SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

To reduce the frequency of delivery of a substrate in a substrate processing apparatus comprising a pitch change mechanism.SOLUTION: In a substrate processing system 70 having a plurality of liquid processing units 10 built therein, the liquid processing unit (substrate processing apparatus) compris...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OTSUKA TAKAHISA, TANAKA KOJI, KITANO JUNICHI, MINAMIDA JUNYA, AKUMOTO MASAMI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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