DETECTOR, DETECTION METHOD, PROGRAM, LITHOGRAPHY DEVICE, AND ARTICLE MANUFACTURING METHOD
To provide a detector advantageous for enhancing accuracy of pattern matching.SOLUTION: A detector for detecting a position of a mark formed on a substrate includes: an imaging part configured to imaging the mark formed on the substrate to obtain an image of the mark; and a processing part configure...
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| creator | MURAYAMA GENKI |
| description | To provide a detector advantageous for enhancing accuracy of pattern matching.SOLUTION: A detector for detecting a position of a mark formed on a substrate includes: an imaging part configured to imaging the mark formed on the substrate to obtain an image of the mark; and a processing part configured to perform processing of detecting the position of the mark by pattern matching using a template. The processing part executes repetitive processing in which the pattern matching is repeated while rotating the template at least partially, and terminates the repetitive processing when a correlation degree between the image obtained by the pattern matching and the template exceeds a prescribed threshold value.SELECTED DRAWING: Figure 1
【課題】パターンマッチングの高精度化に有利な検出装置を提供する。【解決手段】基板に形成されたマークの位置を検出する検出装置は、前記基板に形成された前記マークを撮像して前記マークの画像を得る撮像部と、テンプレートを用いたパターンマッチングにより前記マークの位置を検出する処理を行う処理部とを有し、前記処理部は、前記テンプレートを少なくとも部分的に回転させながら前記パターンマッチングを繰り返す繰り返し処理を行い、前記パターンマッチングによって得られた前記画像と前記テンプレートとの間の相関度が所定の閾値を超えた場合に前記繰り返し処理を終了する。【選択図】 図１ |
| format | Patent |
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【課題】パターンマッチングの高精度化に有利な検出装置を提供する。【解決手段】基板に形成されたマークの位置を検出する検出装置は、前記基板に形成された前記マークを撮像して前記マークの画像を得る撮像部と、テンプレートを用いたパターンマッチングにより前記マークの位置を検出する処理を行う処理部とを有し、前記処理部は、前記テンプレートを少なくとも部分的に回転させながら前記パターンマッチングを繰り返す繰り返し処理を行い、前記パターンマッチングによって得られた前記画像と前記テンプレートとの間の相関度が所定の閾値を超えた場合に前記繰り返し処理を終了する。【選択図】 図１</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220907&DB=EPODOC&CC=JP&NR=2022131602A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220907&DB=EPODOC&CC=JP&NR=2022131602A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MURAYAMA GENKI</creatorcontrib><title>DETECTOR, DETECTION METHOD, PROGRAM, LITHOGRAPHY DEVICE, AND ARTICLE MANUFACTURING METHOD</title><description>To provide a detector advantageous for enhancing accuracy of pattern matching.SOLUTION: A detector for detecting a position of a mark formed on a substrate includes: an imaging part configured to imaging the mark formed on the substrate to obtain an image of the mark; and a processing part configured to perform processing of detecting the position of the mark by pattern matching using a template. The processing part executes repetitive processing in which the pattern matching is repeated while rotating the template at least partially, and terminates the repetitive processing when a correlation degree between the image obtained by the pattern matching and the template exceeds a prescribed threshold value.SELECTED DRAWING: Figure 1
【課題】パターンマッチングの高精度化に有利な検出装置を提供する。【解決手段】基板に形成されたマークの位置を検出する検出装置は、前記基板に形成された前記マークを撮像して前記マークの画像を得る撮像部と、テンプレートを用いたパターンマッチングにより前記マークの位置を検出する処理を行う処理部とを有し、前記処理部は、前記テンプレートを少なくとも部分的に回転させながら前記パターンマッチングを繰り返す繰り返し処理を行い、前記パターンマッチングによって得られた前記画像と前記テンプレートとの間の相関度が所定の閾値を超えた場合に前記繰り返し処理を終了する。【選択図】 図１</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIh0cQ1xdQ7xD9JRgLA8_f0UfF1DPPxddBQCgvzdgxx9dRR8PIECQGaARyRQWZins6uOgqOfi4JjUIins4-rgq-jX6ibo3NIaJCnnztUOw8Da1piTnEqL5TmZlBycw1x9tBNLciPTy0uSExOzUstifcKMDIwMjI0NjQzMHI0JkoRAGGBMaM</recordid><startdate>20220907</startdate><enddate>20220907</enddate><creator>MURAYAMA GENKI</creator><scope>EVB</scope></search><sort><creationdate>20220907</creationdate><title>DETECTOR, DETECTION METHOD, PROGRAM, LITHOGRAPHY DEVICE, AND ARTICLE MANUFACTURING METHOD</title><author>MURAYAMA GENKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2022131602A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2022</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>MURAYAMA GENKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MURAYAMA GENKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DETECTOR, DETECTION METHOD, PROGRAM, LITHOGRAPHY DEVICE, AND ARTICLE MANUFACTURING METHOD</title><date>2022-09-07</date><risdate>2022</risdate><abstract>To provide a detector advantageous for enhancing accuracy of pattern matching.SOLUTION: A detector for detecting a position of a mark formed on a substrate includes: an imaging part configured to imaging the mark formed on the substrate to obtain an image of the mark; and a processing part configured to perform processing of detecting the position of the mark by pattern matching using a template. The processing part executes repetitive processing in which the pattern matching is repeated while rotating the template at least partially, and terminates the repetitive processing when a correlation degree between the image obtained by the pattern matching and the template exceeds a prescribed threshold value.SELECTED DRAWING: Figure 1
【課題】パターンマッチングの高精度化に有利な検出装置を提供する。【解決手段】基板に形成されたマークの位置を検出する検出装置は、前記基板に形成された前記マークを撮像して前記マークの画像を得る撮像部と、テンプレートを用いたパターンマッチングにより前記マークの位置を検出する処理を行う処理部とを有し、前記処理部は、前記テンプレートを少なくとも部分的に回転させながら前記パターンマッチングを繰り返す繰り返し処理を行い、前記パターンマッチングによって得られた前記画像と前記テンプレートとの間の相関度が所定の閾値を超えた場合に前記繰り返し処理を終了する。【選択図】 図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING |
| title | DETECTOR, DETECTION METHOD, PROGRAM, LITHOGRAPHY DEVICE, AND ARTICLE MANUFACTURING METHOD |
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