SILICON CARBIDE SEMICONDUCTOR DEVICE, SEMICONDUCTOR PACKAGE, AND METHOD FOR INSPECTING SILICON CARBIDE SEMICONDUCTOR DEVICE

To provide a silicon carbide semiconductor device, a semiconductor package, and a method for inspecting a silicon carbide semiconductor device, capable of suppressing adverse effects on device characteristics due to probe marks.SOLUTION: In a silicon carbide semiconductor device 3, there are provide...

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Hauptverfasser: UCHIUMI MAKOTO, MIYASATO MAKI
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MIYASATO MAKI
description To provide a silicon carbide semiconductor device, a semiconductor package, and a method for inspecting a silicon carbide semiconductor device, capable of suppressing adverse effects on device characteristics due to probe marks.SOLUTION: In a silicon carbide semiconductor device 3, there are provided a wiring area 21a where a wiring member for a package is bonded and a probe area 21b that is a portion excluding the wiring area 21a, at a portion exposed to an opening 21 of a passivation film of a source pad 11. A probe is pressed only against the probe area 21b of the source pad 11 and a probe mark 31 is generated. The number of probes is set such that the number of probe marks 31 generated in the probe area 21b of the source pad 11 is more than, for example, 2/A per unit current based on the rated current of the silicon carbide semiconductor device.SELECTED DRAWING: Figure 1 【課題】プローブ痕による素子特性への悪影響を抑制することができる炭化珪素半導体装置、半導体パッケージおよび炭化珪素半導体装置の検査方法を提供すること。【解決手段】ソースパッド11の、パッシベーション膜の開口部21に露出された部分に、パッケージ用の配線部材がボンディングされる配線領域21aと、配線領域21aを除く部分であるプローブ領域21bと、が設けられている。ソースパッド11のプローブ領域21bのみに、プローブが押し当てられてプローブ痕31が生じる。ソースパッド11のプローブ領域21bに生じるプローブ痕31の個数が炭化珪素半導体装置3の定格電流を基準として単位電流あたりに例えば2個/Aよりも多くなるように、プローブの本数が設定される。【選択図】図1
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A probe is pressed only against the probe area 21b of the source pad 11 and a probe mark 31 is generated. 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A probe is pressed only against the probe area 21b of the source pad 11 and a probe mark 31 is generated. The number of probes is set such that the number of probe marks 31 generated in the probe area 21b of the source pad 11 is more than, for example, 2/A per unit current based on the rated current of the silicon carbide semiconductor device.SELECTED DRAWING: Figure 1 【課題】プローブ痕による素子特性への悪影響を抑制することができる炭化珪素半導体装置、半導体パッケージおよび炭化珪素半導体装置の検査方法を提供すること。【解決手段】ソースパッド11の、パッシベーション膜の開口部21に露出された部分に、パッケージ用の配線部材がボンディングされる配線領域21aと、配線領域21aを除く部分であるプローブ領域21bと、が設けられている。ソースパッド11のプローブ領域21bのみに、プローブが押し当てられてプローブ痕31が生じる。ソースパッド11のプローブ領域21bに生じるプローブ痕31の個数が炭化珪素半導体装置3の定格電流を基準として単位電流あたりに例えば2個/Aよりも多くなるように、プローブの本数が設定される。【選択図】図1</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MEASURING
MEASURING ELECTRIC VARIABLES
MEASURING MAGNETIC VARIABLES
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
title SILICON CARBIDE SEMICONDUCTOR DEVICE, SEMICONDUCTOR PACKAGE, AND METHOD FOR INSPECTING SILICON CARBIDE SEMICONDUCTOR DEVICE
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