COLOR GRATING IN MICROELECTRONIC STRUCTURE

To provide a microelectronic structure and a computing device that remedy the shortcomings of a traditional extreme ultraviolet (EUV) lithography technique by using a manufacturing technique that include a guided self-organization (DSA) operation.SOLUTION: A microelectronic structure 100 includes a...

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Bibliographische Detailangaben
Hauptverfasser: MANISH CHANDHOK, FLORIAN GSTREIN, PAUL A NYHUS, GURPREET SINGH, RICHARD E SCHENKER, HAN EUNGNAK, CHARLES HENRY WALLACE
Format: Patent
Sprache:eng ; jpn
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