supply mechanism for individually supplying fluorine-containing gas and basic gas, and a gas introduction member for making the fluorine-containing gas and the basic gas supplied from the gas supply mechanism join each other, and introducing mixed gas obtained by mixing the fluorine-containing gas and the basic gas into the chamber, wherein a part including a confluent part of the fluorine-containing gas and the basic gas of the gas introduction member is composed of an aluminum-based material, and a resin coating is formed in a part including at least the confluent part.SELECTED DRAWING: Figure 1
【課題】フッ素含有ガスと塩基性ガスを用いるガス処理の際に、パーティクルにより基板に欠陥が生じることを抑制可能なガス処理装置を提供する。【解決手段】基板にガス処理を施すガス処理装置は、基板が収容されるチャンバーと、フッ素含有ガスと塩基性ガスとを個別に供給するガス供給機構と、ガス供給機構から供給されたフッ素含有ガスと塩基性ガスとを合流させ、フッ素含有ガスと塩基性ガスとが混合された混合ガスをチャンバーに導入するガス導入部材とを有し、ガス導入部材のフッ素含有ガスと塩基性ガスとの合流箇所を含む部分はアルミニウム系材料で構成されており、少なくとも、合流箇所を含む部分に樹脂コーティングが形成されている。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| title | GAS TREATMENT APPARATUS |
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