COLOR GRATING IN MICROELECTRONIC STRUCTURE
To provide a microelectronic structure and a computing device that remedy the shortcomings of a traditional extreme ultraviolet (EUV) lithography technique by using a manufacturing technique that include a guided self-organization (DSA) operation.SOLUTION: A microelectronic structure 100 includes a...
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Format: | Patent |
Sprache: | eng ; jpn |
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